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Patra

Asit Patra, Rehovot IL

Patent application numberDescriptionPublished
20100283040SELENOPHENES AND SELENOPHENE-BASED POLYMERS, THEIR PREPARATION AND USES THEREOF - This invention is directed to selenophene compounds, selenophene-based polymers (polyselenophene), processes for the preparation of the same and uses thereof. The polyselenophenes of this invention have high conductivity and can be used as electrodes in various devices such as in electrochromic devices, batteries, solar cells, optical amplifiers, organic light emitting diodes, and the like.11-11-2010

Chittaranjan Patra, Rochester, MN US

Patent application numberDescriptionPublished
20100009445RARE EARTH NANOPARTICLES - This document provides methods and materials related to rare earth particles such as rare earth nanorods (e.g., inorganic lanthanide hydroxide nanorods). For example, rare earth (e.g., lanthanide) particles such as europium hydroxide nanorods, methods and materials for making rare earth particles (e.g., europium hydroxide nanorods), and methods and materials for using rare earth particles (e.g., europium hydroxide nanorods) as an imaging agent and/or to promote angiogenesis are provided.01-14-2010

Debasis Patra, Manlius, NY US

Patent application numberDescriptionPublished
20090318450COMPOSITIONS FOR MODULATING A KINASE CASCADE AND METHODS OF USE THEREOF - The invention relates to compositions comprising 2-(5-(4-(2-morpholinoethoxy)phenyl)pyridin-2-yl)-N-benzylacetamide and its mesylate and dihydrochloride salts. The invention provides an efficient process for the synthesis of 2-(5-(4-(2-morpholinoethoxy)phenyl)pyridin-2-yl)-N-benzylacetamide and its mesylate and dihydrochloride salts and methods for modulating one or more components of a kinase cascade using the compositions of the invention. The present invention also provides a novel polymorph of the mesylate salt of 2-(5-(4-(2-morpholinoethoxy)phenyl)pyridin-2-yl)-N-benzylacetamide (Form A), characterized by a unique X-ray diffraction pattern and Differential Scanning Calorimetry profile, as well as a unique crystalline structure.12-24-2009
20110201611Process for the Preparation of Compositions for Modulating a Kinase Cascade and Methods of Use Thereof - The invention relates to compositions comprising 2-(5-(4-(2-morpholinoethoxy)phenyl)pyridin-2-yl)-N-benzylacetamide and its mesylate and dihydrochloride salts. More specifically, the invention provides an efficient process for the synthesis of 2-(5-(4-(2-morpholinoethoxy)phenyl)pyridin-2-yl)-N-benzylacetamide and its mesylate and dihydrochloride salts and methods for modulating one or more components of a kinase cascade using the compositions of the invention.08-18-2011
20110201612Compositions for Modulating a Kinase Cascade and Methods of Use Thereof - The invention relates to compositions comprising 2-(5-(4-(2-morpholinoethoxy)phenyl)pyridin-2-yl)-N-benzylacetamide and its mesylate and dihydrochloride salts. The invention provides an efficient process for the synthesis of 2-(5-(4-(2-morpholinoethoxy)phenyl)pyridin-2-yl)-N-benzylacetamide and its mesylate and dihydrochloride salts and methods for modulating one or more components of a kinase cascade using the compositions of the invention. The present invention also provides a novel polymorph of the mesylate salt of 2-(5-(4-(2-morpholinoethoxy)phenyl)pyridin-2-yl)-N-benzylacetamide (Form A), characterized by a unique X-ray diffraction pattern and Differential Scanning Calorimetry profile, as well as a unique crystalline structure.08-18-2011

Hirak Patra, Andharia IN

Patent application numberDescriptionPublished
20120021453LABEL-FREE CELL SORTING USING NEAR INFRARED EMISSION - Disclosed are methods and systems for identifying and sorting cells based on a near-infrared emission pattern of the cell in response to excitation at 630±nm. The NIR emission pattern can be used for monitoring and sorting of cells in a label-free manner, and thus provides a positive method for selecting cells, such as stem cells, for use in therapy.01-26-2012

