Patent application number | Description | Published |
20120217222 | PLASMA PROCESSING SYSTEMS INCLUDING SIDE COILS AND METHODS RELATED TO THE PLASMA PROCESSING SYSTEMS - A plasma processing system for generating plasma to process a wafer. The plasma processing system includes a set of top coils for initiating the plasma, a set of side coils for affecting distribution of the plasma, and a chamber structure for containing the plasma. The chamber structure includes a chamber wall and a dielectric member. The dielectric member includes a top, a vertical wall, and a flange. The top is connected through the vertical wall to the flange, and is connected through the vertical wall and the flange to the chamber wall. The set of top coils is disposed above the top. The set of side coils surrounds the vertical wall. A vertical inner surface of the vertical wall is configured to be exposed to the plasma. The inner diameter of the vertical wall is smaller than the inner diameter of the chamber wall. | 08-30-2012 |
20120273130 | Internal Faraday Shield Having Distributed Chevron Patterns and Correlated Positioning Relative to External Inner and Outer TCP Coil - Plasma processing chambers having internal Faraday shields with defined groove configurations, are defined. In one example, the chamber includes an electrostatic chuck for receiving a substrate and a dielectric window connected to a top portion of the chamber, where the dielectric window disposed over the electrostatic chuck. Also included is a Faraday shield disposed inside of the chamber and defined between the electrostatic chuck and the dielectric window. The Faraday shield includes an inner zone having an inner radius range, a middle zone having a middle radius range, an outer zone having an outer radius range, where the inner zone is adjacent to the middle zone, and the middle zone being adjacent to the outer zone. Further defining the Faraday shield is a first set of radial slots (A) extending through the inner zone, the middle zone, and the outer zone, a second set of radial slots (C) extending through only the outer zone; and a third set of radial slots (B) extending through the middle zone and outer zone. In this configuration, the first, second and third radial slots are arranged radially around the Faraday shield in a repeating pattern of slots A, C, B, and C. | 11-01-2012 |
20120305190 | GAS DISTRIBUTION SYSTEM FOR CERAMIC SHOWERHEAD OF PLASMA ETCH REACTOR - A gas delivery system for a ceramic showerhead includes gas connection blocks and a gas ring, the gas connection blocks mounted on the gas ring such that gas outlets in the blocks deliver process gas to gas inlets in an outer periphery of the showerhead. The gas ring includes a bottom ring with channels therein and a welded cover plate enclosing the channels. The gas ring can include a first channel extending ½ the length of the gas ring, two second channels connected at midpoints thereof to downstream ends of the first channel, and four third channels connected at midpoints thereof to downstream ends of the second channels. the cover plate can include a first section enclosing the first channel, two second sections connected at midpoints thereof to ends of the first section, and third sections connected at midpoints thereof to ends of the second sections. The channels are arranged such that the process gas travels equal distances for a single gas inlet in the gas ring to eight outlets in the cover ring allowing equal gas flow. | 12-06-2012 |
20120309204 | GAS DISTRIBUTION SHOWERHEAD FOR INDUCTIVELY COUPLED PLASMA ETCH REACTOR - A two piece ceramic showerhead includes upper and lower plates which deliver process gas to an inductively coupled plasma processing chamber. The upper plate overlies the lower plate and includes radially extending gas passages which extend inwardly from an outer periphery of the upper plate, axially extending gas passages in fluid communication with the radially extending gas passages and an annular recess forming a plenum between the upper and lower plates. The lower plate includes axially extending gas holes in fluid communication with the plenum. The upper plate can include eight radially extending gas passages evenly spaced around the periphery of the upper plate and the lower plate can include inner and outer rows of gas holes. The two piece ceramic showerhead forms a dielectric window of the chamber through which radiofrequency energy generated by an antenna is coupled into the chamber. A gas delivery system delivers process gas to a plenum between the upper and lower plates having a gas volume of no greater than 500 cm | 12-06-2012 |
20120322270 | POWERED GRID FOR PLASMA CHAMBER - A plasma processing chamber and methods for operating the chamber are provided. An exemplary chamber includes an electrostatic chuck for receiving a substrate and a dielectric window connected to a top portion of the chamber. An inner side of dielectric window faces a plasma processing region that is above the electrostatic chuck and an outer side of the dielectric window is exterior to the plasma processing region. Inner and outer coils are disposed above the outer side of the dielectric window, and the inner and outer coils are connected to a first RF power source. A powered grid is disposed between the outer side of dielectric window and the inner and outer coils. The powered grid is connected to a second RF power source that is independent from the first RF power source. | 12-20-2012 |
