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Moon Gyu Jang, Daejeon KR

Moon Gyu Jang, Daejeon KR

Patent application numberDescriptionPublished
20080299736METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - Provided is a method of manufacturing a semiconductor device including a high-k dielectric thin layer formed using an interfacial reaction. The method includes the steps of: forming an oxide layer on a silicon substrate; depositing a metal layer on the oxide layer to form a metal silicate layer using an interfacial reaction between the oxide layer and the metal layer; forming a metal gate by etching the metal silicate layer and the metal layer; and forming a lightly doped drain (LDD) region and source and drain regions in the silicon substrate after forming the metal gate. In this method, a semiconductor device having high quality and performance can be manufactured by a simpler process at lower cost.12-04-2008
20090152596SEMICONDUCTOR FET SENSOR AND METHOD OF FABRICATING THE SAME - Provided are a semiconductor Field-Effect Transistor (FET) sensor and a method of fabricating the same. The method includes providing a semiconductor substrate, forming a sensor structure having a fin-shaped structure on the semiconductor substrate, injecting ions for electrical ohmic contact into the sensor structure, and depositing a metal electrode on the sensor structure, immobilizing a sensing material to be specifically combined with a target material onto both sidewall surfaces of the fin-shaped structure, and forming a passage on the sensor structure such that the target material passes through the fin-shaped structure.06-18-2009
20090152597BIOSENSOR AND METHOD OF MANUFACTURING THE SAME - Provided are a biosensor with a silicon nanowire and a method of manufacturing the same, and more particularly, a biosensor with a silicon nanowire including a defect region formed by irradiation of an electron beam, and a method of manufacturing the same. The biosensor includes: a silicon substrate; a source region disposed on the silicon substrate; a drain region disposed on the silicon substrate; and a silicon nanowire disposed on the source region and the drain region, and having a defect region formed by irradiation of an electron beam. Therefore, by irradiating a certain region of a high-concentration doped silicon nanowire with an electron beam to lower electron mobility in the certain region, it is possible to maintain a low contact resistance between the silicon nanowire and a metal electrode and to lower operation current of a biomaterial detection part, thereby improving sensitivity of the biosensor.06-18-2009
20090152598BIOSENSOR USING SILICON NANOWIRE AND METHOD OF MANUFACTURING THE SAME - Provided are a biosensor using a silicon nanowire and a method of manufacturing the same. The silicon nanowire can be formed to have a shape, in which identical patterns are continuously repeated, to enlarge an area in which probe molecules are fixed to the silicon nanowire, thereby increasing detection sensitivity. In addition, the detection sensitivity can be easily adjusted by adjusting a gap between the identical patterns of the silicon nanowire depending on characteristics of target molecules, without adjusting a line width of the silicon nanowire in the conventional art. Further, the gap between the identical patterns of the silicon nanowire can be adjusted depending on characteristics of the target molecule to differentiate detection sensitivities, thereby simultaneously detecting various detection sensitivities.06-18-2009
20090215232SCHOTTKY BARRIER TUNNEL TRANSISTOR AND METHOD OF MANUFACTURING THE SAME - Provided are a Schottky barrier tunnel transistor and a method of manufacturing the same that are capable of minimizing leakage current caused by damage to a gate sidewall of the Schottky barrier tunnel transistor using a Schottky tunnel barrier naturally formed at a semiconductor-metal junction as a tunnel barrier. The method includes the steps of: forming a semiconductor channel layer on an insulating substrate; forming a dummy gate on the semiconductor channel layer; forming a source and a drain at both sides of the dummy gate on the insulating substrate; removing the dummy gate; forming an insulating layer on a sidewall from which the dummy gate is removed; and forming an actual gate in a space from which the dummy gate is removed. In manufacturing the Schottky barrier tunnel transistor using the dummy gate, it is possible to form a high-k dielectric gate insulating layer and a metal gate, and stable characteristics in silicidation of the metal layer having very strong reactivity can be obtained.08-27-2009