Hirak Kumar Patra, Midnapore IN

Patent application numberDescriptionPublished
20110046489SYSTEMS AND METHODS EMPLOYING GIANT STOKES SHIFT - A method comprising exposing a sample comprising water to near infrared (NIR) light and detecting the presence of one or more objects by measuring a Stokes shift in the emission spectra in the near infrared.02-24-2011

Madan M. Patra, Santa Clara, CA US

Patent application numberDescriptionPublished
20100199136METHOD AND APPARATUS FOR DETECTING AND CORRECTING ERRORS IN A PARALLEL TO SERIAL CIRCUIT - A circuit has first portion that receives data at a first rate; a second portion that outputs data at a second rate synchronized to and different from the first rate; a third portion that transfers data from the first portion to the second portion; and a fourth portion that generates an error detected signal in response to a disruption in the synchronism between the first and second rates. A different aspect involves a method that includes: receiving data at a first rate in a first portion; transferring data from the first portion to a second portion; outputting data at a second rate from the second portion, the second rate being synchronized to and different from the first rate; and generating an error detected signal in response to detection of a disruption in the synchronism between the first and second rates.08-05-2010

Manoj Patra, Gachibowli IN

Patent application numberDescriptionPublished
20110161957Virtualized Eco-Friendly Remote Presentation Session Role - Systems, methods, and computer-readable storage media are disclosed for virtualized eco-friendly remote presentation session roles. In an embodiment, a connection broker monitors the servers of a server farm, and, based upon characteristics of remote presentation sessions served by VMs executing on those servers, directs VMs on those servers to be migrated between servers, changed from sleeping to running or vice versa, or other operations that may improve the performance of the server farm as a whole.06-30-2011

Michael Patra, Oberkochen DE

Patent application numberDescriptionPublished
20090262324ILLUMINATION OPTICS FOR PROJECTION MICROLITHOGRAPHY AND RELATED METHODS - A microlithographic projection exposure apparatus (10-22-2009
20100039629METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument.02-18-2010
20100265482ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS - An illumination system of a micro-lithographic projection exposure apparatus is provided, which is configured to illuminate a mask positioned in a mask plane. The system includes a pupil shaping optical subsystem and illuminator optics that illuminate a beam deflecting component. For determining a property of the beam deflecting component, an intensity distribution in a system pupil surface of the illumination system is determined. Then the property of the beam deflecting component is determined such that the intensity distribution produced by the pupil shaping subsystem in the system pupil surface approximates the intensity distribution determined before. At least one of the following aberrations are taken into account in this determination: (i) an aberration produced by the illuminator optics; (ii) an aberration produced by the pupil shaping optical subsystem; (iii) an aberration produced by an optical element arranged between the system pupil surface and the mask plane.10-21-2010
20100283984MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%.11-11-2010
20100283985MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%.11-11-2010
20110194090OPTICAL RASTER ELEMENT, OPTICAL INTEGRATOR AND ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An optical raster element for an illumination system of a microlithographic projection exposure apparatus includes an array of refractive optical elements extending on a planar or curved surface. At least two of the optical elements are arranged side by side along a reference direction with a pitch of less than 2 mm. They have a height perpendicular to the surface of less than 50 μm and a surface profile along the reference direction which includes a central section, two transition sections adjacent the central section and two end sections adjacent the transition sections. The curvatures in the two transition sections are greater than the curvatures in the central section and the end sections. The optical raster element is intended for being used as a first channel plate in an optical integrator (honeycomb condenser) and can reduce the maximum light intensities occurring in or behind the second channel plate.08-11-2011
20110304837PROJECTION EXPOSURE METHOD, PROJECTION EXPOSURE APPARATUS, LASER RADIATION SOURCE AND BANDWIDTH NARROWING MODULE FOR A LASER RADIATION SOURCE - In a projection exposure method for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective, laser radiation having a spectral intensity distribution I(ω) dependent on the angular frequency ω is used. The laser radiation is characterized by an aberration parameter α in accordance with:12-15-2011
20120002185MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A microlithographic projection exposure apparatus includes an optical surface, which may be formed by a plurality of micro-mirrors, and a measurement device which is configured to measure a parameter related to the optical surface at a plurality of locations. The measurement device includes an illumination unit with a plurality of illumination members, each having a light exit facet. An optical imaging system establishes an imaging relationship between an object plane in which at least two light exit facets are arranged, and an image plane which at least substantially coincides with the optical surface. A detector unit measures the property of measuring light after it has interacted with the optical surface, and an evaluation unit determines the surface related parameter for each of the locations on the basis of the properties determined by the detector unit.01-05-2012