20130087283 | Systems For Cooling RF Heated Chamber Components - In one embodiment, a plasma processing device may include a dielectric window, a vacuum chamber, an energy source, and at least one air amplifier. The dielectric window may include a plasma exposed surface and an air exposed surface. The vacuum chamber and the plasma exposed surface of the dielectric window can cooperate to enclose a plasma processing gas. The energy source can transmit electromagnetic energy through the dielectric window and form an elevated temperature region in the dielectric window. The at least one air amplifier can be in fluid communication with the dielectric window. The at least one air amplifier can operate at a back pressure of at least about 1 in-H | 04-11-2013 |
20130135058 | TCCT MATCH CIRCUIT FOR PLASMA ETCH CHAMBERS - A match circuit includes the following: a power input circuit coupled to an RF source; an inner coil input circuit coupled between the power input circuit and an input terminal of an inner coil, the inner coil input circuit including an inductor and a capacitor coupled in series to the inductor, the inductor connecting to the power input circuit, and the capacitor connecting to the input terminal of the inner coil, a first node being defined between the power input circuit and the inner coil input circuit; an inner coil output circuit coupled between an output terminal of the inner coil and ground, the inner coil output circuit defining a direct pass-through connection to ground; an outer coil input circuit coupled between the first node and an input terminal of an outer coil; and an outer coil output circuit coupled between an output terminal of the outer coil and ground. | 05-30-2013 |
20130186568 | Faraday Shield Having Plasma Density Decoupling Structure Between TCP Coil Zones - A Faraday shield and a plasma processing chamber incorporating the Faraday shield is are provided. The plasma chamber includes an electrostatic chuck for receiving a substrate, a dielectric window connected to a top portion of the chamber, the dielectric window disposed over the electrostatic chuck, and a Faraday shield. The Faraday shield is disposed inside of the chamber and defined between the electrostatic chuck and the dielectric window. The Faraday shield includes an inner zone having an inner radius range that includes a first and second plurality of slots and an outer zone having an outer radius range that includes a third plurality of slots. The inner zone is adjacent to the outer zone. The Faraday shield also includes a band ring separating the inner zone and the outer zone, such that the first and second plurality of slots do not connect with the third plurality of slots. | 07-25-2013 |
20130228283 | Temperature Control in RF Chamber with Heater and Air Amplifier - Systems, methods, and computer programs are presented for controlling the temperature of a window in a semiconductor manufacturing chamber. One apparatus includes an air amplifier, a plenum, a heater, a temperature sensor, and a controller. The air amplifier is coupled to pressurized gas and generates, when activated, a flow of air. The air amplifier is also coupled to the plenum and the heater. The plenum receives the flow of air and distributes the flow of air over a window of the plasma chamber. When the heater is activated, the flow of air is heated during processing, and when the heater is not activated, the flow of air cools the window. The temperature sensor is situated about the window of the plasma chamber, and the controller is defined to activate both the air amplifier and the heater based on a temperature measured by the temperature sensor. | 09-05-2013 |
20130244440 | CHAMBER FILLER KIT FOR PLASMA ETCH CHAMBER USEFUL FOR FAST GAS SWITCHING - A chamber filler kit for an inductively coupled plasma processing chamber in which semiconductor substrates are processed by inductively coupling RF energy through a window facing a substrate supported on a cantilever chuck. The kit includes at least one chamber filler which reduces the lower chamber volume in the chamber below the chuck. The fillers of the kit can be mounted in a standard chamber having a chamber volume of over 60 liters and by using different sized chamber fillers it is possible to reduce the chamber volume to provide desired gas flow conductance and accommodate changes in vacuum pressure during processing of the substrate. The chamber filler kit can be used to modify a standard chamber to accommodate different processing regimes such as rapid alternating processes wherein wide pressure changes are needed without varying a gap between the substrate and the window. | 09-19-2013 |
