| Patent application number | Description | Published |
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| 20100086381 | VACUUM PROCESSING APPARATUS - Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body. | 04-08-2010 |
| 20100086382 | VACUUM PROCESSING APPARATUS - Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body. | 04-08-2010 |
| 20100086383 | VACUUM PROCESSING APPARATUS - Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body. | 04-08-2010 |
| 20100089531 | VACUUM PROCESSING APPARATUS - Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body. | 04-15-2010 |
| 20110023782 | GAS INJECTION UNIT FOR CHEMICAL VAPOR DESPOSITION APPARATUS - A gas injection unit allows uniform cooling thereof via smooth flow of coolant and can be easily manufactured. The gas injection unit for a chemical vapor deposition apparatus includes, inter alia: a gas distribution housing; a cooling housing positioned between the gas distribution housing and a processing chamber where a deposition process is performed, and formed with a coolant inlet through which coolant is introduced, and a coolant outlet through which the coolant is discharged; a processing gas pipe of which one end is opened to the gas distribution housing and the other end is opened to the processing chamber, the processing gas pipe penetrating the cooling housing; and a first wall part positioned inside the cooling housing such that an inside of the cooling housing is partitioned into a central path and a peripheral path, and formed with a penetration hole such that the central path communicates with the peripheral path. | 02-03-2011 |
| 20110027480 | CHEMICAL VAPOR DEPOSITION APPARATUS CAPABLE OF CONTROLLING DISCHARGING FLUID FLOW PATH IN REACTION CHAMBER - A chemical vapor deposition apparatus is equipped to control the width of a gas discharge path between a susceptor and an inner surface of a chamber without having to resort to redesign and remanufacturing of the apparatus. The chemical vapor deposition apparatus includes: a chamber; a susceptor positioned inside the chamber and on which a substrate can be loaded; a shower head injecting a processing gas toward the substrate; and a guide unit detachably installed inside the chamber to guide the processing gas such that the processing gas injected from the shower head is discharged through a chamber hole formed in the chamber. | 02-03-2011 |
| Patent application number | Description | Published |
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| 20090066861 | Display and Method of Manufacturing the Same - A display with a built-in touch panel and a method of manufacturing the same are provided. The display includes: a first substrate and a second substrate, wherein the first substrate and the second substrate are disposed to face each other. A conductive spacer having a first end is positioned on the first or second substrate. A cell gap spacer is disposed between the first and second substrates and at least one subsidiary cell gap spacer having a first end is disposed on the first or second substrate and positioned adjacent to the cell gap spacer. The cell gap spacer is also disposed close to the conductive spacer, and the subsidiary cell gap spacer is disposed adjacent to the cell gap spacer. Additionally, a cell gap spacer is disposed in every unit pixel, and a subsidiary cell gap spacer is disposed adjacent to each cell gap spacer. | 03-12-2009 |
| 20090073138 | Display panel and display apparatus having the same - A display panel having a touch screen, the display panel includes an array substrate having a plurality of pixels and an opposite substrate having a plurality of touch electrodes. The array substrate includes the pixels receiving a data signal through thin film transistors and sensors electrically and physically making contact with the touch electrodes in response to an external pressure. Each sensor generates a common voltage input through the touch electrode in response to a scan signal controlling the thin film transistor as a sensing signal. Based on the generated sensing signal, a location coordinate to which the external pressure is applied is calculated, so that the number of wires for the display panel may decrease. | 03-19-2009 |
| 20100277444 | DISPLAY DEVICE AND A METHOD FOR TESTING THE SAME - A method of economically manufacturing display devices having a matrix of drivable pixels arranged in rows and columns arranged to be driven by IC drivers, including the steps of including a plurality of sensor signal lines in the display device that are selectively connectable to certain of the pixel rows, a plurality of sensor signal lines selectively connectable to certain of the pixel columns, transmitting test signals to test predetermined ones of the rows and columns of pixels, and connecting pixel driving circuits to those display devices exhibiting uniform pixel brightness in response to the test signals. | 11-04-2010 |
