Inventors list |
Assignees list |
Classification tree browser |
Top 100 Inventors |
Top 100 Assignees |
Miwako
Miwako Ando, Utsunomiya-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20080259349 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus, which equipped with a projection optical system that is configured to project a pattern of an original onto a substrate, includes an interferometer configured to measure a wavefront in a first direction and a wavefront in a second direction of light passed through the projection optical system; a focus detecting unit configured to detect focus positions in the first and second directions of the projection optical system; and a calculating unit configured to calculate wavefront aberration of the projection optical system on the basis of the measurement result of the interferometer and the detection result of the focus detecting unit. | 10-23-2008 |
| 20090002665 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus includes a measurement system which performs exposure control measurement using a first mark arranged on an original stage and a second mark arranged on a substrate stage, and a control unit which can set, when the measurement system performs the measurement in order to expose a substrate to light under a certain illumination condition, an illumination condition different from the certain illumination condition. | 01-01-2009 |
Miwako Ishibashi, Nagoya-Shi JP
| Patent application number | Description | Published |
|---|---|---|
| 20100021703 | DEVELOPING METHOD FOR IMMERSION LITHOGRAPHY, SOLVENT USED FOR THE DEVELOPING METHOD AND ELECTRONIC DEVICE USING THE DEVELOPING METHOD - A developing method for immersion lithography is provided, realizing a process that is simple and low-cost and enables high repellency sufficient to allow high-speed scanning. The developing method for immersion lithography improved by inexpensive material without introducing any new facility, a solution to be used in the developing method, and an electronic device formed by using the developing method are provided. The developing method for immersion lithography is a method of developing for immersion lithography of an electronic device with a resist containing a surface segregation agent and chemically-amplified resist, including the step of development with alkali immersion, characterized by the dissolving and removing step, conducted using a dissolving and removing solution that selectively dissolves and removes the surface segregation agent of the resist. | 01-28-2010 |
Miwako Kondo, Taunton, MA US
| Patent application number | Description | Published |
|---|---|---|
| 20100159613 | Method for assaying the antioxidant capacity of a skin care product - A method for assaying the antioxidant capacity of a skin care product, the method including preparing an emulsion base, dissolving a sample of a skin care product into the emulsion base to form a homogeneous emulsion mixture, adding a detection probe to the homogeneous emulsion mixture, adding reactive oxygen species generator and/or reactive nitrogen species generator to the homogeneous emulsion mixture, measuring the fluorescence intensity change of the detection probe in the presence of the sample over time, in the presence of the standard over time, and in the presence of a blank over time, and calculating the initial rate of oxidation of the detection probe to determine the antioxidant capacity of the sample of the skin care product. | 06-24-2010 |
Miwako Nishimura, Chiba JP
| Patent application number | Description | Published |
|---|---|---|
| 20090030200 | PROCESS OF PREPARING OPTICALLY ACTIVE ALLYL COMPOUND - Disclosed is a process of preparing an optically active allyl compound comprising asymmetrically coupling an allyl compound with an organic nucleophilic compound in the presence of a catalyst. The catalyst is preferably a transition metal complex compound having a phosphine ligand. The phosphine ligand is preferably a 2,3-bis(dialkylphosphino)pyrazine derivative. The pyrazine derivative is preferably a quinoxaline derivative. The transition metal is preferably palladium. | 01-29-2009 |
| 20090030231 | PROCESS OF PREPARING OPTICALLY ACTIVE B-HYDROXYCARBOXYLIC ACID DERIVATIVE - Disclosed is a process of preparing an optically active β-hydroxycarboxylic acid derivative comprising asymmetrically hydrogenating a β-keto compound in the presence of a catalyst comprising a transition metal complex compound having a 2,3-bis(dialkylphosphino)pyrazine derivative as a ligand. The pyrazine derivative is preferably a quinoxaline derivative, and the transition metal is preferably ruthenium. Preferred examples of the quinoxaline derivative are (S,S)-2,3-bis(tert-butylmethylphosphino)quinoxaline, (R,R)-bis(tert-butylmethylphosphino)quinoxaline, (S,S)-bis(tert-adamantylmethylphosphino)quinoxaline, and (R,R)-bis(adamantylmethylphosphino)quinoxaline. | 01-29-2009 |
Miwako Yoritate, Tokyo JP
| Patent application number | Description | Published |
|---|---|---|
| 20100182481 | IMAGING APPARATUS, USER INTERFACE, AND ASSOCIATED METHODOLOGY FOR A CO-EXISTENT SHOOTING AND REPRODUCTION MODE - A currently captured image R of an object is displayed nearly at a center portion of a display frame SC on a display screen ST | 07-22-2010 |