Patent application number | Description | Published |
20100319728 | Magnetic tape, method of cleaning the same, and apparatus for forming and cleaning optical servo tracks - A magnetic tape which comprises a nonmagnetic support, a magnetic layer which is formed on one surface of the nonmagnetic support, and a backcoat layer which comprises a binder and nonmagnetic powder containing carbon black as a component and which is formed on the other surface of the nonmagnetic support, having pits for optical servo formed thereon, characterized in that the average of the reflectance on the flat portion of the backcoat layer is 8.5% or higher, and that the maximum rate of fluctuation of the reflectance on the flat portion, depending on a position of the magnetic tape: | 12-23-2010 |
20150056474 | MAGNETIC TAPE, ITS CLEANING METHOD, AND OPTICAL SERVOTRACK FORMING/CLEANING APPARATUS - A magnetic tape which comprises a nonmagnetic support, a magnetic layer which is formed on one surface of the nonmagnetic support, and a backcoat layer which comprises a binder and nonmagnetic powder containing carbon black as a component and which is formed on the other surface of the nonmagnetic support, having pits for optical servo formed thereon, characterized in that the average of the reflectance on the flat portion of the backcoat layer is 8.5% or higher, and that the maximum rate of fluctuation of the reflectance on the flat portion, depending on a position of the magnetic tape: | 02-26-2015 |
Patent application number | Description | Published |
20130208472 | ILLUMINATION APPARATUS AND ILLUMINATION SYSTEM INCLUDING A PLURALITY OF ILLUMINATION APPARATUSES - An illumination apparatus includes an elongate chassis, a plurality of light emitting devices, a plurality of lenses, an elongate populated board, an elongate holding member, and a heat radiation member. The chassis includes a supporting portion supporting the opposite, longer-side ends of the populated board and a first engagement portion fitting and securing the holding member to the chassis. The holding member includes a plurality of second engagement portions fitting and securing each lens to the holding member and a resilient biasing portion resiliently biasing the longer-side ends of the populated board toward the supporting portion. The populated board is pinched and secured by the resilient biasing portion and the supporting portion and the heat radiation member is sandwiched and thus secured by the populated board and a bottom wall in contact with the populated board and the bottom wall. | 08-15-2013 |
20130223071 | ILLUMINATION APPARATUS - An illumination apparatus includes lenses, a first casing that has a radiation plane provided with annularly arranged windows for attaching the lenses, respectively, independently, and that has an opening at a position opposite to the radiation plane, and a first substrate associated with each of the lenses and accordingly disposed. The first substrate has at least one light emitting device mounted thereon. The first casing includes a holding portion associated with each of the windows. The holding portion each permits the lens to be attached to the first casing from a side thereof having the opening and also restrains the lens from moving through the first casing toward the radiation plane, and when the lens is attached to the first casing, the lens has an optical axis in a direction having a predetermined angle relative to a center axis of the first casing. | 08-29-2013 |
Patent application number | Description | Published |
20140090669 | SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS - The inventive substrate treatment apparatus includes a spin chuck which horizontally holds and rotates a wafer; a heater which is disposed in opposed relation to a lower surface of the wafer held by the spin chuck and heats the wafer from a lower side; a phosphoric acid nozzle which spouts a phosphoric acid aqueous solution to a front surface (upper surface) of the wafer held by the spin chuck; and a suspension liquid nozzle which spouts a silicon suspension liquid to the front surface of the wafer held by the spin chuck. The wafer is maintained at a higher temperature on the order of 300° C. and, in this state, a liquid mixture of the phosphoric acid aqueous solution and the silicon suspension liquid is supplied to the front surface of the wafer. | 04-03-2014 |
20140231012 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus includes a spin chuck for holding a substrate horizontally, a phosphoric acid supply device for supplying phosphoric acid aqueous solution onto the upper surface of the substrate held on the spin chuck to form a liquid film of phosphoric acid aqueous solution covering the entire upper surface of the substrate, a heating device for heating the substrate with the liquid film of phosphoric acid aqueous solution held thereon and a pure water supply device for supplying pure water onto the liquid film of phosphoric acid aqueous solution. | 08-21-2014 |
20140231013 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus includes a phosphoric acid supply device for supplying phosphoric acid aqueous solution onto the upper surface of a substrate held on a spin chuck, a heater for emitting heat toward a portion of the upper surface of the substrate with the phosphoric acid aqueous solution being held on the substrate, a heater moving device for moving the heater to move a position heated by the heater within the upper surface of the substrate, a water nozzle for discharging water therethrough toward a portion of the upper surface of the substrate with the phosphoric acid aqueous solution being held on the substrate and a water nozzle moving device for moving the water nozzle to move the water landing position within the upper surface of the substrate. | 08-21-2014 |
20150262737 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING SUBSTRATE PROCESSING APPARATUS - In a substrate processing apparatus, a phosphoric acid aqueous solution is supplied to a processor, and a liquid collection from the processor is concurrently performed. Further, a silicon concentration is adjusted, to supply an adjusted processing liquid to the processor. Thus, a phosphoric acid aqueous solution film is formed on the substrate. The liquid film is heated by a heating device. The heating device has lamp heaters in a casing made of a silica glass. The phosphoric acid aqueous solution on the substrate is irradiated with infrared rays. A nitrogen gas flowing in a gas passage formed in the casing is discharged towards a position outside an outer periphery of the substrate. | 09-17-2015 |
20160035597 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A phosphoric acid aqueous solution in a production tank circulates a circulation system. The circulation system is configured to be switchable between a first state in which the phosphoric acid aqueous solution is circulated through a bypass pipe and a second state in which the phosphoric acid aqueous solution is circulated through a filter. When a silicon containing liquid is supplied to the production tank, the circulation system is switched to the first state. When silicon particles are uniformly dispersed in the phosphoric acid aqueous solution, the circulation system is switched to the second state. Alternatively, a filtration member is provided in the production tank. The silicon containing liquid is stored in the filtration member. The filtration member is dipped in the phosphoric acid aqueous solution stored in the production tank. The silicon containing liquid is permeated through the filtration member, and is mixed with the phosphoric acid aqueous solution. | 02-04-2016 |