Norikazu Yamada
Norikazu Yamada, Nirasaki City JP
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20100243607 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING SAME - A substrate processing method uses a substrate processing apparatus including a chamber for accommodating a substrate, a lower electrode to mount the substrate, a first RF power applying unit for applying an RF power for plasma generation into the chamber, and a second RF power applying unit for applying an RF power for bias to the lower electrode. The RF power for plasma generation is controlled to be intermittently changed by changing an output of the first RF power applying unit at a predetermined timing. If no plasma state or an afterglow state exists in the chamber by a control of the first RF power applying unit, an output of the second RF power applying unit is controlled to be in an OFF state or decreased below an output of the second RF power applying unit when the output of the first RF power applying unit is a set output. | 09-30-2010 |
Norikazu Yamada, Kanagawa JP
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20100123285 | MEDIUM TRANSPORT DEVICE, CONTROL PROGRAM FOR MEDIUM TRANSPORT DEVICE AND CONTROL METHOD FOR MEDIUM TRANSPORT DEVICE - A medium transport device includes a sensor unit, a timing data collection unit, and a sampling resolution changing unit. The sensor unit is provided in a transport path of a print recording medium to detect a transport timing of the print recording medium. A timing data collection unit receives an output from the sensor unit and samples the output at a sampling interval as timing data. A sampling resolution changing unit changes the sampling interval. | 05-20-2010 |
20100123914 | IMAGE PROCESSING APPARATUS AND COMPUTER READABLE MEDIUM - An image processing apparatus includes a determination unit determining, based on a pixel value of a prescribed background color area in image data obtained by inputting a printed image, and based on information regarding a color of a toner used in printing the image, whether or not the background color of the image corresponds to the color of the toner. | 05-20-2010 |
20100135680 | PAPER WRINKLE SIGN MONITORING DEVICE, PAPER WRINKLE SIGN MONITORING METHOD, AND COMPUTER READABLE MEDIUM - A paper wrinkle sign monitoring device includes: at least one timing detecting unit that is set on a transport path of a printing medium, and that detects transport timing of the printing medium; and a sign output unit that detects a sign of paper wrinkle generation in the transporting time of the printing medium based on the transport timing of the printing medium detected by the timing detecting unit, and that outputs the sign. | 06-03-2010 |
20100161546 | FAILURE DIAGNOSIS SYSTEM, A FAILURE DIAGNOSIS DEVICE, AN INFORMATION UPDATE DEVICE, AND A COMPUTER-READABLE MEDIUM - According to an aspect of the present invention, there is provided a failure diagnosis system including: a causal relationship information storage unit configured to store causal relationship information representing a causal relationship between events regarding a diagnosis-target apparatus, the causal relationship information including: common causal relationship information that is commonly used in a plurality of types of failure diagnosis regarding the diagnosis-target apparatus; and specific causal relationship information that is used in each specific type of failure diagnosis among the plurality of types of failure diagnosis; and a diagnosis execution unit configured to selectively execute the plural types of failure diagnosis by using a combined causal relationship information that is a combination of the common causal relationship information and a piece of the specific causal relationship information corresponding to a diagnosis-target type of failure diagnosis. | 06-24-2010 |
20100225052 | TRANSPORT DEVICE, OVERLAP FEED SIGN DETECTION DEVICE, AND COMPUTER READABLE MEDIUM - A transport device includes a feed unit that feeds transport subjects being loaded in a loading portion one by one in a transport direction, a protrusion amount detection unit that detects a protrusion amount of the transport subjects from the loading portion in the transport direction and an overlap feed sign detection unit that detects a sign of occurrence of overlap feed of the transport subjects based on a detection result of the protrusion amount. | 09-09-2010 |
20100235140 | DETECTED DATA PROCESSING APPARATUS AND COMPUTER READABLE MEDIUM FOR DETECTING DATA - A detected data processing apparatus includes a selecting unit that calculates mutual correlation between a plurality of groups of detected data acquired from a detecting unit that detects an operational state of a circuit board, and then selects as analysis data the detected data of a group whose value indicating correlation with other groups is smaller than a threshold value set up in advance; and a first calculating unit that calculates a first Mahalanobis distance on a basis of a first Mahalanobis space generated by using the analysis data selected by the selecting unit from the detected data obtained when a normal circuit board is operated and on a basis of the detected data obtained when a circuit board of diagnosis target is operated. | 09-16-2010 |
