Patent application number | Description | Published |
20080203466 | METHOD OF MANUFACTURING A NONVOLATILE SEMICONDUCTOR MEMORY DEVICE, AND A NONVOLATILE SEMICONDUCTOR MEMORY DEVICE - For enhancing the high performance of a non-volatile semiconductor memory device having an MONOS type transistor, a non-volatile semiconductor memory device is provided with MONOS type transistors having improved performance in which the memory cell of an MONOS non-volatile memory comprises a control transistor and a memory transistor. A control gate of the control transistor comprises an n-type polycrystal silicon film and is formed over a gate insulative film comprising a silicon oxide film. A memory gate of the memory transistor comprises an n-type polycrystal silicon film and is disposed on one of the side walls of the control gate. The memory gate comprises a doped polycrystal silicon film with a sheet resistance lower than that of the control gate comprising a polycrystal silicon film formed by ion implantation of impurities to the undoped silicon film. | 08-28-2008 |
20080206975 | METHOD OF MANUFACTURING A NONVOLATILE SEMICONDUCTOR MEMORY DEVICE, AND A NONVOLATILE SEMICONDUCTOR MEMORY DEVICE - For enhancing the high performance of a non-volatile semiconductor memory device having an MONOS type transistor, a non-volatile semiconductor memory device is provided with MONOS type transistors having improved performance in which the memory cell of an MONOS non-volatile memory comprises a control transistor and a memory transistor. A control gate of the control transistor comprises an n-type polycrystal silicon film and is formed over a gate insulative film comprising a silicon oxide film. A memory gate of the memory transistor comprises an n-type polycrystal silicon film and is disposed on one of the side walls of the control gate. The memory gate comprises a doped polycrystal silicon film with a sheet resistance lower than that of the control gate comprising a polycrystal silicon film formed by ion implantation of impurities to the undoped silicon film. | 08-28-2008 |
20100144108 | METHOD OF MANUFACTURING A NONVOLATILE SEMICONDUCTOR MEMORY DEVICE, AND A NONVOLATILE SEMICONDUCTOR MEMORY DEVICE - For enhancing the high performance of a non-volatile semiconductor memory device having an MONOS type transistor, a non-volatile semiconductor memory device is provided with MONOS type transistors having improved performance in which the memory cell of an MONOS non-volatile memory comprises a control transistor and a memory transistor. A control gate of the control transistor comprises an n-type polycrystal silicon film and is formed over a gate insulative film comprising a silicon oxide film. A memory gate of the memory transistor comprises an n-type polycrystal silicon film and is disposed on one of the side walls of the control gate. The memory gate comprises a doped polycrystal silicon film with a sheet resistance lower than that of the control gate comprising a polycrystal silicon film formed by ion implantation of impurities to the undoped silicon film. | 06-10-2010 |
20110024820 | METHOD OF MANUFACTURING A NONVOLATILE SEMICONDUCTOR MEMORY DEVICE, AND A NONVOLATILE SEMICONDUCTOR MEMORY DEVICE - For enhancing the high performance of a non-volatile semiconductor memory device having an MONOS type transistor, a non-volatile semiconductor memory device is provided with MONOS type transistors having improved performance in which the memory cell of an MONOS non-volatile memory comprises a control transistor and a memory transistor. A control gate of the control transistor comprises an n-type polycrystal silicon film and is formed over a gate insulative film comprising a silicon oxide film. A memory gate of the memory transistor comprises an n-type polycrystal silicon film and is disposed on one of the side walls of the control gate. The memory gate comprises a doped polycrystal silicon film with a sheet resistance lower than that of the control gate comprising a polycrystal silicon film formed by ion implantation of impurities to the undoped silicon film. | 02-03-2011 |
Patent application number | Description | Published |
20080228383 | Engine Control Device - Exhaust emission control is exercised to restrict the exhaust amounts [g] of HC, CO, NOx, and the like. However, since the intake air amount for startup unduly increases due to an engine speed overshoot for startup, the exhaust amounts of HC, CO, and NOx increase excessively. Therefore, there is a need for optimizing the intake air amount for startup. The present invention proposes an engine startup control method that assures excellent startability and low exhaust emissions (small gas amount). Disclosed is an engine control device for starting an engine (from its stop state). The engine control device includes a section for setting a target engine operating state of each combustion; a section for detecting an actual engine operating state of each combustion; and a section for computing a control parameter for each subsequent combustion in accordance with the target engine operating state of each combustion and the actual engine operating state of each combustion. | 09-18-2008 |
20080319636 | Engine Control System - An engine control system for an internal combustion engine with a fuel injector, comprises a combustion fuel quantity computing means for computing a combustion fuel quantity in a combustion cycle; and a residual fuel quantity computing means for computing a residual fuel quantity in the combustion cycle based on a difference between an injection fuel quantity of the fuel injector and the combustion fuel quantity. | 12-25-2008 |
20090088948 | Engine Control Apparatus - An engine control apparatus for controlling the amount of the air flowing into each cylinder in accordance with the amount of the fuel flowing into the cylinder at the time of starting the engine is disclosed. Further, at the engine starting time, the target amount of the air flowing into the cylinder is calculated and/or the amount of the air flowing into the cylinder is controlled, based on the amount of the fuel flowing into the cylinder. The amount of the fuel remaining in the neighborhood of the engine intake port or in the intake pipe is calculated by being separated into a balanced liquid film amount and unbalanced liquid film amount. Based on the unbalanced liquid film amount, the injection fuel amount is corrected so that the amount of the fuel flowing into the cylinder is controlled with high accuracy. | 04-02-2009 |
