Patent application number | Description | Published |
20080218264 | CLASS D AMPLIFIER ARRANGEMENT - An amplifier arrangement for operation at supply voltages of at least 100V and at output powers of at least 1 kW includes a half-bridge formed from two switching elements connected in series, two supply voltage terminals, and an output connection between the switching elements. A bypass capacitor is in parallel with the switching elements, and a current path is through the switching elements and the bypass capacitor, where the current path has a length of 10 cm or less, the half-bridge and the bypass capacitor are arranged on an area of 30 cm2, and a resonant circuit formed by capacitances and inductances in the current path has a resonance frequency of 100 MHz or greater. | 09-11-2008 |
20090026181 | RADIO FREQUENCY POWER SUPPLY - A plasma supply device includes a full bridge circuit that is connected to a DC power supply and that has two half bridges each with two series connected switching elements. The plasma supply device further includes a primary winding of a power transformer connected to centers of the half bridges between the switching elements. The primary winding includes a tapping connectable to an alternating current center between the potentials of the DC power supply. | 01-29-2009 |
20090026968 | PLASMA SUPPLY DEVICE - A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network. The output network is arranged on a printed circuit board. The output network can therefore be designed low priced and accurately. | 01-29-2009 |
20090027936 | RF POWER SUPPLY - An RF power supply, in particular a plasma supply device, for generating an output power greater than 500 W at an output frequency of at least 3 MHz includes at least one inverter connectable to a DC power supply, which inverter comprises at least one switching element and an output network. An accompanying line connects an electrical component to the inverter by a lead-in of the output network. | 01-29-2009 |
20090027937 | High frequency power supply - A high frequency power supply, in particular a plasma supply device, for generating an output power greater than 1 kW at a basic frequency of at least 3 MHz with at least one switch bridge, which has two series connected switching elements, wherein one of the switching elements is connected to a reference potential varying in operation, and is activated by a driver, and wherein the driver has a differential input with two signal inputs and is connected to the reference potential varying in operation. | 01-29-2009 |
20100171427 | Protecting High-Frequency Amplifers - In one aspect, protecting high frequency (HF) amplifiers of a plasma supply device configured to deliver >500 W at a substantially constant fundamental frequency >3 MHz is accomplished by: driving two HF amplifiers with two drive signals having a common frequency and a predetermined phase shift with respect to one another; generating two HF source signals using the HF amplifiers, the HF source signals coupled in a coupler to form a HF output signal; transmitting the HF output signal to the plasma load; measuring electrical variables related to the load impedances seen by the two HF amplifiers; determining whether the load impedance seen by one of the HF amplifiers lies outside a predetermined range; and adjusting the phase shift of the two drive signals, wherein neither of the load impedances seen by the HF amplifiers lies outside the predetermined range. | 07-08-2010 |
20100171428 | DRIVING SWITCHES OF A PLASMA LOAD POWER SUUPLY - Operation of a plasma supply device having at least one switching bridge with at least two switching elements, and configured to deliver a high frequency output signal having a power of >500 W and a substantially constant fundamental frequency>3 MHz to a plasma load is accomplished by determining at least one operating parameter, at least one environmental parameter of at least one switching element and/or a switching bridge parameter, determining individual drive signals for the switching elements taking into account the at least one operating parameter, the at least one environmental parameter and/or the switching bridge parameter, and individually driving the switching elements with a respective drive signal. | 07-08-2010 |
20100194280 | Plasma Supply Device - A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network, wherein the at least one output network includes at least one inductance that has at least one magnetic field strengthening element that is a Perminvar ferrite. | 08-05-2010 |
20120306564 | MANAGING A TEMPERATURE OF A SEMICONDUCTOR SWITCHING ELEMENT - In a method for operating a plasma installation, an induction heating installation or a laser excitation installation in a pulsed power output operation, includes controlling at least one semiconductor switching element to produce a power loss in the at least one semiconductor switching element during a pulse pause time period in a pulse pause operation during which no power suitable for the ignition or the operation of the plasma process, the induction heating process, or the laser excitation process is produced at a power output of a power generator by the at least one semiconductor switching element of the power generator, and such that a reduction of a temperature of the at least one semiconductor switching element by more than a predetermined value is prevented. | 12-06-2012 |
20130214680 | Plasma Supply Device - A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network, wherein the at least one output network includes at least one inductance that has at least one magnetic field strengthening element that is a Perminvar ferrite. | 08-22-2013 |
20140159741 | Method for Producing an Arc Detection Signal and Arc Detection Arrangement - A method for producing an arc detection signal on the basis of a plurality of observation signals comprises producing an arc detection part-signal for each of at least two observation signals. Producing each of the part-signals includes correlating the respective observation signal with a correlation signal by influencing the correlation signal with the respective observation, thereby producing a correlation result; producing or modifying a coefficient on the basis of the correlation result; and weighting the respective observation signal with the coefficient. The arc detection part-signals are added to form the arc detection signal. | 06-12-2014 |