Norikazu Yamada, Nirasaki-Shi JP
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20090194508 | SUBSTRATE PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - A substrate plasma processing apparatus includes a substrate holding electrode and a counter electrode which are arranged in a chamber, a high frequency generating device which applies a high frequency of 50 MHZ or higher to the substrate holding electrode, a DC negative pulse generating device which applies a DC negative pulse voltage in a manner of superimposing on the high frequency, and a controller controlling to cause intermittent application of the high frequency and cause intermittent application of the DC negative pulse voltage according to the timing of on or off of the high frequency. | 08-06-2009 |
20100072172 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - There are provided a substrate processing apparatus and a substrate processing method realizing an effective reduction of a voltage change of a substrate on an electrode to reduce the variation of incident energy of ions entering the substrate. The substrate processing apparatus includes: a first electrode holding a substrate on a main surface of the first electrode; a second electrode facing the first electrode; a RF power source applying to the first electrode a RF voltage whose frequency is equal to or higher than 40 MHz; and a pulse voltage applying unit applying to the first electrode a pulse voltage decreasing in accordance with a lapse of time, by superimposing the pulse voltage on the RF voltage. | 03-25-2010 |
Norikazu Yamada, Yamanashi JP
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20090098736 | DRY-ETCHING METHOD - A main etching step is effected in a state shown in | 04-16-2009 |
20130025789 | DRY-ETCHING METHOD - A process including a main etching step under a first pressure using a gas containing at least HBr as an etching gas. The main etching is ended before a silicon oxide film is exposed. An over-etching process is effected under a second pressure higher than the first pressure using a gas containing at least HBr so as to completely expose the silicon oxide film. In such a way, the selectivity of a silicon-containing conductive layer with respect to the silicon oxide film is improved. Without etching the silicon oxide film layer, which is an underlying layer, and without marring the shape of the silicon-containing conductive film layer formed by etching, only the desired silicon-containing conductive film layer is removed by etching reliably. | 01-31-2013 |
20140020832 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING SAME - A substrate processing method uses a substrate processing apparatus including a chamber for accommodating a substrate, a lower electrode to mount the substrate, a first RF power applying unit for applying an RF power for plasma generation into the chamber, and a second RF power applying unit for applying an RF power for bias to the lower electrode. The RF power for plasma generation is controlled to be intermittently changed by changing an output of the first RF power applying unit at a predetermined timing. If no plasma state or an afterglow state exists in the chamber by a control of the first RF power applying unit, an output of the second RF power applying unit is controlled to be in an OFF state or decreased below an output of the second RF power applying unit when the output of the first RF power applying unit is a set output. | 01-23-2014 |
Norikazu Yamada, Kurokawa JP
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20120247677 | SUBSTRATE PROCESSING METHOD - A substrate processing apparatus capable of improving a processing controllability in an etching process is provided. The substrate processing apparatus ( | 10-04-2012 |
Norikazu Yamada, Kurokawa-Gun JP
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20140231389 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - At a first timing after mounting a semiconductor wafer W on an electrostatic chuck | 08-21-2014 |
20140305905 | PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS - At a time point T | 10-16-2014 |
20140361690 | PLASMA PROCESSING APPARATUS - In a capacitively coupled plasma processing apparatus, a susceptor (lower electrode) | 12-11-2014 |
Norikazu Yamada, Yamanashi-Ken JP
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20150162223 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - There are provided a substrate processing apparatus and a substrate processing method realizing an effective reduction of a voltage change of a substrate on an electrode to reduce the variation of incident energy of ions entering the substrate. The substrate processing apparatus includes: a first electrode holding a substrate on a main surface of the first electrode; a second electrode facing the first electrode; a RF power source applying to the first electrode a RF voltage whose frequency is equal to or higher than 40 MHz; and a pulse voltage applying unit applying to the first electrode a pulse voltage decreasing in accordance with a lapse of time, by superimposing the pulse voltage on the RF voltage. | 06-11-2015 |