Patent application number | Description | Published |
20080239274 | Illumination optical system, exposure apparatus, and exposure method - An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light. | 10-02-2008 |
20090002664 | OPTICAL INTEGRATOR, ILLUMINATION OPTICAL DEVICE, ALIGNER, AND METHOD FOR FABRICATING DEVICE - An optical integrator is able to keep down a light-quantity loss in modified illumination with an illumination optical apparatus. An optical integrator of a wavefront division type according to the present invention has a plurality of refracting surface regions which refract incident light, and a plurality of deflecting surface regions provided corresponding to the plurality of refracting surface regions and adapted for changing a traveling direction of the incident light. The plurality of refracting surface regions include a plurality of first refracting surface regions includes an arcuate contour with the center projecting in a first direction, and a plurality of second refracting surface regions includes an arcuate contour with the center projecting in a second direction. | 01-01-2009 |
20090073414 | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method - There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made of an optical material with optical activity and having a circumferentially varying thickness profile. | 03-19-2009 |
20090073441 | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method - There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made of an optical material with optical activity and having a circumferentially varying thickness profile. | 03-19-2009 |
20090284727 | Illumination optical system, exposure apparatus, device manufacturing method, compensation filter, and exposure optical system - An illumination optical system is one for illuminating a surface to be illuminated with light from a light source, which has a distribution forming optical system including an optical integrator and forming a pupil intensity distribution on an illumination pupil located behind the optical integrator, and an optical attenuator arranged on a predetermined surface in an optical path behind the optical integrator and having an attenuation characteristic of varying an attenuation rate depending upon an angle of incidence to the predetermined surface. | 11-19-2009 |
20090316132 | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method - There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made of an optical material with optical activity and having a circumferentially varying thickness profile. | 12-24-2009 |
20100149511 | Illumination optical system, exposure apparatus, and exposure method - An illumination optical system illuminates an irradiated surface with light supplied from a light source. The illumination optical system includes a diffractive optical element disposed in an optical path of linearly polarized light supplied from the light source. The diffractive optical element forms a multipole illumination field including a plurality of illumination fields. The illumination optical system also includes an optical integrator that forms a multipole light source including a plurality of planar light sources with light that has passed through the multipole illumination field. The illumination optical system also includes a polarization optical member disposed in an illumination optical path and that sets a polarization direction of light that has passed through the multipole light source to a predetermined polarization direction. | 06-17-2010 |
20100225895 | Illumination optical system, exposure apparatus, and exposure method - An illumination optical system and method illuminates an irradiated surface based on linearly polarized light supplied from a light source. The illumination optical system includes a depolarizer which is selectively positioned between a first position in an optical path of the illumination optical system and a second position outside of the optical path, and has a crystal member whose thickness in a direction along an optical axis of the illumination optical system varies in a direction crossing the optical axis. | 09-09-2010 |
20100245796 | Optical Integrator, Illumination Optical Device, Aligner, and Method for Fabricating Device - An optical integrator is able to keep down a light-quantity loss in modified illumination with an illumination optical apparatus. An optical integrator of a wavefront division type according to the present invention has a plurality of refracting surface regions which refract incident light, and a plurality of deflecting surface regions provided corresponding to the plurality of refracting surface regions and adapted for changing a traveling direction of the incident light. The plurality of refracting surface regions include a plurality of first refracting surface regions includes an arcuate contour with the center projecting in a first direction, and a plurality of second refracting surface regions includes an arcuate contour with the center projecting in a second direction. | 09-30-2010 |
20110273697 | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method - There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made of an optical material with optical activity and having a circumferentially varying thickness profile. | 11-10-2011 |
20120236285 | ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD - An illumination optical system illuminates an irradiated surface with light supplied from a light source. The illumination optical system includes a diffractive optical element disposed in an optical path of linearly polarized light supplied from the light source. The diffractive optical element forms a multipole illumination field. including a plurality of illumination fields. The illumination optical system also includes an optical integrator that forms a multipole light source including a plurality of planar light sources with light that has passed through the multipole illumination field. The illumination optical system also includes a polarization optical member disposed in an illumination optical path and that sets a polarization direction of light that has passed through the multipole light source to a predetermined polarization direction. | 09-20-2012 |
20130027682 | Exposure Apparatus, Exposure Method, and Method for Producing Device - A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases. | 01-31-2013 |
20130242527 | POLARIZATION-MODULATING ELEMENT, ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND EXPOSURE METHOD - There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made of an optical material with optical activity and having a circumferentially varying thickness profile. | 09-19-2013 |
20130271945 | POLARIZATION-MODULATING ELEMENT, ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND EXPOSURE METHOD - There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made of an optical material with optical activity and having a circumferentially varying thickness profile. | 10-17-2013 |
20140028990 | POLARIZATION-MODULATING ELEMENT, ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND EXPOSURE METHOD - There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made of an optical material with optical activity and having a circumferentially varying thickness profile. | 01-30-2014 |
20140233008 | ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, DEVICE PRODUCTION METHOD, AND LIGHT POLARIZATION UNIT - An illumination optical system which illuminates an illumination objective surface with a light from a light source. The illumination optical system includes a spatial light modulator which includes a plurality of optical elements arranged within a predetermined plane and controlled individually, and which forms a light intensity distribution in an illumination pupil of the illumination optical system; and a polarization unit which is arranged in a position optically conjugate with the predetermined plane, and which polarizes an incident light beam having a first and second partial light beams, coming into the polarization unit such that the first and second partial light beams have polarization states different from each other, and emits the polarized incident light beam as an outgoing light beam, wherein the polarization unit changes, in a cross section of the outgoing light beam, a ratio between a cross sectional areas of the first and second partial light beams. | 08-21-2014 |
20140240685 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE - An exposure apparatus irradiates a substrate with light via a projection system and liquid, and includes a stage that moves below the projection system, and a light-receiving element having a light-receiving surface. An optical member provided on the stage has a first surface contacting the liquid when moved to face the projection system, and a second surface contacting a gas and transmitting light having come from the projection system via the liquid and the first surface. The optical member is configured such that at least a large-angle ray of the light, which has an angle with an optical axis of the projection system sufficiently large to undergo total reflection at an end surface of the projection system when the liquid is absent, travels from the projection system to the second surface without passing through gas. The second surface transmits the large-angle ray, which is received by the light-receiving surface. | 08-28-2014 |