20100126548THERMOELECTRIC DEVICE, THERMOELECTIC DEVICE MODULE, AND METHOD OF FORMING THE THERMOELECTRIC DEVICE - Provided are a thermoelectric device, a thermoelectric device module, and a method of forming the thermoelectric device. The thermoelectric device includes a first conductive type first semiconductor nanowire including at least one first barrier region; a second conductive type second semiconductor nanowire including at least one second barrier region; a first electrode connected to one end of the first semiconductor nanowire; a second electrode connected to one end of the second semiconductor nanowire; and a common electrode connected to the other end of the first semiconductor nanowire and the other end of the second semiconductor nanowire. The first barrier region is greater than the first semiconductor nanowire in thermal conductivity, and the second barrier region is greater than the second semiconductor nanowire in thermal conductivity.05-27-2010
20100155703SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME - Provided are a semiconductor device and a method of fabricating the same. The semiconductor device includes: a single electron box including a first quantum dot, a charge storage gate on the first quantum dot, and a first gate electrode on the charge storage gate, the charge storage gate exchanging charges with the first quantum dot, the first gate electrode adjusting electric potential of the first quantum dot; and a single electron transistor including a second quantum dot below the first quantum dot, a source, a drain, and a second gate electrode below the second quantum dot, the second quantum dot being capacitively coupled to the first quantum dot, the source contacting one side of the second quantum dot, the drain contacting the other side facing the one side, the second gate electrode adjusting electric potential of the second quantum dot.06-24-2010
20100270530SEMICONDUCTOR NANOWIRE SENSOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A method for manufacturing a biosensor device is provided. The method involves forming a silicon nanowire channel with a line width of several nanometers to several tens of nanometers using a typical photolithography process, and using the channel to manufacture a semiconductor nanowire sensor device. The method includes etching a first conductivity-type single crystalline silicon layer which is a top layer of a Silicon-On-Insulator (SOI) substrate to form a first conductivity-type single crystalline silicon line pattern, doping both sidewalls of the first conductivity-type single crystalline silicon line pattern with impurities of a second conductivity-type opposite to the first conductivity-type to form a second conductivity-type channel, forming second conductivity-type pads for forming electrodes at both ends of the first conductivity-type single crystalline silicon line pattern, forming, in an undoped region of the first conductivity-type single crystalline silicon line pattern, a first electrode for applying a reverse-bias voltage to insulate the first conductivity-type single crystalline silicon line pattern and the second conductivity-type channel from each other, and forming second electrodes for applying a bias voltage across the second conductivity-type channel on the second conductivity-type pad.10-28-2010
20100283031BIOSENSOR USING NANODOT AND METHOD OF MANUFACTURING THE SAME - A biosensor using a nanodot and a method of manufacturing the same are provided. A silicon nanowire can be formed by a CMOS process to reduce manufacturing costs. In addition, an electrically charged nanodot is coupled to a target molecule to be detected, in order to readily change conductivity of the silicon nanowire, thereby making it possible to implement a biosensor capable of providing good sensitivity and being manufactured at a low cost.11-11-2010
20100294327THERMOELECTRIC DEVICE USING RADIANT HEAT AS HEAT SOURCE AND METHOD OF FABRICATING THE SAME - Provided are a thermoelectric device using radiant heat as a heat source and a method of fabricating the same. In the thermoelectric device, an anti-reflection layer formed on a heat absorption layer causes as much radiant light as possible to be absorbed by the heat absorption layer without being reflected to the outside so that the radiant heat absorption efficiency can be improved. Also, in the thermoelectric device, an insulating layer formed on a heat dissipation layer and a first reflection layer formed on the insulating layer can prevent external radiant heat from being absorbed by the heat dissipation layer, and as much radiant heat transferred to the heat dissipation layer as possible can be dissipated away from the heat dissipation layer by a second reflection layer thermally connected with the heat dissipation layer so that the radiant heat emission efficiency can be improved.11-25-2010
