Patent application number | Description | Published |
20090017731 | METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE - Methods and apparatus for cleaning an edge of a substrate are provided. The invention includes a polishing film having a polishing side and a second side; an inflatable pad disposed adjacent the second side of the polishing film; a frame adapted to support the polishing film and the inflatable pad; and a substrate rotation driver adapted to rotate a substrate against the polishing side of the polishing film, wherein the polishing film is disposed between an edge of the substrate and the inflatable pad so that the inflatable pad and polishing film contour to the edge of the substrate with the polishing film contacting the edge of the substrate. Numerous other aspects are provided. | 01-15-2009 |
20090036033 | METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE - A method of cleaning an edge of a substrate is provided. The method comprises tensioning a first polishing film in a frame; contacting the first polishing film against an edge of a substrate; conforming the first polishing film to the edge of the substrate, the edge including an outer edge and at least one bevel; and rotating the substrate while the first polishing film remains in contact with the substrate. Numerous other aspects are provided. | 02-05-2009 |
20110232569 | SEGMENTED SUBSTRATE LOADING FOR MULTIPLE SUBSTRATE PROCESSING - Embodiments of the present invention provide apparatus and methods for loading and unloading a multiple-substrate processing chamber segment by segment. One embodiment of the present invention provides an apparatus for processing multiple substrates. The apparatus includes a substrate supporting tray having a plurality of substrate pockets forming a plurality of segments, and a substrate handling assembly configured to pick up and drop off substrates from and to a segment of substrate pockets of the substrate supporting tray. | 09-29-2011 |
20110274850 | HYDROTHERMAL SYNTHESIS OF ACTIVE MATERIALS AND IN SITU SPRAYING DEPOSITION FOR LITHIUM ION BATTERY - A method and apparatus for forming an electrochemical layer of a lithium ion battery is provided. A precursor mixture in a carrying medium is activated in a reactor chamber by application of energy to synthesize active materials. The activated precursor mixture is then spray deposited on a substrate. A binder and conductive materials may be blended, or sprayed separately, with the nano- or micro-crystals as they deposit on the surface to enhance adhesion and conductivity. | 11-10-2011 |
20120318457 | MATERIALS AND COATINGS FOR A SHOWERHEAD IN A PROCESSING SYSTEM - Apparatus and systems are disclosed for providing a protective material for a showerhead of a processing system. In an embodiment, a processing system includes a processing chamber for processing substrates and a showerhead having a diffuser plate for distributing processing gases to the processing chamber. The diffuser plate may include a protective material to protect the showerhead from processing gases. The diffuser plate may be formed with tungsten or tungsten coated with a tantalum alloy and tantalum. | 12-20-2012 |
20130068320 | PROTECTIVE MATERIAL FOR GAS DELIVERY IN A PROCESSING SYSTEM - Apparatus and systems are disclosed for providing a protective material for a gas-delivery system of a processing system. In an embodiment, a processing system includes a processing chamber for processing substrates and a gas-delivery system for delivering processing gases to the processing chamber. The gas-delivery system includes a protective material to protect the gas-delivery system from processing gases including at least one processing gas heated to an elevated temperature. The protective material includes a tungsten plate or a tungsten plate coated with a tantalum alloy and tantalum | 03-21-2013 |
20150063957 | SEGMENTED SUBSTRATE LOADING FOR MULTIPLE SUBSTRATE PROCESSING - Embodiments of the present disclosure provide apparatus and methods for loading and unloading a multiple-substrate processing chamber segment by segment. One embodiment of the present disclosure provides an apparatus for processing multiple substrates. The apparatus includes a substrate supporting tray having a plurality of substrate pockets forming a plurality of segments, and a substrate handling assembly configured to pick up and drop off substrates from and to a segment of substrate pockets of the substrate supporting tray. | 03-05-2015 |
Patent application number | Description | Published |
20090036039 | METHODS AND APPARATUS FOR POLISHING AN EDGE OF A SUBSTRATE - Methods of and systems for polishing an edge of a substrate are provided. The invention includes a substrate rotation driver adapted to rotate the edge of a substrate against a polishing film; and a first sensor coupled to the rotation driver adapted to detect one of an energy and torque exerted by the substrate rotation driver as it rotates the substrate against the polishing film. Numerous other aspects are provided. | 02-05-2009 |
20090036042 | METHODS AND APPARATUS FOR POLISHING AN EDGE OF A SUBSTRATE - Methods, systems and apparatus are provided for polishing an edge of a substrate. The invention includes an apparatus adapted to apply a preset pressure to a polishing film in contact with an edge of a substrate. The apparatus includes an actuator adapted to apply a preset pressure to the polishing film; and a controller coupled to the actuator and adapted to receive a signal indicative of a condition of the edge of the substrate, and to adjust a pressure applied by the actuator to the polishing film so as to maintain the preset pressure based on the received signal. Numerous other aspects are provided. | 02-05-2009 |
20100093263 | APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD - Apparatus and methods for conditioning a polishing pad include an arm adapted to support a conditioning disk; a drive mechanism coupled to the arm; and a flexible coupling between the drive mechanism and the conditioning disk adapted to allow the conditioning disk to tilt while transmitting rotary motion from the drive mechanism to the conditioning disk. Numerous other aspects are disclosed. | 04-15-2010 |
20110318997 | APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD - Apparatus and methods for conditioning a polishing pad include an arm adapted to support a conditioning disk; a drive mechanism coupled to the arm; and a flexible coupling between the drive mechanism and the conditioning disk adapted to allow the conditioning disk to tilt while transmitting rotary motion from the drive mechanism to the conditioning disk. Numerous other aspects are disclosed. | 12-29-2011 |
20120234243 | METHOD AND APPARATUS UTILIZING A SINGLE LIFT MECHANISM FOR PROCESSING AND TRANSFER OF SUBSTRATES - Embodiments of the present invention relate to apparatus and methods for loading substrates into processing chambers, processing the substrates in the processing chamber, and transferring the substrates out of the processing chamber using a single lift and rotational mechanism. One embodiment of the present invention provides a method for processing one or more substrates. The method includes transferring a substrate carrier, having one or more substrates disposed thereon, to a chamber volume, supporting the substrate carrier within the chamber volume using a set of lift pins, transferring the substrate carrier from the set of lift pins to an edge ring within the chamber volume, and contacting the edge ring with the set of lift pins to control the position of the substrate carrier within the chamber volume. | 09-20-2012 |