Patent application number | Description | Published |
20110085126 | METHOD OF AND APPARATUS FOR PRODUCING LIQUID CRYSTAL DISPLAY DEVICE - One aspect of the invention provides a liquid crystal display device producing method for irradiating a liquid crystal display substrate, in which plural pixels are formed in a matrix state and liquid crystal is sealed between a TFT substrate and a counter electrode substrate, with light having a predetermined wavelength to orient liquid crystal molecules toward a predetermined direction in a state in which an electric field is applied to each pixel of the liquid crystal display substrate. The method includes the steps of: dipping the liquid crystal display substrate and a lamp in a transparent liquid having resistivity of a predetermined value or more and sufficiently high transmittance to the light in a state in which the liquid crystal display substrate and the lamp face each other; and lighting the lamp to irradiate the liquid crystal display substrate with the light having a predetermined light quantity in a state in which the electric field is applied to each pixel. | 04-14-2011 |
20110194095 | EXPOSURE APPARATUS AND PHOTOMASK - The present invention provides an exposure apparatus for intermittently irradiating light from a light source to a TFT substrate through a photomask while conveying the TFT substrate in one direction, and forming an exposure pattern on the TFT substrate corresponding to a plurality of mask patterns formed on the photomask. On one surface of the photomask, electrode wiring patterns and signal wiring patterns requiring different resolutions are formed and an electrode wiring pattern group including a plurality of electrode wiring patterns and a signal wiring pattern group including a plurality of signal wiring patterns are formed in front and back in the conveying direction of the TFT substrate, and on the other surface of the photomask, micro-lenses which reduce and project the electrode wiring patterns requiring a high resolution onto the TFT substrate are formed. The photomask is disposed so that the micro-lenses face the TFT substrate. | 08-11-2011 |
20110244379 | METHOD FOR FORMING CONVEX PATTERN, EXPOSURE APPARATUS AND PHOTOMASK - The present invention is a photomask | 10-06-2011 |
20110292368 | EXPOSURE APPARATUS - An exposure apparatus is provided with: a conveying device that conveys the subject to be exposed in a given direction; a spatial light modulating device having a plurality of light modulating elements, which are composed of an electro-optical crystalline material and arranged at least in one row in a direction intersecting a conveying direction of the subject to be exposed; an optical beam shaping device that limits the width of light emitted from each light modulating element in the conveying direction to a predetermined width; and a control device that on/off-controls light transmitted through the spatial light modulating device so as to generate a predetermined pattern. The light modulating element is formed tilted by a predetermined angle with respect to an axis parallel to the conveying direction. The control device shifts the optical beam shaping device in the conveying direction. | 12-01-2011 |
20120077351 | LASER ANNEALING METHOD AND LASER ANNEALING APPARATUS - In the present invention, At least one row of lens arrays, in which a plurality of lenses are arranged in a direction intersecting with the conveying direction of a substrate to correspond to the plurality of TFT forming areas set in a matrix on the substrate, is shifted in the direction intersecting with the conveying direction of the substrate, to thereby align the lenses in the lens array with the TFT forming areas on the substrate based on the alignment reference position. The laser beams are irradiated onto the lens array when the substrate moves and the TFT forming areas reach the underneath of the corresponding lenses of the lens array, and the laser beams are focused by the plurality of lenses to anneal the amorphous silicon film in each TFT forming area. | 03-29-2012 |
20120218537 | EXPOSURE APPARATUS AND PHOTOMASK USED THEREIN - In an exposure apparatus, a photomask | 08-30-2012 |
20120236283 | EXPOSURE APPARATUS - Exposure apparatus includes photomasks on which a mask pattern having the same shape as that of an exposure pattern exposed onto a surface of a TFT substrate held on a stage is formed, lens assemblies in which unit lens groups in each of which a plurality of convex lenses are arranged in a normal direction to the photomasks so that same-size erect images of mask patterns formed on the photomasks can be formed on the surface of the TFT substrate are arranged in a plane parallel with the photomasks and the surface of the TFT substrate held on the stage, and moving device that moves the lens assemblies in a plane parallel with the masks and the surface of TFT substrate held on the stage. | 09-20-2012 |
20130100431 | Method and apparatus for alignment processing - A method for alignment processing including making a substrate | 04-25-2013 |
20130128253 | EXPOSURE APPARATUS USING MICROLENS ARRAY AND OPTICAL MEMBER - An exposure apparatus and an optical member wherein impurities can be prevented from infiltrating between microlens arrays and a substrate, and microlenses can be prevented from being scratched by the impurities and by getting abnormally close to the substrate. Microlens arrays in which pluralities of microlenses are formed are arranged above a transparent substrate, and the microlens arrays are bonded and the end surfaces to a mask. Alignment mark supports are bonded to the mask at both sides of the microlens arrays, and alignment marks are formed in the surfaces of the alignment mark supports that face the substrate. The spaces between the alignment mark supports and the substrate are smaller than the spaces between the microlens arrays and the substrate. | 05-23-2013 |
