Patent application number | Description | Published |
20090102583 | RELAY - A relay driving a plunger includes a movable iron piece, and a movable contact point, and position restricting means. The movable iron piece is configured to rotate around a horizontal shaft center between a contact point base and an electromagnetic unit based on excitation and nonexcitation of an electromagnetic unit placed above the contact point base. The movable contact point is fixed to a lower end portion of the plunger protruding from a lower surface of the contact point base. The movable contact point is contacted with and separated from a fixed contact point. The position restricting means is provided on an upper surface side of the contact point base. | 04-23-2009 |
20090121815 | RELAY - A relay includes a movable iron piece, a plate spring fixed to the one surface of the movable iron piece, a shaft hole formed by the one surface of the movable iron piece and the plate spring, and a supporting shaft inserted through the shaft hole. The movable iron piece is rotated around the supporting shaft based on excitation and nonexcitation of a magnetic unit. Both end portions of the plate spring alternately drive a contact point unit. The shaft hole is formed by a flat portion of the one surface of the movable iron piece and a bearing portion formed by subjecting the plate spring to bending work. The movable iron piece is supported so as to be rotatable. | 05-14-2009 |
20090231070 | RELAY - A relay includes a permanent magnet and a magnetic circuit. The permanent magnet is disposed between a pair of electromagnets. The pair of the electromagnets is formed by winding coils around body portions of spools. Each spool has flanges integrally formed on both upper and lower end portions thereof. The magnetic circuit is formed by a yoke spanning the spools and the permanent magnet. The permanent magnet is held by the upper and lower flanges of a pair of the spools that are juxtaposed. | 09-17-2009 |
20090261928 | RELAY - A relay includes a contact point block having a support shaft with both ends spanning a contact point base, a plunger having a movable contact at a lower end thereof, and a movable iron piece configured to drive the plunger and to have a plate spring. The relay also includes an electromagnetic unit and a base block having a fixed contact point at a position opposite to the movable contact point. The movable iron piece is supported on the supporting shaft. The plunger is inserted through an operation hole of the contact point base. Upper and lower surfaces of the contact point block are held by the electromagnetic unit and the base block. The electromagnetic unit directly fixes the iron core to an upper surface of the contact point base. | 10-22-2009 |
Patent application number | Description | Published |
20120074102 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - Phosphoric acid, sulfuric acid, and water are supplied to a flow path for a processing liquid from a first tank to a substrate held by a substrate holding unit. As a result, a mixed liquid containing the phosphoric acid, the sulfuric acid, and the water is generated. A liquid containing the sulfuric acid and a liquid containing the water are mixed together in the flow path, and the temperature of the mixed liquid containing the phosphoric acid, the sulfuric acid, and the water rises. A mixed liquid containing a phosphoric acid aqueous solution whose temperature is close to its boiling point is supplied to the substrate held by the substrate holding unit. | 03-29-2012 |
20130161287 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS - A preprocess step for supplying an inert gas into an enclosed space in which a substrate is disposed, while exhausting gas by sucking out of the enclosed space. And then, an etching step for supplying a process vapor into the enclosed space while exhausting gas out of the enclosed space at an rate lower than a rate in the preprocess step. And then a post-process step for supplying an inert gas into the enclosed space while exhausting gas by sucking out of the enclosed space at a rate higher than the rate in the etching step. | 06-27-2013 |
20130175241 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS - A solvent vapor containing a solvent material capable of dissolving hydrogen fluoride is supplied to a surface of a substrate, thereby covering the surface of the substrate with a liquid film containing solvent material. Thereafter an etching vapor containing a hydrogen fluoride is supplied to the surface of the substrate covered by the liquid film containing the solvent material, thereby etching the surface of the substrate. | 07-11-2013 |
20130256267 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS - A substrate processing method includes a water removing step of removing water from a substrate, a silylating step of supplying a silylating agent to the substrate after the water removing step, and an etching step of supplying an etching agent to the substrate after the silylating step. The substrate may have a surface on which a nitride film and an oxide film are exposed and in this case, the etching step may be a selective etching step of selectively etching the nitride film by the etching agent. The etching agent may be supplied in a form of a vapor having an etching component. | 10-03-2013 |
20150020967 | SUBSTRATE PROCESSING APPARATUS - A substrate processing method includes a water removing unit for removing water from a substrate, a silylating agent supplying unit for supplying a silylating agent to the substrate and an etching agent supplying unit for supplying an etching agent to the substrate. A control unit controls the said units to execute a water removing step, a silylating step and an etching step in that order. | 01-22-2015 |