20090159042 | Control Apparatus for an Engine - A control apparatus for an engine including a unit for retarding an ignition timing from an MBT by a predetermined value or more during cranking at engine starting or during a period from a first combustion up to an idling engine speed. | 06-25-2009 |
20090292448 | Engine Controller - An engine controller capable of optimizing both the air-fuel ratio and the ignition timing to provide HC-minimized performance under the relevant driving conditions (environmental conditions) in order to minimize the amount of HC emitted from an engine at the time of start-up (before catalyst activation) is provided. The engine controller includes: air-fuel ratio control means for controlling the air-fuel ratio to be within a predetermined range (for example, 14.5 to 16.5) when the engine is operated at a certain driving condition (for example, in a state in which the catalyst is not activated such as the time of starting a cooler, or idling time); and ignition timing correction means for correcting the ignition timing to the retard side when the engine is operated at the certain driving condition and the air-fuel ratio is within the predetermined range. | 11-26-2009 |
Patent application number | Description | Published |
20080210865 | Pattern Measuring Method and Electron Microscope - An object of the present invention is to provide a pattern measuring method and an electron microscope that achieve truly high measurement throughput by achieving both precise location of a measurement target position and high-speed movement of the scanning position of an electron beam to the measurement target position. In order to attain the object described above, according to an aspect of the present invention, there is provided a pattern measuring method and an apparatus that move the scanning position of an electron beam based on coordinate information about a first pattern, which is a target to be measured with the electron beam, move the scanning position of the electron beam to a region comprising a second pattern, the relative distance of which from the first pattern is previously registered, in a case where detection of the first pattern at the point of arrival fails, and move the scanning position of the electron beam based on detection of the second pattern and information about the relative distance. | 09-04-2008 |
20090250625 | SPECIMEN STAGE APPARATUS AND SPECIMEN STAGE POSITIONING CONTROL METHOD - A specimen stage apparatus has a braking structure which can generate a braking force enough to stop a specimen stage while keeping a movable table from increasing in its weight. The specimen stage apparatus has an X guide fixed on an X base and representing a guide structure in X direction, an X table constrained by the X guide to be movable in X direction, an X actuator having its movable part fixed to the X table and an X brake fixed to the X base and representing a braking structure for the X table. A controller carries out positioning control in which it generates a braking force by pushing the X brake against the bottom surface of the X table to stop a specimen stage and turning off the servo-control of the X actuator after stoppage of the specimen stage. | 10-08-2009 |
20090251091 | SAMPLE STAGE APPARATUS AND METHOD OF CONTROLLING THE SAME - The present invention provides a stage apparatus capable of reducing a positioning time without increasing a positional deviation. A positioning control method of a sample stage apparatus includes: a high-speed movement step of moving a table to a high-speed movement target position at a first movement speed; a positional deviation correcting step of moving the table to a low-speed positioning step start position at a second movement speed that is lower than the first movement speed; a low-speed positioning step of moving the table to a target position at a third movement speed that is lower than the second movement speed. After the low-speed positioning step is completed, a rod connected to a motor returns to its original position to separate a pin of the rod side from a concave portion of the table side. | 10-08-2009 |
20120070066 | CHARGED PARTICLE BEAM DEVICE AND EVALUATION METHOD USING THE CHARGED PARTICLE BEAM DEVICE - The charged particle beam device has a problem that a symmetry of equipotential distribution is disturbed near the outer edge of a specimen, an object being evaluated, causing a charged particle beam to deflect there. An electrode plate installed inside the specimen holding mechanism of electrostatic attraction type is formed of an inner and outer electrode plates arranged concentrically. The outer electrode plate is formed to have an outer diameter larger than that of the specimen. The dimensions of the electrode plates are determined so that an overlapping area of the outer electrode plate and the specimen is substantially equal to an area of the inner electrode plate. The inner electrode plate is impressed with a voltage of a positive polarity with respect to a reference voltage and of an arbitrary magnitude, and the outer electrode is impressed with a voltage of a negative polarity and of an arbitrary magnitude. | 03-22-2012 |
20120145920 | Stage Device - Disclosed is a smaller and lighter stage device which can be applied to a device such as a length measurement SEM for inspecting and/or evaluating a semiconductor, and in which the effect of a magnetic field on an electron beam can be reduced. Linear motors | 06-14-2012 |
20130228686 | CHARGED PARTICLE BEAM APPARATUS - Currently, there is no noise-proof cover, particularly noise-proof cover used in a clean room, which absorbs noise by a structure specialized for an estimated frequency of noise produced by environmental noise. Therefore, efficient noise absorption is still difficult. | 09-05-2013 |
20140042338 | STAGE APPARATUS AND CHARGED PARTICLE BEAM APPARATUS - A stage apparatus includes a column for irradiating a sample with a charged particle beam, a vacuum sample chamber to which the column is attached, moving tables disposed in the vacuum sample chamber to move the sample relatively to the column, and position detectors for detecting positions of the moving tables. The stage apparatus includes an attachment member disposed between the column and the vacuum sample chamber. The attachment member has an opening which restricts movement of the column in a same direction as directions of the moving tables. Reference mirrors in the position detectors for detecting the positions of the tables are attached to the attachment member. Each of the reference mirrors has an adjustment apparatus to adjust a relative angle between the reference mirror and the laser beam. | 02-13-2014 |