20110000517THERMOELECTRIC DEVICE AND METHOD FOR FABRICATING THE SAME - A thermoelectric device is provided. The thermoelectric device includes first and second electrodes, a first leg, a second leg, and a common electrode. The first leg is disposed on the first electrode and includes one or more first semiconductor pattern and one or more first barrier patterns. The second leg is disposed on the second electrode and includes one or more second semiconductor pattern and one or more second barrier patterns. The common electrode is disposed on the first leg and the second leg. Herein, the first barrier pattern has a lower thermal conductivity than the first semiconductor pattern, and the second barrier pattern has a lower thermal conductivity than the second semiconductor pattern. The first/second barrier pattern has a higher electric conductivity than the first/second semiconductor pattern. The first/second barrier pattern forms an ohmic contact with the first/second semiconductor pattern.01-06-2011
20110062912ENERGY AND POWER MANAGEMENT INTEGRATED CIRCUIT DEVICE - Provided is an energy and power management integrated circuit (IC) device. The energy and power management IC device includes a plurality of energy conversion devices for harvesting energy from respective energy conversion sources and converting the energy into electric energy, an energy management IC (EMIC) for converting the electric energy converted by the energy conversion devices into stable energy, a storage device for storing the energy or power converted by the EMIC, a power management IC (PMIC) for receiving and distributing the power stored in the storage device, and a plurality of output load devices for consuming the power distributed by the PMIC. Accordingly, it is possible to harvest energy in an environmentally friendly way and semi-permanently use the energy without changing a battery.03-17-2011
20110129668ORGANIC-INORGANIC HYBRID NANOFIBER FOR THERMOELECTRIC APPLICATION AND METHOD OF FORMING THE SAME - Provided is an organic-inorganic hybrid nanofiber including an inorganic semiconductor material in a nanoparticle or nanocrystal state, and a conductive polymer including the inorganic semiconductor material and having a lower thermal conductivity than the inorganic semiconductor material. The inorganic semiconductor material and the conductive polymer are arranged in a composite material type to have a thermoelectric property. Thus, the organic-inorganic hybrid nanofiber can be applied to a low-priced thermoelectric device having relatively high thermoelectric conversion efficiency.06-02-2011
20110140680APPARATUS AND METHOD FOR EXTRACTING MAXIMUM POWER FROM SOLAR CELL - An apparatus and method for extracting maximum power from a solar cell are provided. The apparatus includes a solar cell for producing power from solar energy, a maximum power extractor for generating a pulse width modulation signal for extracting the maximum power from the solar cell, and a DC-DC converter for adjusting an amount of current generated from the solar cell according to the pulse width modulation signal.06-16-2011
20110150036FLEXIBLE THERMOELECTRIC GENERATOR, WIRELESS SENSOR NODE INCLUDING THE SAME AND METHOD OF MANUFACTURING THE SAME - Provided are a flexible thermoelectric generator, a wireless sensor node including the same and a method of manufacturing the same. The flexible thermoelectric generator includes a plurality of P-type semiconductors and a plurality of N-type semiconductors, which are alternately arranged, an upper metal for connecting upper surfaces of the adjacent P-type semiconductor and N-type semiconductor, a lower metal for connecting lower surfaces of the adjacent P-type semiconductor and N-type semiconductor, and alternately disposed with respect to the upper metal, a P-type metal connected to at least one P-type semiconductor among the plurality of P-type semiconductors, and an N-type metal connected to at least one N-type semiconductor among the plurality of N-type semiconductors.06-23-2011
20110165557APPARATUS AND METHOD FOR DETECTING BIOMOLECULES - Provided are an apparatus and method for detecting biomolecules. The apparatus includes a FET having a substrate, a source electrode, a drain electrode, a channel region between the source and drain electrodes, and probe molecules fixed to the channel region, wherein the source and drain electrodes are separated on the substrate, a microfluid supplier selectively supplying one of a reference buffer solution of low ionic concentration and a reaction solution of high ionic concentration containing target molecules, to the channel region of the FET to which the probe molecules are fixed, and a biomolecule detector detecting the target molecules by measuring a first current value of the channel region of the FET, and a second current value of the channel region of the FET to which the target molecules and the probe molecules that bind to each other in the reaction solution of high ionic concentration are fixed.07-07-2011

Patent applications by Moon Gyu Jang, Daejeon KR