20130256271 | METHODS AND APPARATUSES FOR CONTROLLING PLASMA IN A PLASMA PROCESSING CHAMBER - Methods and apparatus for controlling plasma in a plasma processing system having at least an inductively coupled plasma (ICP) processing chamber are disclosed. The ICP chamber employs at least a first/center RF coil, a second/edge RF coil disposed concentrically with respect to the first/center RF coil, and a RF coil set having at least a third/mid RF coil disposed concentrically with respect to the first/center RF coil and the second/edge RF coil in a manner such that the third/mid RF coil is disposed in between the first/center RF coil and the second/edge RF coil. During processing, RF currents in the same direction are provided to the first/center RF coil and the second/edge RF coil while RF current in the reverse direction (relative to the direction of the currents provided to the first/center RF coil and the second/edge RF coil) is provided to the third/mid RF coil. | 10-03-2013 |
20140065827 | GAS DISTRIBUTION SHOWERHEAD FOR INDUCTIVELY COUPLED PLASMA ETCH REACTOR - A two piece ceramic showerhead includes upper and lower plates which deliver process gas to an inductively coupled plasma processing chamber. The upper plate overlies the lower plate and includes radially extending gas passages which extend inwardly from an outer periphery of the upper plate, axially extending gas passages in fluid communication with the radially extending gas passages and an annular recess forming a plenum between the upper and lower plates. The lower plate includes axially extending gas holes in fluid communication with the plenum. The two piece ceramic showerhead forms a dielectric window of the chamber through which radiofrequency energy generated by an antenna is coupled into the chamber. The gas delivery system is operable to supply an etching gas and a deposition gas into the processing chamber such that the etching gas in the plenum can be replaced with the deposition gas. | 03-06-2014 |
20140302678 | INTERNAL PLASMA GRID APPLICATIONS FOR SEMICONDUCTOR FABRICATION - The embodiments disclosed herein pertain to improved methods and apparatus for etching a semiconductor substrate. A plasma grid assembly is positioned in a reaction chamber to divide the chamber into upper and lower sub-chambers. The plasma grid assembly may include one or more plasma grids having slots of a particular aspect ratio, which allow certain species to pass through from the upper sub-chamber to the lower sub-chamber. In some cases, an electron-ion plasma is generated in the upper sub-chamber. Electrons that make it through the grid to the lower sub-chamber are cooled as they pass through. In some cases, this results in an ion-ion plasma in the lower sub-chamber. The ion-ion plasma may be used to advantage in a variety of etching processes. | 10-09-2014 |
20140302680 | INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION - The embodiments disclosed herein pertain to improved methods and apparatus for etching a semiconductor substrate. A plasma grid assembly is positioned in a reaction chamber to divide the chamber into upper and lower sub-chambers. The plasma grid assembly may include one or more plasma grids having slots of a particular aspect ratio, which allow certain species to pass through from the upper sub-chamber to the lower sub-chamber. Where multiple plasma grids are used, one or more of the grids may be movable, allowing for tenability of the plasma conditions in at least the lower sub-chamber. In some cases, an electron-ion plasma is generated in the upper sub-chamber. Electrons that make it through the grid to the lower sub-chamber are cooled as they pass through. In some cases, this results in an ion-ion plasma in the lower sub-chamber. | 10-09-2014 |
20140302681 | INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION - The embodiments disclosed herein pertain to improved methods and apparatus for etching a semiconductor substrate. A plasma grid is positioned in a reaction chamber to divide the chamber into upper and lower sub-chambers. The plasma grid may have slots of a particular aspect ratio which allow certain species to pass through from the upper sub-chamber to the lower sub-chamber. In some cases, an electron-ion plasma is generated in the upper sub-chamber. Electrons that make it through the grid to the lower sub-chamber are cooled as they pass through. In some cases, this results in an ion-ion plasma in the lower sub-chamber. The lower sub-chamber plasma has a lower electron density, lower effective electron temperature, and higher negative ion:positive ion ratio as compared to the upper sub-chamber plasma. The disclosed embodiments may result in an etching process having good center to edge uniformity, selectivity, profile angle, and Iso/Dense loading. | 10-09-2014 |
20140367045 | Hammerhead TCP Coil Support for High RF Power Conductor Etch Systems - The chamber, having a ceramic window disposed in a ceiling of the chamber is provided. Included is a ceramic support having a plurality of spokes that extend from a center region to an outer periphery, and each of the spokes include a hammerhead shape that radially expands the ceramic support in a direction that is away from an axis of a spoke. Also included is a plurality of screw holes disposed through the ceramic support. The plurality of screw holes defined to enable screws to connect to a TCP coil having an inner and outer coil. The outer coil is to be disposed under the hammerhead shape of each of the spokes, and a radial gap is defined between each of the hammerhead shapes. The radial gap defines a non-continuous ring around the outer coil. A plurality of screws are disposed through the screw holes for attaching the TCP coil. | 12-18-2014 |