20130135602 | SCANNING EXPOSURE APPARATUS USING MICROLENS ARRAYS - A scanning exposure apparatus using microlens arrays, includes a plurality of microlens arrays is arrayed in a direction perpendicular to a scanning direction above a substrate to be exposed, and the microlens arrays are supported on a support substrate. The microlens arrays can be supported on a support substrate so as to be capable of being inclined from a direction parallel to the exposure substrate, relative to the direction in which the microlens arrays are arranged. The inclination angles of these microlens arrays are configured so as to gradually increase or decrease along the arrangement direction. | 05-30-2013 |
20130141704 | MICROLENS EXPOSURE SYSTEM - A microlens exposure system includes a microlenses array and a mask fixed in place a predetermined space apart, wherein the gap between the microlens array and an exposure substrate can easily be adjusted with high precision to an aligned focal point position of the microlenses. Laser light for exposure is irradiated onto a resist film by microlenses of a microlens array. Light from a microscope passes through a hole in a Cr film of a mask, and the light is transmitted through a microlens and radiated onto the resist film. Whether or not the light transmitted through the microlens has an aligned focal point on the resist film is observed through the microscope, whereby the aligned focal point of exposure light made to converge by the microlenses on the resist film can be distinguished. | 06-06-2013 |
20130169917 | EXPOSURE DEVICE - In an exposure device, picture elements or pixels of a liquid crystal display device are split into two parts in the width direction, and exposed from different directions, whereby an alignment material film is photoaligned. The exposure device causes two beams of exposure light outputted by two light sources (a first light source and a second light source) to be transmitted through respectively different light transmission regions in a predetermined pattern of a mask, to irradiate regions of an alignment material film formed on a member for exposure, which regions correspond to split regions of pixels or picture elements. The exposure device causes the two beams of exposure light to mutually intersect on the optical path between the first and second light sources and the alignment material film. | 07-04-2013 |
20130188161 | SCANNING EXPOSURE APPARATUS USING MICROLENS ARRAY - A scanning exposure apparatus uses a plurality of microlens arrays to project a mask exposure pattern onto a substrate. A CCD line camera detects an image on the substrate at this time, and using a first-layer pattern on the substrate as a reference pattern, detects whether or not the mask exposure pattern matches the reference pattern. In a case in which the patterns do not match, the microlens array is tilted from a direction that is parallel to the substrate, and the mask exposure pattern is made to match the reference pattern by using the microlens array to adjust the exposure area on the substrate. When the exposure pattern deviates from the reference pattern, it is thereby possible to detect the deviation during exposure and to prevent an exposure pattern misregistration, thereby enhancing the precision of the exposure pattern in an overlay exposure. | 07-25-2013 |
20130208255 | SCANNING EXPOSURE APPARATUS USING MICROLENS ARRAY - A microlens array is a stacked body of four unit microlens arrays, and the optical axis of a portion of the unit microlens arrays can be shifted from the optical axis of the other unit microlens arrays. In a scanning exposure apparatus, a CCD line camera detects an image on a substrate, and using a first-layer pattern on the substrate as a reference pattern, in a case in which a mask exposure pattern does not match the reference pattern, shifts the optical axis of the microlenses to adjust the magnification of a projection pattern using the microlens array. This makes it possible to adjust the exposure position using the microlens array so that even when the exposure pattern deviates from the reference pattern, the deviation can be detected during exposure and an exposure pattern misregistration can be prevented, enabling the precision of the exposure pattern to be enhanced in an overlay exposure. | 08-15-2013 |
20130271742 | APPARATUS AND METHOD FOR ALIGNMENT PROCESSING - The present invention employs a plurality of photomasks each having first and second apertures of which widths are set so that adjacent end regions of the adjacent first and second alignment regions overlap with each other with an overlapping dimension approximately equal to a tracking accuracy of an alignment device. The photomasks are arranged alternately in a direction intersecting the scanning direction of the substrate so that the first and the second apertures are arranged at a constant pitch. In this state, two polarized lights, that are different in at least one of polarization direction and incident angle to a substrate, are made to be incident into the first and the second apertures, respectively, to irradiate an alignment film on the substrate with the two lights that have passed through the first and the second apertures, respectively, to form the first and the second alignment regions adjacently to each other. | 10-17-2013 |
