Patent application number | Description | Published |
20090021715 | MICROLITHOGRAPHIC ILLUMINATION SYSTEM - A microlithographic illumination system can include a light distribution device that can generate a two-dimensional intensity distribution in a first illumination plane. A first raster array of optical raster elements can generates a raster array of secondary light sources. A device with an additional optical effect can be disposed spatially adjacent to the two raster arrays. The device can be configured as an illumination angle variation device. The device can influence the intensity and/or the phase and/or the beam direction of the illumination light. The influence can be such that an intensity contribution of raster elements to the total illumination intensity can vary across the illumination field. This can enable the illumination intensity to be influenced across the illumination field in a defined manner with respect to the total illumination intensity and/or with respect to the intensity contributions from different directions of illumination. | 01-22-2009 |
20090021839 | OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems. | 01-22-2009 |
20090201481 | OPTICAL ELEMENT AND ILLUMINATION OPTICS FOR MICROLITHOGRAPHY - The disclosure relates to an optical element and illumination optics for microlithography. The optical element can be configured to influence a nominal beam angle, preset over a beam cross-section, of a radiation beam hitting the optical element. Moreover, the disclosure relates to an illumination optics for the microlithography with at least one such optical element and an illumination system for the microlithography with such an illumination optics. | 08-13-2009 |
20110083542 | OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems. | 04-14-2011 |
20120019796 | ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY - An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects. The raster elements of the two raster arrangements are arranged relative to one another in such a way that to each raster element type (I to III) is allocated at least one individual distance (Δ | 01-26-2012 |
20120249988 | OPTICAL BEAM DEFLECTING ELEMENT, ILLUMINATION SYSTEM INCLUDING SAME, AND RELATED METHOD - An optical beam deflecting element may be used effectively as an energy distribution manipulator in an illumination system to vary the energy distribution within a given spatial intensity distribution in a pupil plane of the illumination system substantially without changing the shape and size and position of illuminated areas in the pupil plane. | 10-04-2012 |
20130120863 | SUBSTRATES FOR MIRRORS FOR EUV LITHOGRAPHY AND THEIR PRODUCTION - For the production of mirrors for EUV lithography, substrates are suggested having a mean relative thermal longitudinal expansion of no more than 10 ppb across a temperature difference ΔT of 15° C. and a zero-crossing temperature in the range between 20° C. and 40° C. For this purpose, at least one first and one second material having low thermal expansion coefficients and opposite gradients of the relative thermal expansion as a function of temperature are selected and a substrate is produced by mixing and bonding these materials. | 05-16-2013 |
20130188162 | Method for Operating a Projection Exposure Tool and Control Apparatus - A method for operating a projection exposure tool for microlithography is provided. The projection exposure tool includes an optical system which includes a number of optical elements which, during an imaging process, convey electromagnetic radiation. All of the surfaces of the optical elements interact with the electromagnetic radiation during the imaging process to form an overall optical surface of the optical system. The method includes: determining respective individual thermal expansion coefficients at at least two different locations of the overall optical surface; calculating a change to an optical property of the optical system brought about by heat emission of the electromagnetic radiation (during the imaging process upon the basis of the thermal expansion coefficients; and imaging mask structures into an image plane via the projection exposure tool with adaptation of the imaging characteristics of the projection exposure tool so that the calculated change to the optical property is at least partially compensated. | 07-25-2013 |
20140176930 | MICROLITHOGRAPHIC ILLUMINATION SYSTEM - A microlithographic illumination system can include a light distribution device that can generate a two-dimensional intensity distribution in a first illumination plane. A first raster array of optical raster elements can generates a raster array of secondary light sources. A device with an additional optical effect can be disposed spatially adjacent to the two raster arrays. The device can be configured as an illumination angle variation device. The device can influence the intensity and/or the phase and/or the beam direction of the illumination light. The influence can be such that an intensity contribution of raster elements to the total illumination intensity can vary across the illumination field. This can enable the illumination intensity to be influenced across the illumination field in a defined manner with respect to the total illumination intensity and/or with respect to the intensity contributions from different directions of illumination. | 06-26-2014 |
20150022798 | ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY - A raster arrangement includes first and second types of raster elements which have different bundle-influencing effects. There is a distance step between a first raster area and a second raster area. The first raster area comprises a raster element of the first raster element type. The second raster area includes a raster element of the second raster element type. The raster arrangement is configured to be used in a microlithography illumination system. | 01-22-2015 |