Patent application number | Description | Published |
20080246951 | Method and system for using reflectometry below deep ultra-violet (DUV) wavelengths for measuring properties of diffracting or scattering structures on substrate work-pieces - A method and apparatus is disclosed for using below deep ultra-violet (DUV) wavelength reflectometry for measuring properties of diffracting and/or scattering structures on semiconductor work-pieces is disclosed. The system can use polarized light in any incidence configuration, but one technique disclosed herein advantageously uses un-polarized light in a normal incidence configuration. The system thus provides enhanced optical measurement capabilities using below deep ultra-violet (DUV) radiation, while maintaining a small optical module that is easily integrated into other process tools. A further refinement utilizes an r−θ stage to further reduce the footprint. | 10-09-2008 |
20090219537 | Method and apparatus for using multiple relative reflectance measurements to determine properties of a sample using vacuum ultra violet wavelengths - A method and apparatus is disclosed for measuring properties of an unknown sample. A reflectometer and one or more reference pieces is provided. A set of data is collected from the unknown sample and a combination of the reference pieces. A combination of the sample and reference piece data independent of incident intensity is used to determine a property of the unknown sample without calibrating incident reflectometer intensity. The method and apparatus disclosed can measure properties of thin films or scattering structures on semiconductor work pieces. In one embodiment the reflectometer utilizes vacuum ultraviolet (VUV) wavelength reflectometry. Multiple relative reflectance measurements are used to overcome effects of the inevitable contamination buildup that occurs when using optical systems in the VUV region. While advantageous for VUV wavelengths, the method described herein is generally applicable to any wavelength range, and is advantageous in situations where stable reference samples are not available. | 09-03-2009 |
20100171959 | Method and apparatus for using multiple relative reflectance measurements to determine properties of a sample using vacuum ultra violet wavelengths - A method and apparatus is disclosed for measuring properties of an unknown sample. A reflectometer and one or more reference pieces is provided. A set of data is collected from the unknown sample and a combination of the reference pieces. A combination of the sample and reference piece data independent of incident intensity is used to determine a property of the unknown sample without calibrating incident reflectometer intensity. The method and apparatus disclosed can measure properties of thin films or scattering structures on semiconductor work pieces. In one embodiment the reflectometer utilizes vacuum ultraviolet (VUV) wavelength reflectometry. Multiple relative reflectance measurements are used to overcome effects of the inevitable contamination buildup that occurs when using optical systems in the VUV region. While advantageous for VUV wavelengths, the method described herein is generally applicable to any wavelength range, and is advantageous in situations where stable reference samples are not available. | 07-08-2010 |
20100177324 | Method and apparatus for optically measuring periodic structures using orthogonal azimuthal sample orientation - An optical metrology apparatus for measuring periodic structures using multiple incident azimuthal (phi) and polar (theta) incident angles is described. One embodiment provides the enhanced calculation speed for the special case of phi=90 incidence for 1-D (line and space) structures, which has the incident plane parallel to the grating lines, as opposed to the phi=0 classical mounting, which has incident plane perpendicular to the grating lines. The enhancement reduces the computation time of the phi=90 case to the same order as the corresponding phi=0 case, and in some cases the phi=90 case can be significantly faster. One advantageous configuration consists of two measurements for each sample structure, one perpendicular to the grating lines and one parallel. This provides additional information about the structure, equivalent to two simultaneous angles of incidence, without excessive increase in computation time. Alternately, in cases where the computation for phi=90 is faster than the corresponding phi=0 incidence, it may be advantageous to measure parallel to the grating lines only. In the case where two sets of incident angles are used, the incident light can be polarized to provide a total of four sets of data—R | 07-15-2010 |
20100277741 | COMBINED OPTICAL METROLOGY TECHNIQUES - A method and apparatus is disclosed for using below deep ultra-violet (DUV) wavelength reflectometry for measuring properties of diffracting and/or scattering structures on semiconductor work-pieces is disclosed. The system can use polarized light in any incidence configuration, but one technique disclosed herein advantageously uses un-polarized light in a normal incidence configuration. The system thus provides enhanced optical measurement capabilities using below deep ultra-violet (DUV) radiation, while maintaining a small optical module that is easily integrated into other process tools. A further refinement utilizes an r-θ stage to further reduce the footprint. | 11-04-2010 |
20100290033 | Method and System for Using Reflectometry Below Deep Ultra-Violet (DUV) Wavelengths for Measuring Properties of Diffracting or Scattering Structures on Substrate Work Pieces - A method and apparatus is disclosed for using below deep ultra-violet (DUV) wavelength reflectometry for measuring properties of diffracting and/or scattering structures on semiconductor work-pieces is disclosed. The system can use polarized light in any incidence configuration, but one technique disclosed herein advantageously uses un-polarized light in a normal incidence configuration. The system thus provides enhanced optical measurement capabilities using below deep ultra-violet (DUV) radiation, while maintaining a small optical module that is easily integrated into other process tools. A further refinement utilizes an r-θ stage to further reduce the footprint. | 11-18-2010 |
