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Nobuyuki Yoshioka

Nobuyuki Yoshioka, Osaka JP

Patent application numberDescriptionPublished
20100003614RESIN COATED CARRIER, TWO-COMPONENT DEVELOPER, DEVELOPING DEVICE AND IMAGE FORMING APPARATUS - The resin coated carrier is used with a toner in which an external additive having an average primary particle size of 50 nm or more is added to a toner particle, and has a carrier core and a resin coating layer on the surface of the carrier core. In the resin coated carrier, the following expression (1) is satisfied:01-07-2010
20100135700DEVELOPER ,DEVELOPING UNIT,DEVELOPING DEVICE,AND IMAGE FORMING APPARATUS - A developer of the present invention includes a toner and a carrier. The toner contains a charge control agent, and the carrier has on its surface a coating layer to which a charge control agent and electrically conductive particles are added. All of constituent elements of one of the charge control agent of the toner and the charge control agent of the carrier are contained in constituent elements of the other one of the charge control agents. With the configuration, the developer of the present invention is capable of stably maintaining a toner charge amount and outputting high-quality images for long periods.06-03-2010
20100183340RESIN COATED CARRIER, TWO-COMPONENT DEVELOPER, DEVELOPING DEVICE AND IMAGE FORMING APPARATUS - A resin coated carrier is provided that can stably charge a toner having added thereto an external additive having a large particle size over a long period of time and can prevent blocking of a developer. The resin coated carrier satisfies the following formula (1):07-22-2010
20100248116METHOD FOR PRODUCING RESIN-COATED CARRIER, RESIN-COATED CARRIER, TWO-COMPONENT DEVELOPER, DEVELOPING DEVICE, IMAGE FORMING APPARATUS AND IMAGE FORMING METHOD - A method for producing a low density resin-coated carrier having a small resin amount to a carrier core material and having a uniform resin coating layer formed on the carrier core material is provided. A resin-coated carrier has a carrier core material and a resin coating layer formed on the surface of the carrier core material. The carrier core material has pores and an apparent density of 1.6 g/cm09-30-2010
20100279221RESIN-COATED CARRIER METHOD OF MANUFACTURING THE SAME, TWO-COMPONENT DEVELOPER INCLUDING RESIN-COATED CARRIER, DEVELOPING DEVICE AND IMAGE FORMING APPARATUS - A resin-coated carrier is provided. A resin-coated carrier includes a carrier core and a resin coating layer formed on a surface of the carrier core. The carrier core is composed of a porous material having surface fine pores formed on a surface thereof, and has an apparent density of 1.6 to 2.0 g/cm11-04-2010
20110008724TWO-COMPONENT DEVELOPER, DEVELOPING DEVICE, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD - A two-component developer is provided. The two-component developer includes a toner containing a binder resin, a colorant and a release agent, and a resin-coated carrier composed of a carrier core material and a resin coating layer formed on a surface of the carrier core material. The toner has an exposure rate of the release agent on the toner surface of 1.00% or above and 3.07% or below. The carrier core material has an apparent density of 1.86 g/cm01-13-2011

Nobuyuki Yoshioka, Osaka-Shi JP

Patent application numberDescriptionPublished
20100104329MAGNETIC CARRIER, TWO COMPONENT DEVELOPER, DEVELOPING DEVICE, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD - Regarding a magnetic carrier of the present invention, a surface of a magnetic core material is coated with a coating layer containing electrically conductive particles and a charge control agent composed of same components as components of a charge control agent contained in a electrophotographic toner. Further, the magnetic carrier exhibits an electric resistance value of 8.22×1004-29-2010

Nobuyuki Yoshioka, Ikeda-Shi JP

Patent application numberDescriptionPublished
20080299471CARRIER, DEVELOPER, DEVELOPMENT DEVICE, IMAGE FORMING APPARATUS AND IMAGE FORMING METHOD - A carrier of the present invention is used in a developer including a toner which includes at least a binder resin and an organic colorant, and the carrier has a core and a coating formed on the surface of the core, the coating including (i) a charge control agent for controlling a charge whose polarity is the same as a polarity of a charge controlled by a charge control agent included in the toner, and (ii) a conductive particles. The use of the carrier of the present invention enables: prevention of decrease in the charging amount of the toner which includes at least a binder resin and an organic colorant; and formation of a stable, high-resolution, high-quality image which has very few image defects such as a photographic fog.12-04-2008

Nobuyuki Yoshioka, Ibaraki JP

Patent application numberDescriptionPublished
20080276215Mask Pattern Designing Method Using Optical Proximity Correction in Optical Lithography, Designing Device, and Semiconductor Device Manufacturing Method Using the Same - A method for designing a mask pattern realizes shortening the ever-growing time for the OPC treatment, decreases the fabrication TAT of a semiconductor device and cuts cost. A method for fabricating a semiconductor device uses the mask pattern designed. This invention performs the OPC treatment in advance on a cell library constituting the basic configuration of a semiconductor circuit pattern and prepares a semiconductor chip using the cell library that has undergone the OPC treatment. The method for designing a mask pattern includes the steps of designing a cell library pattern by executing for each of the cell libraries a treatment for correcting proximity effect directed to correcting the change of shape taking place during the formation of a pattern by the exposure of a mask pattern, designing a mask pattern by laying out the cell libraries and changing the amount of correction of proximity effect applied to the cell libraries in consideration of the influence of the cell library patterns disposed peripherally. This treatment for correction is executed by the degree of influence exerted by surrounding patterns collected in advance and the genetic algorithm.11-06-2008

Nobuyuki Yoshioka, Tokyo JP

Patent application numberDescriptionPublished
20080250383Method for designing mask pattern and method for manufacturing semiconductor device - A mask pattern designing method capable of achieving the reduction in the increasing OPC processing time, shortening the manufacture TAT of a semiconductor device, and achieving the cost reduction is provided. An OPC (optical proximity correction) process at the time when a cell is singularly arranged is performed to a cell library pattern which forms a basic structure of a semiconductor circuit pattern in advance, and a semiconductor chip is produced using the cell library pattern to which the OPC process has been performed. At this time, since the cell library pattern which has been OPC-processed in advance is influenced by the cell library patterns around it, the correction process thereof is performed to the end portions of the patterns near the cell boundary. As particularly effective OPC correction means, the genetic algorithm is used.10-09-2008

Nobuyuki Yoshioka, Tsukuba-Shi JP

Patent application numberDescriptionPublished
20110282008SILICONE MONOMER - The invention provides a silicone monomer having high purity and suitable for use in the manufacture of ophthalmic devices, and a contact lens produced from the silicone monomer as a polymerizable component. The silicone monomer is represented by the formula (1):11-17-2011