20150020969 | Air Cooled Faraday Shield and Methods for Using the Same - A processing chamber and a Faraday shield system for use in a plasma processing chambers are provided. One system includes a disk structure defining a Faraday shield, and the disk structure has a process side and a back side. The disk structure extends between a center region to a periphery region. The disk structure resides within the processing volume. The system also includes a hub having an internal plenum for passing a flow of air received from an input conduit and removing the flow of air from an output conduit. The hub has an interface surface that is coupled to the back side of the disk structure at the center region. A fluid delivery control is coupled to the input conduit of the hub. The fluid delivery control is configured with a flow rate regulator. The regulated air can be amplified or compressed dry air (CDA). | 01-22-2015 |
Patent application number | Description | Published |
20090241026 | SYSTEMS AND METHODS FOR DISPLAYING ROLLING SEQUENCES - Systems and methods for displaying rolling sequences, such as time periods or data status may include a user interface displaying multiple panes providing access to data relating to a given time category. If a time category were to pass, the access to data relating to a given time category may move to the position and format held by the prior time category. The invention may be applied to payroll processing or other human capital management software, which may provide means for displaying payroll information of employees for multiple time categories at once, and may enable payroll information to transition as time categories pass. | 09-24-2009 |
20090241048 | SYSTEMS AND METHODS FOR DISPLAYING A DATA MODIFICATION TIMELINE - Systems and methods for displaying data modification may include a user interface displaying a timeline with one or more items, which may include their own item timeline, corresponding to the same time period. A change made in item values may be reflected in the timeline. The invention may be applied to payroll or human capital management software, which may provide means for displaying payroll or human capital management information and how it is modified. Similarly, the timeline may also function as an information center that may display events and documents. | 09-24-2009 |
20090241053 | SYSTEMS AND METHODS FOR DISPLAYING ROLLING SEQUENCES - Systems and methods for displaying rolling sequences, such as time periods or data status may include a user interface displaying multiple panes providing access to data relating to a given time category. If a time category were to pass, the access to data relating to a given time category may move to the position and format held by the prior time category. The invention may be applied to payroll processing or other human capital management software, which may provide means for displaying payroll information of employees for multiple time categories at once, and may enable payroll information to transition as time categories pass. The invention may also provide measures to draw attention to relevant tasks at relevant times to decrease user-entry mistakes. | 09-24-2009 |
20090241055 | SYSTEMS AND METHODS FOR SIDE BY SIDE DISPLAY OF DATA MODIFICATION - Systems and methods for displaying data modification may include a user interface displaying a current data region and a new data region displayed side by side where the new data region may display one or more data interaction interface or data values corresponding to the current data and positioned to mirror the current data position in the current data region. The invention may be applied to payroll processing or human capital management software, which may provide means for displaying human capital management information, such as payroll information, and how it is modified. | 09-24-2009 |
20090241056 | SYSTEMS AND METHODS FOR DISPLAY AND MODIFICATION OF INFORMATION RELATED TO MULTIPLE BUSINESSES - Systems and methods for accessing data related to managing a business for multiple businesses may include a user interface with a businesses pane and an information pane. The businesses pane can provide a list of one or more business entities and allow a user to display data related to a selected business from the list of one or more business entities. An information pane can display data related to the selected business using one or more mini-tabs. The mini-tabs can allow for one or more sets of data to be displayed, including payroll or human capital management data. The information pane can display an interface to perform actionable tasks related to the selected business. | 09-24-2009 |
20100211485 | SYSTEMS AND METHODS OF TIME PERIOD COMPARISONS - The invention provides systems and methods of time period comparison. A user interface, which may be a part of a payroll or human capital management application or software, may be provided which may display payroll items, along with values for the payroll items during a first time period and second time period, as well as the differences in the values for the payroll items between the first and second time periods. A user may select one or more time periods or bases of comparison to be compared and a user interface may display values relating to the time periods accordingly. | 08-19-2010 |
