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Moorthy, US
Anush Moorthy, Austin, TX US
| Patent application number | Description | Published |
|---|---|---|
| 20110274361 | DETERMINING QUALITY OF AN IMAGE OR VIDEO USING A DISTORTION CLASSIFIER - Techniques and structures are disclosed in which one or more distortion categories are identified for an image or video, and a quality of the image or video is determined based on the one or more distortion categories. The image or video may be of a natural scene, and may be of unknown provenance. Identifying a distortion category and/or determining a quality may be performed without any corresponding reference (e.g., undistorted) image or video. Identifying a distortion category may be performed using a distortion classifier. Quality may be determined with respect to a plurality of human opinion scores that correspond to a particular distortion category to which an image or video of unknown provenance is identified as belonging. Various statistical methods may be used in performing said identifying and said determining, including use of generalized Gaussian distribution density models and natural scene statistics. | 11-10-2011 |
Arun Moorthy, Seattle, WA US
| Patent application number | Description | Published |
|---|---|---|
| 20090077573 | Execution Context Infrastructure - Described herein is an implementation for exposing an “execution context” to a logical execution flow of procedures as it executes. An “execution context” is a set of data and/or sub-procedures that might be useful at some point during a logical execution flow (to manage and control the execution flow and provide additional services to the execution flow) of computer-executable instructions though the often complex, intertwined, and interconnected conglomeration of procedures of software product(s) | 03-19-2009 |
Arun Moorthy, Newcastle, WA US
| Patent application number | Description | Published |
|---|---|---|
| 20090126011 | APPLICATION SECURITY MODEL - Performing security sensitive operations with an application security model. Security agnostic code is executed. The security agnostic code is identified as not having authorization to perform a security sensitive operation. Executing the security agnostic code includes calling code identified as security safe critical code. In response to the security agnostic code calling the security safe critical code, the security safe critical code is executed. The security safe critical code includes functionality for performing validity checks. Executing the security safe critical code includes performing an validity check for the security agnostic code. When the security agnostic code passes the validity check, code identified as security critical code is called. In response to the security safe critical code calling the security critical code, the security critical code is executed. The security critical code is authorized to perform the security sensitive operation. | 05-14-2009 |
Ganesh Moorthy, Collegeville, PA US
| Patent application number | Description | Published |
|---|---|---|
| 20080300242 | Imidazopyridine Kinase Inhibitors - The present invention provides imidazopyridine compounds, compositions containing the same, as well as processes for the preparation and methods for their use as pharmaceutical agents. | 12-04-2008 |
Ganesh S. Moorthy, Collegeville, PA US
| Patent application number | Description | Published |
|---|---|---|
| 20100216779 | Imidazopyridine Kinase Inhibitors - The present invention provides imidazopyridine compounds, compositions containing the same, as well as processes for the preparation and methods for their use as pharmaceutical agents. | 08-26-2010 |
Madhu Moorthy, San Jose, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090053893 | ATOMIC LAYER DEPOSITION OF TUNGSTEN MATERIALS - Embodiments of the invention provide an improved process for depositing tungsten-containing materials. The process utilizes soak processes and vapor deposition processes, such as atomic layer deposition (ALD) to provide tungsten films having significantly improved surface uniformity and production level throughput. In one embodiment, a method for forming a tungsten-containing material on a substrate is provided which includes positioning a substrate within a process chamber, wherein the substrate contains an underlayer disposed thereon, exposing the substrate sequentially to a tungsten precursor and a reducing gas to deposit a tungsten nucleation layer on the underlayer during an ALD process, wherein the reducing gas contains a hydrogen/hydride flow rate ratio of about 40:1, 100:1, 500:1, 800:1, 1,000:1, or greater, and depositing a tungsten bulk layer on the tungsten nucleation layer. The reducing gas contains a hydride compound, such as diborane, silane, or disilane. | 02-26-2009 |
| 20110244682 | ATOMIC LAYER DEPOSITION OF TUNGSTEN MATERIALS - Embodiments of the invention provide a method for depositing tungsten-containing materials. In one embodiment, a method includes forming a tungsten nucleation layer over an underlayer disposed on the substrate while sequentially providing a tungsten precursor and a reducing gas into a process chamber during an atomic layer deposition (ALD) process and depositing a tungsten bulk layer over the tungsten nucleation layer, wherein the reducing gas contains hydrogen gas and a hydride compound (e.g., diborane) and has a hydrogen/hydride flow rate ratio of about 500:1 or greater. In some examples, the method includes flowing the hydrogen gas into the process chamber at a flow rate within a range from about 1 slm to about 20 slm and flowing a mixture of the hydride compound and a carrier gas into the process chamber at a flow rate within a range from about 50 sccm to about 500 sccm. | 10-06-2011 |
Madhu Moorthy, Santa Clara, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20080280438 | METHODS FOR DEPOSITING TUNGSTEN LAYERS EMPLOYING ATOMIC LAYER DEPOSITION TECHNIQUES - In one embodiment of the invention, a method for forming a tungsten-containing layer on a substrate is provided which includes positioning a substrate containing a barrier layer disposed thereon in a process chamber, exposing the substrate to a first soak process for a first time period and depositing a nucleation layer on the barrier layer by flowing a tungsten-containing precursor and a reductant into the process chamber. The method further includes exposing the nucleation layer to a second soak process for a second time period and depositing a bulk layer on the nucleation layer. In one example, the barrier layer contains titanium nitride, the first and second soak processes independently comprise at least one reducing gas selected from the group consisting of hydrogen, silane, disilane, dichlorosilane, borane, diborane, derivatives thereof and combinations thereof and the nucleation layer may be deposited by an atomic layer deposition process or a pulsed chemical vapor deposition process while the bulk layer may be deposited by a chemical vapor deposition process or a physical vapor deposition process. | 11-13-2008 |
