Patent application number | Description | Published |
20090017292 | Reactive flow deposition and synthesis of inorganic foils - Sub-atmospheric pressure chemical vapor deposition is described with a directed reactant flow and a substrate that moves relative to the flow. Thus, using this CVD configuration a relatively high deposition rate can be achieved while obtaining desired levels of coating uniformity. Deposition approaches are described to place one or more inorganic layers onto a release layer, such as a porous, particulate release layer. In some embodiments, the release layer is formed from a dispersion of submicron particles that are coated onto a substrate. The processes described can be effective for the formation of silicon films that can be separated with the use of a release layer into a silicon foil. The silicon foils can be used for the formation of a range of semiconductor based devices, such as display circuits or solar cells. | 01-15-2009 |
20090075083 | Nanoparticle production and corresponding structures - Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles. | 03-19-2009 |
20090191348 | Zone melt recrystallization for inorganic films - ZMR apparatuses provide for controlled temperature flow through the system to reduce energy consumption while providing for desired crystal growth properties. The apparatus can include a cooling system to specifically remove a desired amount of heat from a melted film to facilitate crystallization. Furthermore, the apparatus can have heated walls to create a background temperature within the chamber that reduces energy use through the reduction or elimination of cooling for the chamber walls. The apparatuses and corresponding methods can be used with inorganic films directly or indirectly associated with a porous release layer that provides thermal insulation with respect to an underlying substrate. If the recrystallized film is removed from the substrate, the substrates can be reused. The methods can be used for large area silicon films with thicknesses from 2 microns to 100 microns, which are suitable for photovoltaic applications as well as electronics applications. | 07-30-2009 |
20090208725 | LAYER TRANSFER FOR LARGE AREA INORGANIC FOILS - Layer transfer approaches are described to take advantage of large area, thin inorganic foils formed onto a porous release layer. In particular, since the inorganic foils can be formed from ceramics and/or crystalline materials that do not bend a large amount, approaches are described to provide for gradual pulling along an edge to separate the foil from a holding surface along a curved surface designed to not excessively bend the foil such that the foil is not substantially damaged in the transfer process. Apparatuses are described to perform the transfer with a rocking motion or with a rotating cylindrical surface. Furthermore, stabilization of porous release layers can improve the qualities of resulting inorganic foils formed on the release layer. In particular, flame treatments can provide improved release layer properties, and the deposition of an interpenetrating stabilization composition can be deposited using CVD to stabilize a porous layer. | 08-20-2009 |
20090288601 | COATING FORMATION BY REACTIVE DEPOSITION - Light reactive deposition uses an intense light beam to form particles that are directly coated onto a substrate surface. In some embodiments, a coating apparatus comprising a noncircular reactant inlet, optical elements forming a light path, a first substrate, and a motor connected to the apparatus. The reactant inlet defines a reactant stream path. The light path intersects the reactant stream path at a reaction zone with a product stream path continuing from the reaction zone. The substrate intersects the product stream path. Also, operation of the motor moves the first substrate relative to the product stream. Various broad methods are described for using light driven chemical reactions to produce efficiently highly uniform coatings. | 11-26-2009 |
20100190288 | THIN SILICON OR GERMANIUM SHEETS AND PHOTOVOLATICS FORMED FROM THIN SHEETS - Thin semiconductor foils can be formed using light reactive deposition. These foils can have an average thickness of less than 100 microns. In some embodiments, the semiconductor foils can have a large surface area, such as greater than about 900 square centimeters. The foil can be free standing or releasably held on one surface. The semiconductor foil can comprise elemental silicon, elemental germanium, silicon carbide, doped forms thereof, alloys thereof or mixtures thereof. The foils can be formed using a release layer that can release the foil after its deposition. The foils can be patterned, cut and processed in other ways for the formation of devices. Suitable devices that can be formed form the foils include, for example, photovoltaic modules and display control circuits. | 07-29-2010 |