Patent applications by Michael Patra, Oberkochen DE

Prabir K. Patra, Houston, TX US

Patent application numberDescriptionPublished
20080249228Nanocomposite Polymers - Nanocomposite compositions containing a graft polymer and a filler such as nano-sized silica having flame resistant properties are described.10-09-2008

Pranab K. Patra, Singapore SG

Patent application numberDescriptionPublished
20100210744Mesoporous Polymer Colloids - The invention provides a particulate material comprising porous polymeric microparticles having a mesoporous structure. A process for making the particles is also presented. The process comprises impregnating a porous microparticulate template material with a liquid comprising one or more monomers. The one or more monomers are then polymerised in and/or on the template material to form a polymer, and the template material is then removed to produce the particulate material.08-19-2010
20110112310AZIRIDINE SYNTHESIS - The invention relates to a process for making an aziridine. wherein an aldehyde, a nitroso compound and a Michael acceptor are reacted in the presence of an N-heterocyclic carbene (NHC) catalyst.05-12-2011

Priyadarsan Patra, Portland, OR US

Patent application numberDescriptionPublished
20090240454METHOD AND SYSTEM FOR VALIDATING A PROCESSOR IN A SEMICONDUCTOR ASSEMBLY - A method of conducting validation is provided. The method includes providing a processor that does not include a validation function and providing an auxiliary die coupled to the processor. The method also includes receiving validation data from the processor in the auxiliary die and conducting validation of the processor in the auxiliary die.09-24-2009
20090248781METHOD AND DEVICE FOR DYNAMICALLY VERIFYING A PROCESSOR ARCHITECTURE - A method and device may be useful for dynamically verifying a processor architecture at runtime. The checker may more efficiently and cheaply verify at least some of the functionality provided by the execution unit of the processor architecture. The checker may verify operations such as addition, subtraction, multiplication, and division.10-01-2009

Subrata Patra, Gujarat IN

Patent application numberDescriptionPublished
20100266482Process for the Time Recovery of Sulphate of Potash (SOP) From Sulphate Rich Bittern - The present invention relates to a process for the recovery of sulphate of potash (SOP) from bittern. Kainite is obtained by fractional crystallization of the bittern. Kainite is converted into schoenite with simultaneous removal of NaCl and the filtrate (SEL) is used for production of KCl. Schoenite is reacted with aqueous KCl to yield SOP and the filtrate (KEL) is recycled in the kainite to schoenite conversion step. The production of KCl from SEL is carried out with the aid of dipicrylamine (DPA). Lime is treated with DPA in water for the production of highly soluble Ca (DPA)2, which in turn treated with SEL to produce insoluble K(DPA). K(DPA) is treated with HCl to produce KCl and insoluble DPA, which can be recycled for the production of Ca (DPA)2. The aqueous KCl thus obtained is treated with schoenite to prepare SOP. The KEL obtained along with SOP is recycled to generate schoenite.10-21-2010

Susanta Patra, Bangalore IN