Inventors list

Assignees list

Classification tree browser

Top 100 Inventors

Top 100 Assignees


Norio Ohkuma

Norio Ohkuma, Machida-Shi JP

Patent application numberDescriptionPublished
20090284567INK JET RECORDING HEAD, PRODUCING METHOD THEREFOR AND COMPOSITION FOR INK JET RECORDING HEAD - The invention provides a method for producing an ink jet recording head having a high durability and a high ink resistance and enabling a high-quality image recording by employing a material capable of reducing the internal stress and having satisfactory patterning characteristics. It also provides a method of producing such ink jet recording head with a high precision. A cationically photopolymerizable resin composition containing a condensate of a hydrolysable organosilane compound, employed as a material for forming a flow path forming member, enables a reduction of internal stress and a highly precise pattern in the flow path forming member thereby providing an ink jet recording head having a high durability and a high ink resistance and capable of high-quality printing over a prolonged time, and a producing method therefor.11-19-2009
20100094024ACTIVE ENERGY RAY CURABLE LIQUID COMPOSITION AND LIQUID CARTRIDGE - The invention provides an active energy ray curable liquid composition containing a compound represented by a general formula (I):04-15-2010
20100107412INK-JET HEAD AND ITS MANUFACTURE METHOD - An ink jet head is formed of a nozzle material composed of a condensation product comprising a hydrolysable silane compound having a fluorine-containing group and a photo-polymerizable resin composition.05-06-2010
20100245476INK JET HEAD AND ITS MANUFACTURE METHOD - An ink jet head is formed with a nozzle surface having a liquid repellent characteristic. The nozzle surface comprises a condensation product made from a hydrolyzable silane compound having a fluorine containing group and a hydrolyzable silane compound having a cationic polymerizable group.09-30-2010
20100309247INK JET RECORDING HEAD, PRODUCING METHOD THEREFOR AND COMPOSITION FOR INK JET RECORDING HEAD - The invention provides a method for producing an ink jet recording head having a high durability and a high ink resistance and enabling a high-quality image recording by employing a material capable of reducing the internal stress and having satisfactory patterning characteristics. It also provide a method of producing such ink jet recording head with a high precision. A cationically photopolymerizable resin composition containing a condensate of a hydrolysable organosilane compound, employed as a material for forming a flow path forming member, enables a reduction of internal stress and a highly precise pattern in the flow path forming member thereby providing an ink jet recording head having a high durability and a high ink resistance and capable of high-quality printing over a prolonged time, and a producing method therefor.12-09-2010
20110122198INK JET RECORDING HEAD, PRODUCING METHOD THEREFOR AND COMPOSITION FOR INK JET RECORDING HEAD - The invention provides a method for producing an ink jet recording head having a high durability and a high ink resistance and enabling a high-quality image recording by employing a material capable of reducing the internal stress and having satisfactory patterning characteristics. It also provides a method of producing such ink jet recording head with a high precision. A cationically photopolymerizable resin composition containing a condensate of a hydrolysable organosilane compound, employed as a material for forming a flow path forming member, enables a reduction of internal stress and a highly precise pattern in the flow path forming member thereby providing an ink jet recording head having a high durability and a high ink resistance and capable of high-quality printing over a prolonged time, and a producing method therefor.05-26-2011

Patent applications by Norio Ohkuma, Machida-Shi JP

Norio Ohkuma, Tokyo JP

Patent application numberDescriptionPublished
20080213547Composite Composition for Micropatterned Layers Having High Relaxation Ability, High Chemical Resistance and Mechanical Stability - A polymerizable composite composition comprising a) a hydrolysate and/or condensate of at least one hydrolysable alkylsilane having at least one alkyl group, at least one hydrolysable arylsilane having at least one aryl group or at least one hydrolysable alkylarylsilane having at least one alkylaryl group, and at least one hydrolysable silane containing an epoxy group, b) at least one organic compound having at least 2 epoxy groups, and c) a cationic initiator, is suitable to provide, upon curing, substrates with a patterned coating or patterned moulded articles. The patterned coatings and moulded articles obtained show high relaxation ability, high chemical resistance and mechanical stability. Micropatterns can be obtained with high stability of shape.09-04-2008
20090258197Composite Composition for Micropatterned Layers - The invention provides a composite composition comprising a cationically polymerizable organic resin, a cationic photoinitiator, a hydrolysate and/or condensate of at least one hydrolysable silane compound and inorganic nanoparticles. The composite composition is suitable for the preparation of patterned moulded articles or substrates having a patterned coating, in particular by photolithography. Micropatterns obtained show improved properties, such as a high shape stability and an excellent elastic modulus.10-15-2009
20100260978Composite Composition for Micropatterned Layers - The invention provides a composite composition comprising a cationically polymerizable organic resin, a cationic photoinitiator, a hydrolysate and/or condensate of at least one hydrolysable silane compound and inorganic nanoparticles. The composite composition is suitable for the preparation of patterned moulded articles or substrates having a patterned coating, in particular by photolithography. Micropatterns obtained show improved properties, such as a high shape stability and an excellent elastic modulus.10-14-2010

Patent applications by Norio Ohkuma, Tokyo JP