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Myoungsoo
Myoungsoo Jung, Suwon-Si KR
| Patent application number | Description | Published |
|---|---|---|
| 20090248987 | Memory System and Data Storing Method Thereof - A memory system includes a memory device having a cache area and a main area, and a memory controller configured to control the memory device, wherein the memory controller is configured to dump file data into the cache area in response to a flush cache command. | 10-01-2009 |
Myoungsoo Kim, Hwaseong-Si KR
| Patent application number | Description | Published |
|---|---|---|
| 20110215390 | Semiconductor Devices and Methods of Fabricating the Same - A semiconductor device includes capacitors connected in parallel. Electrode active portions and a discharge active portion are defined on a semiconductor substrate, and capping electrodes are disposed respectively on the electrode active portions. A capacitor-dielectric layer is disposed between each of the capping electrodes and each of the electrode active portions that overlap each other. A counter doped region is disposed in the discharge active portion. A lower interlayer dielectric covers the entire surface of the semiconductor substrate. Electrode contact plugs respectively contact the capping electrodes through the lower interlayer dielectric, and a discharge contact plug contacts the counter doped region through the lower interlayer dielectric. A lower interconnection is disposed on the lower interlayer dielectric and contacts the electrode contact plugs and the discharge contact plug. | 09-08-2011 |
Myoungsoo Lee, Suwon-Si KR
| Patent application number | Description | Published |
|---|---|---|
| 20110096979 | METHOD OF CORRECTING PATTERNS FOR SEMICONDUCTOR DEVICE - A method of correcting patterns includes attaining a correcting amount distribution map using a photo mask, the photo mask including a transparent substrate having first and second surfaces opposite to each other and a mask pattern on the first surface, attaining a plurality of shadowing maps based on the correction amount distribution map, each of the shadowing maps including a unit section having a different plane area, and forming a plurality of shadowing regions with shadowing elements in the transparent substrate of the photo mask using respective shadowing maps. | 04-28-2011 |
Myoungsoo Lee, Seoul KR
| Patent application number | Description | Published |
|---|---|---|
| 20090176936 | Ink composition and method of forming a pattern using the same - There are provided an ink composition for imprint lithography and roll-printing, which is applied to the formation of a pattern using imprint lithography and roll-printing to play the role of a pattern support, can increase the accuracy of pattern formation by minimizing the occurrence of a swelling phenomenon caused by the ink composition, and can improve yield and the efficiency of the process by increasing the transfer rate of a pattern, and a method of forming a pattern of a display or semiconductor by using the same. | 07-09-2009 |