Patent application number | Description | Published |
20120154816 | Imaging apparatus, electronic apparatus, photovoltaic cell, and method of manufacturing imaging apparatus - An imaging apparatus includes: an imaging unit in which a plurality of pixels receiving incidence light on a light receiving face are disposed in an imaging region of a substrate, wherein the pixel includes a thermocouple device group in which a plurality of thermocouples are aligned along the light receiving face, wherein, in the thermocouple device group, the plurality of thermocouples are arranged so as to be separated from each other such that the light receiving face has a grating structure, and wherein the thermocouple device group is disposed such that the incidence light is incident to the grating structure so as to cause plasmon resonance to occur on the light receiving face, and an electromotive force is generated due to a change in the temperature of a portion of the thermocouple device group, at which the plasmon resonance occurs, in each of the plurality of thermocouples. | 06-21-2012 |
20120158379 | SIMULATOR, PROCESSING SYSTEM, DAMAGE EVALUATION METHOD AND DAMAGE EVALUATION PROGRAM - Disclosed herein is a simulator including: an input section adapted to acquire processing conditions for a given process performed on a workpiece; and a damage calculation section adapted to acquire the damage of the workpiece, based on the processing conditions, by calculating, using a Flux method, the relationship between the amount of a first substance externally injected onto a given evaluation point on the workpiece during the given process and the amount of a second substance released from the given evaluation point on the workpiece as a result of the injection of the first substance. | 06-21-2012 |
20120211850 | IMAGING ELEMENT, METHOD FOR MANUFACTURING IMAGING ELEMENT, PIXEL DESIGN METHOD, AND ELECTRONIC APPARATUS - An imaging element includes a plurality of pixels that are two-dimensionally arranged and each have a light receiving part including a photoelectric conversion element and a light collecting part that collects incident light toward the light receiving part. Each of the light collecting parts in the plurality of pixels includes an optical functional layer having, in a surface, a specific projection and depression structure depending on the pixel position. | 08-23-2012 |
20130017672 | PLASMA TREATMENT METHOD, PLASMA TREATMENT APPARATUS, AND SEMICONDUCTOR DEVICE MANUFACTURING METHODAANM Kuboi; NobuyukiAACI KanagawaAACO JPAAGP Kuboi; Nobuyuki Kanagawa JPAANM Fukusawa; MasanagaAACI TokyoAACO JPAAGP Fukusawa; Masanaga Tokyo JP - A plasma treatment method includes: creating a plasma from a mixed gas containing carbon and nitrogen to generate CN active species, and treating a surface of a semiconductor substrate with the CN active species. | 01-17-2013 |
20130133832 | SIMULATION METHOD, SIMULATION PROGRAM, AND SEMICONDUCTOR MANUFACTURING APPARATUS - The simulation method is for predicting a damage amount due to ultraviolet rays in manufacturing a semiconductor device. The method includes: calculating particle density by performing simulation based on a differential equation for the particle density; calculating emission intensity at each wavelength in a visible wavelength region based on the calculated particle density; obtaining an electron energy distribution function by comparing the calculated emission intensity at each wavelength in the visible wavelength region with an actually detected emission spectrum in the visible wavelength region with reference to information on emission species and an emission wavelength in a target manufacturing process; predicting an emission spectrum in an ultraviolet wavelength region by using the electron energy distribution function and a reaction cross-sectional area relating to the emission species; and predicting a damage amount due to the ultraviolet rays based on the predicted emission spectrum in the ultraviolet wavelength region. | 05-30-2013 |
20130342722 | SOLID-STATE IMAGING DEVICE, MANUFACTURING METHOD THEREOF, AND ELECTRONIC APPARATUS - A solid-state imaging device includes: pixels each including a hybrid photoelectric conversion portion and pixel transistors, wherein the hybrid photoelectric conversion portion includes a semiconductor layer having a p-n junction, a plurality of columnar or cylindrical hollow-shaped organic material layers disposed in the semiconductor layer, and a pair of electrodes disposed above and below the semiconductor layer and the organic material layers, wherein charges generated in the organic material layers through photoelectric conversion move inside the semiconductor layer so as to be guided to a charge accumulation region, and wherein the solid-state imaging device is configured as a back-illuminated type in which light is incident from a surface opposite to the surface on which the pixel transistors are formed. | 12-26-2013 |
20140005990 | SIMULATION METHOD, SIMULATION PROGRAM, PROCESSING UNIT, AND SIMULATOR | 01-02-2014 |
20140129203 | SIMULATION METHOD, SIMULATION PROGRAM, SIMULATOR PROCESSING EQUIPMENT, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A simulation method to cause an information processing device to calculate, including: reversely tracing a first flux incident on any position on a surface of a workpiece subject to processing treatment from the position; when the first flux strikes another position on the workpiece surface as a result of the reverse tracing of the first flux, calculating a second flux to be the first flux by scattering at the another position and reversely tracing the second flux from the another position; and, by repeating calculation and reverse tracing of flux, when the reversely traced flux no longer strikes the workpiece surface, carrying out comparison of the flux with an angular distribution of a flux incident on the workpiece, and when the current flux is within the angular distribution, obtaining an amount of flux having contributed to the scattering for a flux group from the first flux to the current flux. | 05-08-2014 |
20140285627 | SOLID-STATE IMAGE PICKUP DEVICE, METHOD OF DRIVING SOLID-STATE IMAGE PICKUP DEVICE, AND ELECTRONIC APPARATUS - Provided is a solid-state image pickup device that includes: a plurality of pixels each including a photoelectric conversion element; and a transmittance control element provided on a light incident side of the photoelectric conversion element of at least a part of the plurality of pixels, and configured to change a transmittance of incident light by an external input. | 09-25-2014 |
20140367554 | IMAGING ELEMENT, METHOD FOR MANUFACTURING IMAGING ELEMENT, PIXEL DESIGN METHOD, AND ELECTRONIC APPARATUS - An imaging element includes a plurality of pixels that are two-dimensionally arranged and each have a light receiving part including a photoelectric conversion element and a light collecting part that collects incident light toward the light receiving part. Each of the light collecting parts in the plurality of pixels includes an optical functional layer having, in a surface, a specific projection and depression structure depending on the pixel position. | 12-18-2014 |