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Morad
Mohamed M. Morad, Marshall, MN US
| Patent application number | Description | Published |
|---|---|---|
| 20100266731 | PIZZA AND CRUST HAVING AN IRREGULAR EDGE - Premium quality parbaked frozen pizza can be made by adding premium rough cut toppings to a premium generally square crust having a rough edge mimicking a hand formed crust. The pizza provides the appearance of being hand made and baked in a brick wood fired oven providing a crispy exterior, a soft interior crust having characteristic toasted color indicia. In use, the pizza is packaged in conventional corrugated forms, outer wrapped and packaged for delivery in retail environments. The product can be removed from its packaging and baked at home, mimicking a product from a restaurant grade preparation. | 10-21-2010 |
| 20100266736 | PIZZA AND CRUST HAVING AN IRREGULAR EDGE - Premium quality parbaked frozen pizza can be made by adding premium rough cut toppings to a premium generally square crust having a rough edge mimicking a hand formed crust. The pizza provides the appearance of being hand made and baked in a brick wood fired oven providing a crispy exterior, a soft interior crust having characteristic toasted color indicia. In use, the pizza is packaged in conventional corrugated forms, outer wrapped and packaged for delivery in retail environments. The product can be removed from its packaging and baked at home, mimicking a product from a restaurant grade preparation. | 10-21-2010 |
Ratson Morad, Santa Clara, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090255471 | METHOD OF DEPOSITING MATERIALS ON A NON-PLANAR SURFACE - A method of depositing materials on a non-planar surface is disclosed. The method is effectuated by rotating non-planar substrates as they travel down a translational path of a processing chamber. As the non-planar substrates simultaneously rotate and translate down a processing chamber, the rotation exposes the whole or any desired portion of the surface area of the non-planar substrates to the deposition process, allowing for uniform deposition as desired. Alternatively, any predetermined pattern is able to be exposed on the surface of the non-planar substrates. Such a method effectuates manufacture of non-planar semiconductor devices, including, but not limited to, non-planar light emitting diodes, non-planar photovoltaic cells, and the like. | 10-15-2009 |
| 20110045674 | METHOD AND APPARATUS FOR INLINE DEPOSITION OF MATERIALS ON A NON-PLANAR SURFACE - In manufacturing a semiconductor device, a first chamber is provided. An opening couples the first chamber to a first environment through which at least one substrate can pass. A first seal environmentally isolates the first chamber from the first environment. A process chamber is coupled to the first chamber. Another seal environmental isolates the first and the process chambers. The substrate is placed within the first chamber, and the first chamber and the outside environment are isolated. The second opening is opened, and the substrate moves into the semiconductor process chamber. The first chamber is again environmentally isolated from the second volume. A semiconductor processing step is performed on the substrate within the processing chamber. While the substrate is processed, the substrate is rotated and translated through the processing chamber. | 02-24-2011 |
Ratson Morad, San Mateo County, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20080248647 | Method of depositing materials on a non-planar surface - A method of depositing materials on a non-planar surface is disclosed. The method is effectuated by rotating non-planar substrates as they travel down a translational path of a processing chamber. As the non-planar substrates simultaneously rotate and translate down a processing chamber, the rotation exposes the whole or any desired portion of the surface area of the non-planar substrates to the deposition process, allowing for uniform deposition as desired. Alternatively, any predetermined pattern is able to be exposed on the surface of the non-planar substrates. Such a method effectuates manufacture of non-planar semiconductor devices, including, but not limited to, non-planar light emitting diodes, non-planar photovoltaic cells, and the like. | 10-09-2008 |
| 20080276451 | Method of and apparatus for inline deposition of materials on a non-planar surface - In manufacturing a semiconductor device, a first chamber is provided. An opening couples the first chamber to a first environment through which at least one substrate can pass. A first seal environmentally isolates the first chamber from the first environment. A process chamber is coupled to the first chamber. Another seal environmental isolates the first and the process chambers. The substrate is placed within the first chamber, and the first chamber and the outside environment are isolated. The second opening is opened, and the substrate moves into the semiconductor process chamber. The first chamber is again environmentally isolated from the second volume. A semiconductor processing step is performed on the substrate within the processing chamber. While the substrate is processed, the substrate is rotated and translated through the processing chamber. | 11-13-2008 |
Ronny Morad US
| Patent application number | Description | Published |
|---|---|---|
| 20120117424 | SYSTEM-LEVEL TESTCASE GENERATION - A system-level testcase may be generated by performing system-level generation tasks by a system-level generator to produce an abstract testcase. Based upon the abstract testcase, one or more unit-level generators may generate the testcase. The testcase may be utilized in simulation of operation of a system-under-test (SUT). The testcase may be utilized for verification of the SUT. The SUT may comprise a plurality of units. The unit-level generator may be associated with units of the SUT and perform generation tasks associated with pertinent units. | 05-10-2012 |