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Mukawa
Hajime Mukawa, Nagoya-City JP
| Patent application number | Description | Published |
|---|---|---|
| 20080302467 | Pressure Resistant Vibration Absorbing Hose - A pressure resistant vibration absorbing hose has a hose body including an inner surface rubber layer, a reinforcing layer and an outer surface rubber layer and a joint fitting including a rigid insert pipe and a socket fitting. The joint fitting is attached to a swaged portion of an axial end portion of the hose body by securely swaging the socket fitting thereto. The inner surface rubber layer is formed by molding such that a swaged portion thereof is larger than a main portion thereof in diameter and a wall thickness of the swaged portion is equal to or larger than a wall thickness of the main portion, and after that, the reinforcing layer and the outer surface rubber layer are laminated to construct the hose body. | 12-11-2008 |
Naosuke Mukawa, Ichihara-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20110065835 | AROMATIC POLYCARBONATE RESIN COMPOSITION AND MOLDED BODY THEREOF - An aromatic polycarbonate resin composition including 100 parts by mass of a polycarbonate resin (A) containing an aromatic polycarbonate resin (a-1) and/or a silicone-copolymerized polycarbonate (a-2), and 0.01 to 30 parts by mass of a nanoporous carbon (B). A molded body of the resin composition is also provided. The aromatic polycarbonate resin composition has improved flame retardancy, moisture resistance and stability at a high temperature molding stage because of the addition of the nanoporous carbon to the polycarbonate resin containing an aromatic polycarbonate and/or a silicone-copolymerized polycarbonate, and is suitably used as, for example, a casing for OA appliances, electric and electronic appliances or communication appliances. | 03-17-2011 |
Naosuke Mukawa, Chiba JP
| Patent application number | Description | Published |
|---|---|---|
| 20090105378 | AROMATIC POLYCARBONATE RESIN COMPOSITION AND MOLDED ARTICLE THEREOF - Provided is an aromatic polycarbonate resin composition including a combination composed of 98 to 1 mass % of an aromatic polycarbonate (A), 1 to 98 mass % of an aliphatic polyester (B), and 1 to 80 mass % of an organic filler derived from a natural product (C), the aromatic polycarbonate resin composition being obtained by suppressing increase in density of an aromatic polycarbonate resin composition containing an aliphatic polyester, while improving rigidity and fluidity thereof and ameliorating poor external appearance such as pearly luster. | 04-23-2009 |
| 20110294928 | POLYCARBONATE RESIN COMPOSITION - Provided is a polycarbonate resin composition which has: a high degree of biomass (degree of vegetation); is excellent in environmental performance; has high fluidity and high impact resistance; is excellent in flame retardancy and heat resistance; and further provides a molded body excellent in molding appearance, by blending (B) a lignophenol at a specific ratio into (A) a polycarbonate resin or a resin mixture formed of the component (A) and (C) a polylactic acid and/or a copolymer containing a polylactic acid. | 12-01-2011 |
Takahito Mukawa, Nirasaki JP
| Patent application number | Description | Published |
|---|---|---|
| 20100224587 | PLASMA ETCHING METHOD, PLASMA ETCHING APPARATUS AND COMPUTER-READABLE STORAGE MEDIUM - Provided are a plasma etching method, a plasma etching apparatus and a computer-readable storage medium capable of plasma-etching a silicon-containing antireflection coating film (Si-ARC) with a high etching rate and a high selectivity while suppressing damage (roughness) of an ArF photoresist. In the plasma etching method, a Si-containing antireflection film | 09-09-2010 |
| 20110159697 | ETCHING METHOD AND ETCHING APPARATUS - There are provided an etching method and an etching apparatus suitable for etching an antireflection coating layer by using a resist film as a mask. The etching method includes forming the antireflection coating layer (Si-ARC layer) on an etching target layer; forming a patterned resist film (ArF resist film) on the antireflection coating layer; and forming a desired pattern on the antireflection coating layer by introducing an etching gas including a CF | 06-30-2011 |
Tatsuya Mukawa, Kanagawa JP
| Patent application number | Description | Published |
|---|---|---|
| 20110297819 | READING DEVICE - A reader device ( | 12-08-2011 |