Patent application number | Description | Published |
20080204693 | Substrate Support Method - The present invention includes a method for supporting a substrate that features a chuck body having a body surface with a pin extending therefrom having a contact surface lying in a plane, with the pin being movably coupled to the chuck body to move with respect to the plane. To that end, the method includes disposing the substrate upon two spaced-apart bodies; and moving one of the two spaced-apart bodies away from the substrate. | 08-28-2008 |
20090026657 | Alignment System and Method for a Substrate in a Nano-Imprint Process - A transparent imprint template mold is configured with gratings surrounding the active imprint area. The gratings are fabricated at the same time as the active area and thus accurately define the active area with respect to the gratings. The substrate is positioned in tool coordinates under the template mold. A sensor system generates a beam of optical energy and receives reflected energy only at a specific angular window and is used to locate the template mold. The sensor system is scanned to locate the substrate and the gratings in tool coordinates. In this manner, the relative position of the template mold is determined with respect to the substrate in tool coordinates. The substrate is then accurately positioned with respect to the template mold. The system may be used to track imprinted pattern position relative to the substrate and to determine concentricity of patterns to substrates. | 01-29-2009 |
20090169662 | Enhanced Multi Channel Alignment - An imprint lithography system operable for imprinting a pattern into a material deposited between an imprint mold and a substrate, the system including, inter alia, a first set of imaging units positioned at a first angle relative to normal of the substrate; and a second set of imaging units positioned at a second angle relative to normal of the substrate, wherein the first and second angles are not equal to each other. | 07-02-2009 |
20100007868 | Substrate Support System Having a Plurality of Contact Lands - The present invention includes a substrate support system having a chuck body. The chuck body includes a body surface with a pin extending therefrom having a contact surface lying in a plane. The pin may be movably coupled to the chuck body to move with respect to the plane. The pin may also include a cross-member having multiple contact lands. | 01-14-2010 |
20100038827 | Interferometric Analysis Method for the Manufacture of Nano-Scale Devices - The present invention features a method to determine relative spatial parameters between two coordinate systems, which may be a mold and a region of a substrate in which mold is employed to generate a pattern. The method includes sensing relative alignment between the two coordinate systems at multiple points and determines relative spatial parameters therebetween. The relative spatial parameters include a relative area and a relative shape. | 02-18-2010 |
20100102469 | Strain and Kinetics Control During Separation Phase of Imprint Process - Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process. | 04-29-2010 |
20100109202 | Substrate Alignment - Systems and methods for imprinting a patterned layer on a substrate are described. Features of patterned layer may be concentrically imprinted in relation to a shaft positioned on a substrate chuck. The substrate may be biased using a radius difference between a diameter of the shaft and an inner diameter of the substrate in relation to a point on an inner edge of the substrate. | 05-06-2010 |
20100110434 | Alignment for Edge Field Nano-Imprinting - Systems and methods for alignment of template and substrate at the edge of substrate are described. | 05-06-2010 |
20110026039 | Alignment System and Method for a Substrate in a Nano-Imprint Process - Methods described include placing a sensor system over a substrate positioned on a chuck. The sensor system generates a beam of optical energy towards the substrate and is configured to receive optical energy deflected from the substrate. The sensor system generates sensor signals in response to variations in received optical energy from the substrate and the chuck. | 02-03-2011 |