| Patent application number | Description | Published |
| 20080229949 | Liquid transfer apparatus - A liquid transfer apparatus includes a supply cylinder and viscosity reducing agent supply unit. The supply cylinder comes into contact with a transfer target body and supplies a transfer liquid to the transfer target body. The viscosity reducing agent supply unit supplies a viscosity reducing agent which reduces a viscosity of the transfer liquid to the supply cylinder after the apparatus emergently stops and before the supply cylinder starts transfer. | 09-25-2008 |
| 20080229952 | Cleaning apparatus - A cleaning apparatus includes a first liquid supply unit, second cylinder, cleaning unit, third cylinder, second liquid supply unit, first cleaning liquid supply unit, and controller. The first liquid supply unit supplies a transfer liquid to a first cylinder. The second cylinder performs transfer to one surface of a transfer target body with the transfer liquid transferred from the first cylinder. The cleaning unit cleans the circumferential surface of the second cylinder in contact with it. The third cylinder is arranged to oppose the second cylinder and performs transfer to the other surface of the transfer target body. The second liquid supply unit supplies the transfer liquid to the third cylinder. The first cleaning liquid supply unit supplies a cleaning liquid to at least one of the first cylinder and the third cylinder. The controller controls the control unit to clean the second cylinder while the second cylinder is in contact with the first cylinder and the third cylinder. | 09-25-2008 |
| 20080229953 | Cleaning apparatus - A cleaning apparatus includes a cleaning web, contact member, and web travel unit. The cleaning web is supported to be able to come into contact with and separate from a rotating body so as to clean the rotating body. The contact member comes into contact with the cleaning web. The web travel unit causes the cleaning web to travel and causes the cleaning web to travel for a predetermined length after cleaning the rotating body. | 09-25-2008 |
| 20080229954 | Cleaning apparatus - A cleaning apparatus includes a liquid supply device and cleaning unit. The liquid supply device supplies a transfer liquid to a first cylinder. The transfer liquid supplied from the liquid supply device to the first cylinder is transferred to a transfer target body which comes into contact with the first cylinder. The cleaning unit comes into contact with and cleans the first cylinder. The cleaning unit is arranged downstream of a contact position where the first cylinder is in contact with the transfer target body in a rotational direction of the first cylinder, and upstream of a liquid receiving position where the first cylinder receives a liquid supplied from the liquid supply device in a rotational direction of the first cylinder. | 09-25-2008 |
| Patent application number | Description | Published |
| 20080230526 | Welding method and welded joint structure - The invention provides a welding system capable of freely controlling the dispersion and concentration of arc heat over the groove face with an extremely narrow gap and a high strength and high quality welded joint structure which is formed by this welding system and which is capable of preventing softening/hardening of the structure, the lowering of the toughness thereof and the generation of a crack. According to the welding system, the melting rate of a welding wire is controlled relative to the welding wire feeding rate by changing the characteristic of an arc current so that the range of behavior and the transfer rate of the arc pole (the arc generating main point at a groove surface) are controlled. Further, the welded joint structure consists of a high strength steel having a superfine grain structure with a carbon equivalent of as low as less than 0.38 and a crystal grain size of less than 7 μm and is welded by a consumable electrode type arc welding method so as to control the arc heat distribution on the groove face of the joint. | 09-25-2008 |
| 20090039065 | Welding wire and welding method - A plurality of metal materials to be a composition, without containing a flux, of a required welded portion are laminated in order to improve characteristics such as toughness of the welded portion and to carry out a stable welding operation. A welding wire enclosing an alkaline metal compound is used between the layers. The welding is carried out in a high-purity inert gas atmosphere. | 02-12-2009 |
| 20110042365 | WELDING METHOD AND WELDING JOINT STRUCTURE - The invention provides a welding system capable of freely controlling the dispersion and concentration of arc heat over the groove face with an extreamly narrow gap and a high strength and high quality welded joint structure which is formed by this welding system and which is capable of preventing softening/hardening of the structure, the lowering of the toughness thereof and the generation of a crack. According to the welding system, the melting rate of a welding wire is controlled relative to the welding wire feeding rate by changing the characteristic of an arc current so that the range of behavior and the transfer rate of the arc pole (the arc generating main point at a groove surface) are controlled. Further, the welded joint structure consists of a high strength steel having a superfine grain structure with a carbon equivalent of as low as less than 0.38 and a crystal grain size of less than 7 μm and is welded by a consumable electrode type arc welding method so as to control the arc heat distribution on the groove face of the joint. | 02-24-2011 |