20100209328 | METHODS FOR SYNTHESIZING SUBMICRON DOPED SILICON PARTICLES - Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles. | 08-19-2010 |
20110143019 | Apparatus for Deposition on Two Sides of the Web - Apparatuses and methods for depositing materials on both side of a web while it passes a substantially vertical direction are provided. In particular embodiments, a web does not contact any hardware components during the deposition. A web may be supported before and after the deposition chamber but not inside the deposition chamber. At such support points, the web may be exposed to different conditions (e.g., temperature) than during the deposition. | 06-16-2011 |
20120012032 | DISPERSIONS OF SUBMICRON DOPED SILICON PARTICLES - Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles. | 01-19-2012 |
20120244060 | METHODS FOR SYNTHESIZING SUBMICRON DOPED SILICON PARTICLES - Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles. | 09-27-2012 |
20120308856 | SHUNT CURRENT RESISTORS FOR FLOW BATTERY SYSTEMS - Shunt currents in electrochemical systems with liquid electrolytes are reduced by placing shunt resistors in electrolyte flow paths. Shunt resistors substantially increase electrical resistance in electrolyte flow channels by interrupting the physical continuity of liquid through their length. Some shunt resistors also provide a flow metering, pumping or flow-resisting functions for improved electrolyte flow control. | 12-06-2012 |
20140302232 | DEPOSITION ON TWO SIDES OF A WEB - Apparatuses and methods for depositing materials on both side of a web while it passes a substantially vertical direction are provided. In particular embodiments, a web does not contact any hardware components during the deposition. A web may be supported before and after the deposition chamber but not inside the deposition chamber. At such support points, the web may be exposed to different conditions (e.g., temperature) than during the deposition. | 10-09-2014 |
20150037513 | HIGH RATE DEPOSITION FOR THE FORMATION OF HIGH QUALITY OPTICAL COATINGS - High rate deposition methods comprise depositing a powder coating from a product flow. The product flow results from a chemical reaction within the flow. Some of the powder coatings consolidate under appropriate conditions into an optical coating. The substrate can have a first optical coating onto which the powder coating is placed. The resulting optical coating following consolidation can have a large index-of-refraction difference with the underlying first optical coating, high thickness and index-of-refraction uniformity across the substrate and high thickness and index-of-refraction uniformity between coatings formed on different substrates under equivalent conditions. In some embodiments, the deposition can result in a powder coating of at least about 100 nm in no more than about 30 minutes with a substrate having a surface area of at least about 25 square centimeters. | 02-05-2015 |
Patent application number | Description | Published |
20130011702 | Redox Flow Battery System with Divided Tank System - A redox flow battery system is provided with one or more tanks for containing electrolytes. Embodiments of electrolyte tanks include active and/or passive dividers within a single tank structure. Dividers may be configured to prevent mixing of a charged electrolyte and a discharged electrolyte stored within a single tank. | 01-10-2013 |
20130011704 | Redox Flow Battery System with Multiple Independent Stacks - A redox flow battery system is provided with independent stack assemblies dedicated for charging and discharging functions. In such a system, characteristics of the charging stack assembly may be configured to provide a high efficiency during a charging reaction, and the discharging stack may be configured to provide a high efficiency during a discharging reaction. In addition to decoupling charging and discharging reactions, redox flow battery stack assemblies are also configured for other variables, such as the degree of power variability of a source or a load. Using a modular approach to building a flow battery system by separating charging functions from discharging functions, and configuring stack assemblies for other variables, provides large-scale energy storage systems with great flexibility for a wide range of applications. | 01-10-2013 |
20130022852 | Porous Electrode with Improved Conductivity - Methods for improving the electrical conductivity of a carbon felt material is provided. In some embodiments, a method improving the electrical conductivity of a carbon felt material comprises applying a carbon source liquid to at least a portion of a carbon felt material, optionally removing excess carbon source liquid from the carbon felt material, and converting the carbon source material to solid carbon, such as by heating. Also provided are materials and products created using these methods. | 01-24-2013 |