Patent application number | Description | Published |
20080201122 | Method and Apparatus for Computer Modeling of an Adaptive Immune Response - The present invention relates generally to a computer model of an adaptive immune response. One embodiment of the invention relates to a computer model of an adaptive immune response within the framework of signals conveyed at the site of antigen exposure. Another embodiment of the model includes a representation of complex physiological regulatory mechanisms related to, for example, cellular dynamics, mediator production, antigen-presenting cell (APC) recruitment, APC maturation, lymphocyte activation, lymphocyte trafficking, and/or lymphocyte effector function. In another embodiment, the model can account for mediator production in response to antigen within a chronically inflamed peripheral tissue, as well as the regulatory effects of mediators on APC and lymphocyte population dynamics, including maturation, activation, and apoptosis, and the regulatory effects of mediators produced by APCs and lymphocytes on a chronically inflamed peripheral tissue. Another embodiment of the invention relates to an analytical model of an adaptive immune response. | 08-21-2008 |
20080249751 | Method and Apparatus for Modeling Atherosclerosis - The invention encompasses novel computer models of atherosclerosis and systems for predicting development and progression of atherosclerosis as well as associated cardiovascular risk. In particular, the computer model of atherosclerosis comprises a) a cholesterol metabolism module; b) an atherogenesis module; and c) a plaque stability module. The computer model optionally further comprises a cardiovascular risk module. | 10-09-2008 |
20090132219 | Apparatus and Method for Validating a Computer Model - An apparatus and method for validating a computer model is described. In one embodiment, a computer-readable medium comprises instructions to associate a set of configurations of a computer model with a stimulus-response test, each configuration of the set of configurations representing a different model scenario, the stimulus-response test defining a modification to each configuration of the set of configurations. The computer-readable medium also comprises instructions to apply the stimulus-response test to the set of configurations to produce a simulated response for each configuration of the set of configurations and instructions to compare the simulated responses for the set of configurations with an expected response to the stimulus-response test. | 05-21-2009 |
20090150134 | Simulating Patient-Specific Outcomes - The invention encompasses systems, methods, and apparatus for predicting clinical outcomes and monitoring an individual's response to a therapeutic regimen. The invention further encompasses methods for predicting cardiovascular risk based a genetic marker status and methods for modifying a computer to reflect genetic data and for incorporating genetic markers into a virtual population. | 06-11-2009 |
Patent application number | Description | Published |
20110016089 | RESTORING DATA TO A MOBILE DEVICE - Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for backing up and restoring data to a mobile device. In general, one aspect of the subject matter described in this specification can be embodied in methods that include the actions of receiving data from a mobile device to be included in a backup, the data including data associated with one or more mobile device applications; storing the data in a backup archive; generating a backup mapping file for each of the mobile device applications, each backup mapping file identifying each file in the backup associated with the respective application; and using the backup mapping files to restore the corresponding applications to the mobile device. | 01-20-2011 |
20120124507 | ELECTRONIC BACKUP OF APPLICATIONS - Systems and methods are provided for storing and restoring digital data. In some implementations, a method is provided. The method includes receiving, while a current view of an application is displayed in a user interface, a first user input requesting that a history view associated with the current view of the application be displayed, retrieve data associated with the history view, determining a presentation format for the data, and displaying the history view in response to the first user input in accordance with the presentation format, the history view including data associated with at least a first visual representation of an earlier version of the current view of the application. | 05-17-2012 |
20120310882 | KEY VALUE DATA STORAGE - Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for data synchronization. In general, one aspect of the subject matter described in this specification can be embodied in methods that include the actions of receiving a key-value pair from a first device, the key-value pair including a value corresponding to particular application data of the first device; notifying one or more other devices associated with the first device of the key value pair; receiving a request from a second device for the key-value pair; and sending the key-value pair to the second device. | 12-06-2012 |