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Middlebrooks
John C. Middlebrooks, Ann Arbor, MI US
| Patent application number | Description | Published |
|---|---|---|
| 20090143840 | AUDITORY PROSTHESIS UTILIZING INTRA-NEURAL STIMULATION OF THE AUDITORY NERVE - The present invention relates to auditory prostheses. In particular, the present invention provides an auditory prosthesis capable of direct, intra-neural stimulation of the auditory nerve. | 06-04-2009 |
Scott A. Middlebrooks, Portland, OR US
| Patent application number | Description | Published |
|---|---|---|
| 20080281438 | Critical dimension estimation - Estimating a state of a critical dimension system comprises inputting a critical dimension measurement and inferring the state of the system based on a model of the critical dimension system and the critical dimension measurement. | 11-13-2008 |
Scott Anderson Middlebrooks, Duizel NL
| Patent application number | Description | Published |
|---|---|---|
| 20110010000 | Method for Selecting Sample Positions on a Substrate, Method for Providing a Representation of a Model of Properties of a Substrate, Method of Providing a Representation of the Variation of Properties of a Substrate Across the Substrate and Device Manufacturing Method - A method for selecting sample positions on a substrate from a set of all available sample positions is provided, in which a representation of a model, which may represent the variation of one or more properties across the substrate, is analyzed in order to identify the sample positions having the greatest effect on the model. | 01-13-2011 |
| 20110134419 | Inspection Method and Apparatus, and Corresponding Lithographic Apparatus - A method and associated apparatus determine an overlay error on a substrate. A beam is projected onto three or more targets. Each target includes first and second overlapping patterns with predetermined overlay offsets on the substrate. The asymmetry of the radiation reflected from each target on the substrate is measured. The overlay error not resultant from the predetermined overlay offsets is determined. The function that enables calculation of overlay from asymmetry for other points on the wafer is determined by limiting the effect of linearity error when determining the overlay error from the function. | 06-09-2011 |
Scott Anderson Middlebrooks, Galveston, TX US
| Patent application number | Description | Published |
|---|---|---|
| 20100161099 | Optimization Method and a Lithographic Cell - Variables in each step in a double patterning lithographic process are recorded and characteristics of intermediate features in a double patterning process measured. The final feature is then modeled, and the values of the variables optimized. | 06-24-2010 |
Scott Anderson Middlebrooks, Sandy, OR US
| Patent application number | Description | Published |
|---|---|---|
| 20110141444 | Inspection Apparatus for Lithography - A scatterometer configured to measure a property of a substrate, includes a radiation source configured to provide a radiation beam; and a detector configured to detect a spectrum of the radiation beam reflected from a target ( | 06-16-2011 |
Thomas B. Middlebrooks, Atlantic Beach, FL US
| Patent application number | Description | Published |
|---|---|---|
| 20090013881 | Bale banding machine with overhead press - A bale banding machine having an overhead press head that translates in the vertical direction relative to the band guide track and the bale being banded. The band is directed through a stationary band feeding guide assembly into a band receiving guide assembly mounted on the translating press head assembly. The stationary band feeding guide assembly defines an enclosed channel, at the end of which is provided a feed guide pivoting member that is biased in a closed position until the press heads lowers, upon which event a follower cam in the feed guide pivoting member reacts to a cam wedge on the descending press head, causing the feed guide pivoting member to pivot away from the band extending between the stationary band feeding guide assembly and the translating band receiving guide assembly. Simultaneously, the head guide pivoting member is caused to pivot upward from the band. In this manner the band is no longer retained within the small guide path previously defined by the feeding guide assembly and the receiving guide assembly, such that the translating head can be lowered several inches without shearing the band. | 01-15-2009 |