20100294922 | Automated calibration methodology for VUV metrology system - A calibration pad having multiple calibration sites is provided. A particular calibration site may be utilized until that particular site has been determined to have become unacceptable for further use, for example from contamination, in which case the calibration processes may then move to use a different calibration site(s) on the calibration pad(s). A variety of techniques may be utilized to provide the determination that a site is no longer acceptable for use. Movement may thus occur over time from site to site for use in a calibration process. A variety of criteria may be established to determine when to move to another site. Though the designation of a site as “bad” may be based upon measured reflectance data, other criteria may also be used. For example, the number of times a site has been exposed to light may be the criteria for designating a site as bad. Alternatively the cumulative exposure of a site may be the criteria. Further, the plurality of calibration sites that are provided on the single calibration pad may be pre-evaluated so as to initially screen out unacceptable calibration sites prior to use. The techniques provided may be utilized in calibration processes which utilize a single calibration sample or processes which require a plurality of calibration samples. | 11-25-2010 |
20120170021 | Method and apparatus for providing multiple wavelength reflectance magnitude and phase for a sample - A method and apparatus for providing multiple wavelength reflectance magnitude and phase for a sample is disclosed. In one embodiment, at least one of magnitude and/or phase is determined for at least some vacuum ultra-violet (VUV) wavelengths. One embodiment of the method utilizes a broadband referencing reflectometer to obtain an interference signal between reference and sample arms, in addition to the reflected intensities from each arm separately. Combined with a calibration of absolute reflectance magnitude and phase using one or more known calibration standards, the intensity and interference data can be used to obtain reflectance and phase for an unknown sample. In some embodiments, one or more properties of the calibration samples can be determined during the calibration procedure, even when the calibration samples are not stable under operating conditions, or with respect to the manufacture of the calibration samples. | 07-05-2012 |
20120182542 | Optical Vacuum Ultra-Violet Wavelength Nanoimprint Metrology - An optical metrology apparatus for measuring nanoimprint structures using Vacuum Ultra-Violet (VUV) light is described. | 07-19-2012 |
20120268740 | METHODS AND APPARATUS FOR VACUUM ULTRAVIOLET (VUV) OR SHORTER WAVELENGTH CIRCULAR DICHROISM SPECTROSCOPY - A highly efficient vacuum ultraviolet circular dichroism spectrometer is provided; the spectrometer suitable for laboratory use or for integration into a beam line at a synchrotron radiation facility. In one embodiment, a spectroscopic circular dichroism instrument is provided; the instrument configured so as to enable circular dichroism data to be simultaneously obtained for multiple wavelengths of light. The instrument may be further configured to operate in at least a portion of the vacuum ultraviolet wavelength region. | 10-25-2012 |
20140192343 | Vacuum Ultraviolet Absorption Spectroscopy System And Method - An efficient absorption spectroscopy system is provided. The spectroscopy system may be configured to measure solid, liquid or gaseous samples. Vacuum ultra-violet wavelengths may be utilized. Some of the disclosed techniques can be used for detecting the presence of trace concentrations of gaseous species. A preferable gas flow cell is disclosed. Some of the disclosed techniques may be used with a gas chromatography system so as to detect and identify species eluted from the column. Some of the disclosed techniques may be used in conjunction with an electrospray interface and a liquid chromatography system so as to detect and identify gas phase ions of macromolecules produced from solution. Some of the disclosed techniques may be used to characterize chemical reactions. Some of the disclosed techniques may be used in conjunction with an ultra short-path length sample cell to measure liquids. | 07-10-2014 |
20140264053 | Methods And Apparatus For Vacuum Ultraviolet (VUV) Or Shorter Wavelength Circular Dichroism Spectroscopy - A highly efficient vacuum ultraviolet circular dichroism spectrometer is provided; the spectrometer suitable for laboratory use or for integration into a beam line at a synchrotron radiation facility. In one embodiment, a spectroscopic circular dichroism instrument is provided; the instrument configured so as to enable circular dichroism data to be simultaneously obtained for multiple wavelengths of light. The instrument may be further configured to operate in at least a portion of the vacuum ultraviolet wavelength region. | 09-18-2014 |
20150059440 | Vacuum Ultraviolet Absorption Spectroscopy System And Method - An efficient absorption spectroscopy system is provided. The spectroscopy system may be configured to measure solid, liquid or gaseous samples. Vacuum ultra-violet wavelengths may be utilized. Some of the disclosed techniques can be used for detecting the presence of trace concentrations of gaseous species. A preferable gas flow cell is disclosed. Some of the disclosed techniques may be used with a gas chromatography system so as to detect and identify species eluted from the column. Some of the disclosed techniques may be used in conjunction with an electrospray interface and a liquid chromatography system so as to detect and identify gas phase ions of macromolecules produced from solution. Some of the disclosed techniques may be used to characterize chemical reactions. Some of the disclosed techniques may be used in conjunction with an ultra short-path length sample cell to measure liquids. | 03-05-2015 |