Paul Frank
Paul Frank Luehrmann, Santa Fe, NM US
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20080266538 | Lithographic processing cell, lithographic apparatus, track and device manufacturing method - A rework station and a metrology device(s) are incorporated into a lithographic processing cell so that a faulty substrate can be reworked directly and reprocessed without, for example, an overhead involved in changing masks, etc. | 10-30-2008 |
20110007314 | Method and apparatus for angular-resolved spectroscopic lithography characterization - An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference. | 01-13-2011 |
20120038929 | Method and Apparatus for Angular-Resolved Spectroscopic Lithography Characterization - An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference. | 02-16-2012 |
20140055788 | Method and Apparatus for Angular-Resolved Spectroscopic Lithography Characterization - An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference. | 02-27-2014 |
20140233025 | Method and Apparatus for Angular-Resolved Spectroscopic Lithography Characterization - An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference. | 08-21-2014 |
Paul Frank Luehrmann, Eindhoven NL
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20140168620 | METHOD OF CALIBRATING A LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND ASSOCIATED DATA PROCESSING APPARATUS AND COMPUTER PROGRAM PRODUCT - A lithography tool is calibrated using a calibration substrate having a set of first marks distributed across its surface in a known pattern. The tool is operated to apply a pattern comprising a plurality of second marks at various positions on the substrate, each second mark overlying one of the first marks and being subject to an overlay error dependent on an apparatus-specific deviation. The second marks are applied by multiple exposures while the substrate remains loaded in the tool. An operating parameter of the apparatus is varied between the exposures. An overlay error is measured and used to calculate parameter-specific, apparatus-specific calibration data based on knowledge of the parameter variation used for each exposure. | 06-19-2014 |
20140168627 | Method of Operating a Lithographic Apparatus, Device Manufacturing Method and Associated Data Processing Apparatus and Computer Program Product - A reticle is loaded into a lithographic apparatus. The apparatus performs measurements on the reticle, so as to calculate alignment parameters for transferring the pattern accurately to substrates. Tests are performed to detect possible contamination of the reticle or its support. Either operation proceeds with a warning, or the patterning of substrates is stopped. The test uses may use parameters of the alignment model itself, or different parameters. The integrity parameters may be compared against reference values reflecting historic measurements, so that sudden changes in a parameter are indicative of contamination. Integrity parameters may be calculated from residuals of the alignment model. In an example, height residuals are used to calculate parameters of residual wedge (Rx′) and residual roll (Ryy′). From these, integrity parameters expressed as height deviations are calculated and compared against thresholds. | 06-19-2014 |
Paul Frank Munsch, Stamford, CT US
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20140129337 | PROXIMITY-BASED OFFERS FULLY CONTAINED WITHIN AN EMBEDDED AD UNIT - Computer systems, storage media encoded with software, and methods comprising a first processing device configured to generate and deliver an ad unit for at least one good or service offered at a physical retail outlet, the ad unit delivered to an application executing on a second processing device, the ad unit providing: a display of one or more outlets, the outlets offering the at least one good or service, the outlets located within a first threshold distance from the second processing device; directions from the location of the second processing device to a selected outlet; and at least one proximity-based offer, the offer triggered by presence of the second processing device within a second threshold distance from the selected outlet; provided that the display of one or more outlets, the directions, and the at least one proximity based-offer are provided within the application executing on the second processing device. | 05-08-2014 |
Paul Frank Sciortino, Jr., Bridgewater, NJ US
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20120081703 | Highly Efficient Plamonic Devices, Molecule Detection Systems, and Methods of Making the Same - A plasmonic device has a plurality of nanostructures extending from a substrate. Each of the plurality of nanostructures preferably includes a core, a coating of intermediate material covering at least a portion of the core, and a coating of a plasmonic material. Devices are preferably manufactured using lithography to create the cores, and Plasma Enhanced Chemical Vapor Deposition (PECVD) to deposit the intermediate and/or plasmonic materials. Cores can be arranged in any suitable pattern, including one-dimensional or two-dimensional patterns. Devices can be used in airborne analyte detectors, in handheld roadside controlled substance detectors, in genome sequencing device, and in refraction detectors. | 04-05-2012 |