| 20090142474 | RUTHENIUM AS AN UNDERLAYER FOR TUNGSTEN FILM DEPOSITION - Embodiments of the invention provide a method for depositing materials on substrates. In one embodiment, the method includes depositing a barrier layer containing tantalum or titanium on a substrate, depositing a ruthenium layer or a cobalt layer on the barrier layer, and depositing a tungsten bulk layer thereover. In some examples, the barrier layer may contain tantalum nitride deposited by an atomic layer deposition (ALD) process, the tungsten bulk layer may be deposited by a chemical vapor deposition (CVD) process, and the ruthenium or cobalt layer may be deposited by an ALD process. The ruthenium or cobalt layer may be exposed to a soak compound, such as hydrogen, diborane, silane, or disilane, during a soak process prior to depositing the tungsten bulk layer. In some examples, a tungsten nucleation layer may be deposited on the ruthenium or cobalt layer, such as by ALD, prior to depositing the tungsten bulk layer. | 06-04-2009 |
Mahesh Moorthy, San Diego, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100217578 | Device test data reuse for device simulation - A method and system reuse data logs generated from testing of programmable devices in order to provide an input file of parameter values and settings for use in automatically configuring a device simulator. The programmable device testing process generates a data log output with data formatted so that parameter data are associated with unique variable labels. The data log output file is processed in a parser operation that filters out private and unnecessary information, organizes the data and generates a simulation input file in a format compatible with the simulator. The process can be fully automated. | 08-26-2010 |
| 20100273450 | APPARATUS AND METHOD FOR ACTIVATING COMPUTER APPLICATIONS WITH SMS MESSAGING - A method and system for remote activation of computer based applications uses Simple Message Service (SMS) messages to inform a remote computer that an application should be activated. The SMS message may be sent by a cell phone or from a computer. The remote computer receives the SMS message, parses the message to determine the application to be started, and starts the indicated application. If the remote computer is turned off, the SMS message can be received by an SMS receiver within a modem which can be configured to start the computer so the application can be activated. | 10-28-2010 |
Praveen N. Moorthy, San Diego, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20110235991 | MOVING CONTENT BETWEEN SET TOP BOX AND END DEVICES IN HOME - A content moving device which enables providing content stored on a first user device, such as a DVR, in a first format and resolution to be provided to a second user device, such as a portable media player (PMP) in a second format and resolution. The content moving device identifies content on the first user device as candidate content which may be desired by the PMP and receives the candidate content from the DVR. The content moving device transcodes the candidate content at times independent of a request from the PMP for the content. The content moving device may provide a list of available transcoded content to the PMP for selection, and provide selected content to the PMP. The content moving device may also provide information relating to any protection schemes of the content provided to the PMP, such as DRM rights and decryption keys. The content moving device performs the often computationally intense and time consuming transcoding of user content to enable the user to move content between different user devices in a convenient manner. | 09-29-2011 |
Raja Moorthy, Fairless Hills, PA US
| Patent application number | Description | Published |
|---|---|---|
| 20090143085 | Call Completion - Disclosed herein is a method and system for completing a call attempt made by a first party on a first network to a second party on a second network. The second network may be the first network or one of multiple networks excluding the first network. The first network detects termination of the call attempt. The first network communicates availability of a messaging service to the first party. The messaging service may be a short messaging service (SMS), a voice SMS, a multimedia messaging service, and a multimodal messaging service. The first network does not bill the first party for the communication of the availability of the messaging service. On acceptance of the messaging service by the first party, the first party creates a message to be delivered to the second party on the second network. The first network delivers the message to the second party on the second network. | 06-04-2009 |
Suresh Babu Krishna Moorthy, Orlando, FL US
| Patent application number | Description | Published |
|---|---|---|
| 20080311390 | SOL-GEL COATING METHODS AND THIN FILM COATED SUBSTRATES THEREFROM - A method for depositing sol-gel derived coatings on substrates to form coated substrates includes the steps of providing a first solution including at least one sol precursor and at least one solvent. A water comprising solution is added to the first solution to form a sol-gel. The sol-gel is deposited on a substrate. The sol-gel layer on the substrate is dried/cured at a temperature ≦100° C. for at least 10 minutes to form a solid layer, wherein the solid layer has a thickness from 50 nm to 110 nm. The depositing and curing steps are repeated at least once until combined thickness of the solid layers forms a coating of a predetermined thickness. The resulting solid layers are low water content layers that can be evidenced by transmission measurements. The coated substrate can be an IR transmissive substrate having a recrystallization temperature <130° C. and each of the solid layers provide a transmission at λ=2950 nm, normal incidence and 1 mW power if placed on the IR transmissive substrate of ≧99% of the transmission directly through the IR transmissive substrate. | 12-18-2008 |
| 20110112272 | STRUCTURAL MATERIALS WITH NEARLY ZERO CARBON EMISSIONS - Processes and methods of making and preparing, compositions and structural products therefrom are provided, whereby the surface area of alumino-silicate based powders is greatly increased and rendered chemically active so that when the functionalized powders are mixed with water poly-condensation reactions occur between the surfaces binding the powders together to form a structural material with negligible emission of carbon compounds. In another embodiment, the surface functionalized powders can be mixed with an additive; a dry aggregate, such as sand and water to make a slurry that can be poured or cast into any desired shape and rapidly cured to a hardened shape suitable for use as a structural material with the mechanical strength equivalent to Portland-cement based concrete products. In additional embodiments, the alumino-silicate based powders are nano-functionalized and foam functionalized to provide light weight and structurally strong materials that can also be used in combination with or as replacement for Portland-cement. | 05-12-2011 |