20130273749 | LASER ANNEALING APPARATUS AND LASER ANNEALING METHOD - A laser annealing apparatus carries out an annealing treatment an amorphous silicon film on a TFT substrate. The apparatus includes: a mask having a plurality of apertures; a microlens substrate having a plurality of microlenses arranged on a surface thereof and configured to focus the plurality of laser beams Lb, that have passed through the respective apertures of the mask, onto the TFT substrate to apply a predetermined energy to the amorphous silicon film; a pair of guides each having a semi-cylindrical shape and disposed along both sides across the microlens substrate so that the axes of the guides are parallel to each other and that the tips of the guides protrude from the positions of tips of the microlenses toward the TFT substrate; and a film that is provided in a tensioned state between the pair of guides so as to be movable and that transmits a laser beam. | 10-17-2013 |
20130284708 | LASER PROCESSING APPARATUS - The present invention relates to a laser processing apparatus for irradiating a printed wiring board | 10-31-2013 |
20130342820 | LIGHT-EXPOSURE DEVICE - A light-exposure device is provided with a microlens array on which is arranged with a prescribed regularity a plurality of microlenses on which exposure light transmitted through a light source and a mask is introduced to resolve an upright equal-magnification image on a substrate. Upon reaching a prescribed position, the substrate is irradiated with pulsed laser light from the light source, and the substrate is successively exposed, and after the entire area of the exposure region of the substrate is exposed, a relative positional relationship between the microlens array and the mask is successively switched in a vertical direction by an amount of a horizontal pitch of the microlenses, and a subsequent exposure is performed. Exposure with high precision and high resolution can thereby be performed with a short exposure cycle time. | 12-26-2013 |
20140063808 | LASER LIGHTING DEVICE - In a laser lighting device, a fly's eye lens and a condenser lens are disposed in an optical path of pulsed laser light emitted from a light source, and an electro-optical crystal element for continuously changing the deflection direction of the pulsed laser light with respect to the incident light and allowing the deflected light to pass therethrough is disposed in a position between the light source and the fly's eye lens or between the fly's eye lens and the condenser lens. The electro-optical crystal element is formed, for example, of a pair of electrodes and an optical crystal material disposed between the electrodes, and a voltage is applied between the electrodes to produce an electric field that changes the refractive index of the electro-optical crystal element. As a result, non-uniform illumination due to interference fringes produced by light having passed through the fly's eye lens can be reduced. | 03-06-2014 |
20140126591 | PULSED LASER OSCILLATOR AND METHOD FOR CONTROLLING PULSED LASER OSCILLATION - A pulsed laser oscillator includes at least one first electrooptical element that polarizes light according to an applied voltage and a voltage control unit that applies a voltage to the first electrooptical element and controls the voltage. The voltage control unit changes over time a voltage value applied to the first electrooptical element, to control a pulse width of laser light. | 05-08-2014 |
20140152968 | MICROLENS ARRAY AND SCANNING EXPOSURE DEVICE USING SAME - In this microlens array, unitary microlens arrays are respectively stacked onto an upper surface and lower surface of a glass plate, and each of the unitary microlens arrays is supported by an upper plate and a lower plate. Marks for alignment are formed on each of the unitary microlens arrays and on the glass plate, and the unitary microlens arrays and the glass plate are stacked onto each other aligned by these marks. This makes it possible to prevent ununiform exposure in scanning exposure using a plurality of microlens arrays. | 06-05-2014 |
20140168622 | MICROLENS ARRAY AND SCANNING EXPOSURE DEVICE USING SAME - This microlens array comprises hexagonal field diaphragms in inverted-image-forming positions, i.e., microlenses, a plurality of which are arranged in the direction perpendicular to a direction of scanning, and from which rows of microlenses are configured. Further, for three rows of microlenses, microlens rows are arranged with offset by (a length S) in a direction perpendicular to the direction of scanning such that triangular portions of the hexagonal field diaphragms overlap in the direction of scanning. Furthermore, microlens row groups, which are configured from three microlens rows, are arranged with offset in the direction perpendicular to the direction of scanning in increments of a minute amount of shifting F (for example, 2 μm). Thereby, this scanning exposure device using a microlens array is capable of preventing exposure ununiformity even in the direction perpendicular to the direction of scanning. | 06-19-2014 |
20140199808 | DEPOSITION MASK, PRODUCING METHOD THEREFOR AND FORMING METHOD FOR THIN FILM PATTERN - A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate. | 07-17-2014 |
20150017321 | METHOD FOR FORMING THIN FILM PATTERN - To provide a method for forming a thin film pattern | 01-15-2015 |
20150063410 | NONDESTRUCTIVE INSPECTION APPARATUS AND INSPECTION SYSTEM OF STRUCTURE - A nondestructive inspection apparatus of a structure includes: an inspection apparatus body | 03-05-2015 |