20150162224 | SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS - A substrate treatment method for treating a substrate including a first silicon nitride film provided on a front surface thereof and a silicon oxide film provided on the first silicon nitride film to remove the first silicon nitride film and the silicon oxide film from the substrate includes: a first phosphoric acid treatment step of supplying a phosphoric acid aqueous solution having a predetermined first concentration to the substrate held by a substrate holding unit to treat the substrate with the first concentration phosphoric acid aqueous solution for the removal of the first silicon nitride film; and a second phosphoric acid treatment step of supplying a phosphoric acid aqueous solution having a second concentration lower than the first concentration to the substrate to treat the substrate with the second concentration phosphoric acid aqueous solution for the removal of the silicon oxide film after the first phosphoric acid treatment step. | 06-11-2015 |
20150258582 | SUBSTRATE PROCESSING DEVICE - A substrate processing apparatus includes a substrate holding unit that holds a substrate in a horizontal position, a processing liquid supplying unit that supplies the processing liquid to the surface of the substrate held by the substrate holding unit, a substrate rotating unit that rotates the substrate held by the substrate holding unit, a heater that opposes the substrate held by the substrate holding unit, a heater supporting member that supports the heater independently of the substrate holding unit and a moving unit that moves at least one of the substrate holding unit and the heater supporting member such that the heater and the substrate held by substrate holding unit approach/leave each other. | 09-17-2015 |
Patent application number | Description | Published |
20140253591 | INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, AND COMPUTER-READABLE RECORDING MEDIUM RECORDING INFORMATION PROCESSING PROGRAM - An example information processing apparatus includes: an image acquiring unit that acquires an image of a real space captured by an imaging device; a feature detection unit that detects one or more features from the captured image; an image generating unit that generates an image of a virtual space, by placing a virtual object made to correspond to the detected feature at a position based on the position of the feature in the virtual space; and a display control unit that causes an image to be displayed on a display device such that a user sees the virtual space image superimposed on a real space, wherein when a first feature and a second feature are detected in a captured image, the image generating unit places a first virtual object corresponding to the first feature in the virtual space at a position based on the position of the second feature. | 09-11-2014 |
20140286574 | COMPUTER-READABLE RECORDING MEDIUM RECORDING PROGRAM FOR IMAGE PROCESSING, INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING SYSTEM, AND IMAGE PROCESSING METHOD - A computer is caused to execute: acquisition of a captured image captured by an imaging device; display of an image including the captured image on a display device; and detection from the captured image, of a feature in a real space captured in the captured image, using an image for detection of the feature. In a case where the captured image acquired in the acquisition of the image captured is a reversed image, the feature is detected by performing a reverse comparison process involving: comparing the captured image with a reversed image of the image for detection; or comparing an image obtained by further reversing the captured image, with the image for detection | 09-25-2014 |
20150336006 | VIDEO GAME SYSTEM, APPARATUS AND METHOD - An example video game system includes user controls and memory for storing a video game program. A processing system including at least one processor executes the video game program to provide a three-dimensional (3D) virtual game world including a player character. The processing system periodically stores in the memory ghost data for the player character as the player character moves in the 3D virtual game world, based on inputs to the user controls, during a first game play session. The processing system generates a ghost character during a second game play session whose movement in the 3D virtual game world is based on the ghost data stored in the memory. The ghost character appears in the second game play session at a time subsequent to the beginning of the second game play session. | 11-26-2015 |
Patent application number | Description | Published |
20100163787 | POLISHING COMPOSITION - A polishing composition of the invention is a polishing composition which is suitable for polishing a metal film, which is so-called final polishing, and contains colloidal silica having an average particle size of 20 nm or more and less than 80 nm which is determined by particle size distribution measurement using a light scattering method as abrasive grains; and at least one selected from iodic acid and its salt as an oxidizing agent, with the balance of water. By containing such components, the polishing composition shows non-selectivity, while being sufficiently suppressed in dishing and erosion. | 07-01-2010 |
20150053887 | POLISHING COMPOSITION - The polishing composition of the present invention is a polishing composition for polishing a tungsten-containing metal layer formed on an insulating layer, the polishing composition comprising: abrasive grains; one or more halogen acids selected from the group consisting of iodic acid, iodous acid, and hypoiodous acid; a strong acid; a hydrogen-ion-supplying agent; and water. | 02-26-2015 |
20150093900 | CHEMICAL MECHANICAL POLISHING COMPOSITION FOR POLISHING SILICON WAFERS AND RELATED METHODS - A chemical mechanical polishing composition for polishing silicon wafers is provided, containing: water, optionally, an abrasive; a cation according to formula (I); piperazine or a piperazine derivative according to formula (II); and, a quaternary ammonium compound; wherein the chemical mechanical polishing composition exhibits a pH of 9 to 12. Also provided are methods of making and using the chemical mechanical polishing composition. | 04-02-2015 |