Patent application number | Description | Published |
20090176165 | Polymer composition, hardmask composition having antireflective properties, and associated methods - A polymer composition includes an aromatic ring-containing polymer represented by Formula 1: | 07-09-2009 |
20110027722 | AROMATIC RING-CONTAINING POLYMER FOR RESIST UNDERLAYER, RESIST UNDERLAYER COMPOSITION INCLUDING THE SAME, AND METHOD OF PATTERNING DEVICE USING THE SAME - An aromatic ring-containing polymer for a resist underlayer, the polymer including a unit represented by the following Chemical Formula 1: | 02-03-2011 |
20110117501 | RESIST UNDERLAYER POLYMER, RESIST UNDERLAYER COMPOSITION INCLUDING THE SAME, AND METHOD OF PATTERNING USING THE SAME - A resist underlayer polymer, a resist underlayer composition including the same, and a method of patterning using the same, the resist underlayer polymer including a repeating unit represented by at least one of Chemical Formula 1 and Chemical Formula 2: | 05-19-2011 |
20110155944 | AROMATIC RING-CONTAINING COMPOUND FOR A RESIST UNDERLAYER AND RESIST UNDERLAYER COMPOSITION - An aromatic ring-containing compound for a resist underlayer and a resist underlayer composition, the aromatic ring-containing compound being represented by the following Chemical Formula 1: | 06-30-2011 |
20110229828 | AROMATIC RING CONTAINING POLYMER, UNDERLAYER COMPOSITION INCLUDING THE SAME, AND ASSOCIATED METHODS - An aromatic ring-containing polymer, an underlayer composition including the same, and associated methods, the aromatic ring-containing polymer including a group represented by one of the following Chemical Formulae 1-1, 1-2, 2-1, and 2-2: | 09-22-2011 |
20120007200 | Image Sensor and Method for Manufacturing the Same - Disclosed is an image sensor including a photo-sensing device, a color filter positioned on the photo-sensing device, a microlens positioned on the color filter, and an insulation layer positioned between the photo-sensing device and the color filter, and including a trench exposing the photo-sensing device and a filler filled in the trench. The filler has light transmittance of about 85% or more at a visible ray region, and a higher refractive index than the insulation layer. A method of manufacturing the image sensor is also provided. | 01-12-2012 |
20120153424 | HARDMASK COMPOSITION, METHOD OF FORMING A PATTERN USING THE SAME, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERN - A hard mask composition, a method of forming a pattern, and a semiconductor integrated circuit device, the hard mask composition including a solvent; and a compound, the compound including a structural unit represented by the following Chemical Formula 1: | 06-21-2012 |
20120153511 | HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS - A hard mask composition includes a solvent and an aromatic ring-containing compound represented by the following Chemical Formula 1: | 06-21-2012 |
20120168894 | HARD MASK COMPOSITION, METHOD OF FORMING A PATTERN, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERN - A hard mask composition, a method of forming a pattern, and a semiconductor integrated circuit device, the hard mask composition including a solvent; and an aromatic ring-containing compound, the aromatic ring-containing compound including at least one of a moiety represented by the following Chemical Formula 1 and a moiety represented by the following Chemical Formula 2: | 07-05-2012 |
20120270994 | AROMATIC RING-CONTAINING POLYMER FOR UNDERLAYER OF RESIST AND RESIST UNDERLAYER COMPOSITION INCLUDING THE SAME - An aromatic ring-containing polymer for an underlayer of a resist, including a unit structure represented by Chemical Formula 1: | 10-25-2012 |