| Patent application number | Description | Published |
| 20080229949 | Liquid transfer apparatus - A liquid transfer apparatus includes a supply cylinder and viscosity reducing agent supply unit. The supply cylinder comes into contact with a transfer target body and supplies a transfer liquid to the transfer target body. The viscosity reducing agent supply unit supplies a viscosity reducing agent which reduces a viscosity of the transfer liquid to the supply cylinder after the apparatus emergently stops and before the supply cylinder starts transfer. | 09-25-2008 |
| 20080229952 | Cleaning apparatus - A cleaning apparatus includes a first liquid supply unit, second cylinder, cleaning unit, third cylinder, second liquid supply unit, first cleaning liquid supply unit, and controller. The first liquid supply unit supplies a transfer liquid to a first cylinder. The second cylinder performs transfer to one surface of a transfer target body with the transfer liquid transferred from the first cylinder. The cleaning unit cleans the circumferential surface of the second cylinder in contact with it. The third cylinder is arranged to oppose the second cylinder and performs transfer to the other surface of the transfer target body. The second liquid supply unit supplies the transfer liquid to the third cylinder. The first cleaning liquid supply unit supplies a cleaning liquid to at least one of the first cylinder and the third cylinder. The controller controls the control unit to clean the second cylinder while the second cylinder is in contact with the first cylinder and the third cylinder. | 09-25-2008 |
| 20080229953 | Cleaning apparatus - A cleaning apparatus includes a cleaning web, contact member, and web travel unit. The cleaning web is supported to be able to come into contact with and separate from a rotating body so as to clean the rotating body. The contact member comes into contact with the cleaning web. The web travel unit causes the cleaning web to travel and causes the cleaning web to travel for a predetermined length after cleaning the rotating body. | 09-25-2008 |
| 20080229954 | Cleaning apparatus - A cleaning apparatus includes a liquid supply device and cleaning unit. The liquid supply device supplies a transfer liquid to a first cylinder. The transfer liquid supplied from the liquid supply device to the first cylinder is transferred to a transfer target body which comes into contact with the first cylinder. The cleaning unit comes into contact with and cleans the first cylinder. The cleaning unit is arranged downstream of a contact position where the first cylinder is in contact with the transfer target body in a rotational direction of the first cylinder, and upstream of a liquid receiving position where the first cylinder receives a liquid supplied from the liquid supply device in a rotational direction of the first cylinder. | 09-25-2008 |
| 20080236420 | Liquid transfer method and liquid transfer apparatus - A liquid transfer method includes the steps of conveying a sheet by holding the sheet by a transport cylinder, and transferring a liquid to one surface of the sheet by a transfer cylinder opposing the transport cylinder and transferring the liquid to the other surface of the sheet by the transport cylinder. The step of transferring includes the step of positioning an edge of a region on one surface of the sheet, downstream in a sheet convey direction, where the liquid is to be transferred, upstream in the sheet convey direction of an edge of a region on the other surface of the sheet, downstream in the sheet convey direction, where the liquid is to be transferred. A liquid transfer apparatus is also disclosed. | 10-02-2008 |
| Patent application number | Description | Published |
| 20110132757 | Sputtering Target with Few Surface Defects, and Surface Processing Method Thereof - A sputtering target and surface processing method is provided. Intermetallic compounds, oxides, carbides, carbonitrides and other substances without ductility exist in the target surface in a highly ductile matrix phase at a volume ratio of 1 to 50%. The target surface is preliminarily subjected to primary processing of cutting work, and then subsequently subjected to finish processing via polishing. The sputtering target subject to this surface processing has an improved target surface with numerous substances without ductility and prevents or suppresses the generation of nodules and particles upon sputtering. | 06-09-2011 |
| 20110162971 | Sputtering Target and Process for Producing Same - A sputtering target with low generation of particles in which oxides, carbides, nitrides, borides, intermetallic compounds, carbonitrides, and other substances without ductility exist in a matrix phase made of a highly ductile substance at a volume ratio of 1 to 50%, wherein a highly ductile and conductive metal coating layer is formed on an outermost surface of the target. Provided are a sputtering target capable of improving the target surface in which numerous substances without ductility exist and preventing or inhibiting the generation of nodules and particles during sputtering, and a method of producing such a sputtering | 07-07-2011 |
| 20110284373 | Inorganic-Particle-Dispersed Sputtering Target - Provided is an inorganic-particle-dispersed sputtering target in which inorganic particles are dispersed in a Co base material, wherein the inorganic particles have an electric resistivity of 1×10 | 11-24-2011 |