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Mei-Ling Chen

Mei-Ling Chen, Taipei TW

Patent application numberDescriptionPublished
20100327288TRENCH SCHOTTKY DIODE AND METHOD FOR MANUFACTURING THE SAME - A trench Schottky diode and its manufacturing method are provided. The trench Schottky diode includes a semiconductor substrate having therein a plurality of trenches, a gate oxide layer, a polysilicon structure, a guard ring and an electrode. At first, the trenches are formed in the semiconductor substrate by an etching step. Then, the gate oxide layer and the polysilicon structure are formed in the trenches and protrude above a surface of the semiconductor substrate. The guard ring is formed to cover a portion of the resultant structure. At last, the electrode is formed above the guard ring and the other portion not covered by the guard ring. The protruding gate oxide layer and the protruding polysilicon structure can avoid cracks occurring in the trench structure.12-30-2010
20110084353TRENCH SCHOTTKY RECTIFIER DEVICE AND METHOD FOR MANUFACTURING THE SAME - A trench Schottky rectifier device includes a substrate having a first conductivity type, a plurality of trenches formed in the substrate, and an insulating layer formed on sidewalls of the trenches. The trenches are filled with conductive structure. There is an electrode overlying the conductive structure and the substrate, and thus a Schottky contact forms between the electrode and the substrate. A plurality of embedded doped regions having a second conductivity type are formed in the substrate and located under the trenches. Each doped region and the substrate form a PN junction to pinch off current flowing toward the Schottky contact so as to suppress current leakage.04-14-2011
20110306725VARNISH COMPOSITION WITH HIGH TEMPERATURE OF GLASS TRANSITION FOR GLASS FIBER LAMINATE - A varnish composition includes (1) a benzoxazine resin having highly symmetric molecular structure; (2) at least one of naphthol type novolac resins, aniline type novolac resins and phenolic type novolac resins; (3) fillers. The benzoxazine resin having highly symmetric molecular structure, and the at least one of naphthol type novolac resins, aniline type novolac resins and phenolic type novolac resins contribute to increase the temperature of glass transition of the varnish composition, while decrease the coefficient of thermal expansion and moisture absorbability due to their small and highly symmetric molecular structures. A copper substrate can meet the requirement of high temperature of glass transition (TMA≧200° C.) and low coefficient of thermal expansion (α1/α≦30/1350(μm/(m° C.). Therefore, the composition of the invention can be widely used as high-performance electronic material.12-15-2011

Mei-Ling Chen, Yunlin Hsien TW

Patent application numberDescriptionPublished
20100308478CRUISING AERATOR - A cruising aerator includes a raft, a motor mounted on the raft, a shaft driven by the motor, a first impeller mounted on the shaft, a second impeller mounted on the shaft, and a common chamber. The cruising aerator further includes a sequential controller connected to the motor for controlling the motor to rotate clockwise or counterclockwise. The motor, the shaft and impellers are installed inside of the common chamber. The common chamber has a common inlet disposed under a water surface. A first outlet and a second outlet of the common chamber are arranged to face in opposite directions. The first impeller and second impeller are assembled to have opposite normal rotating directions to each other according to a rotating direction of the motor.12-09-2010

Mei-Ling Chen, Hsinchu TW

Patent application numberDescriptionPublished
20080297735LAMP DRIVING METHOD - A lamp driving method for a projection apparatus is provided. The projection apparatus has a light valve and a lamp. The lamp driving method includes adjusting a brightness of the lamp to different values according to multiple states of the light valve. The lamp driving method improves the energy efficiency of the projection apparatus.12-04-2008
20080304015COLOR FILTERING DEVICE - A color filtering device including a color filter, a plurality of polarization beam splitting units, a plurality of reflecting units, and a plurality of wave plates is provided. The color filter has a plurality of filtering parts and a plurality of light shielding parts alternately arranged thereon. Each of the polarization beam splitting units is disposed in front of one of the filtering parts and makes an angle with a corresponding filtering part. Each of the reflecting units is disposed in front of one of the light shielding parts and makes an angle with a corresponding light shielding part. Each of the wave plates is substantially parallel to one of the filtering parts. Each of the polarization beam splitting units is disposed between a pair of a wave plate and a filtering part. The color filtering device has both color filtering function and polarization conversion function.12-11-2008
20080316430PROJECTION APPARATUS - A projection apparatus including an illumination system, a reflective light valve and an imaging system is provided. The illumination system emits an illumination beam. The reflective light valve is disposed on a transmission path of the illumination beam. The imaging system includes a first lens group, a polarization beam splitter and a second lens group. The first lens group is disposed on the transmission path of the illumination beam between the illumination system and the reflective light valve. The polarization beam splitter is disposed on the transmission path of the illumination beam between the illumination system and the first lens group. The polarization beam splitter permits the illumination beam to pass through and travel to the reflective light valve. The reflective light valve modulates the illumination beam to an image beam traveling to the polarization beam splitter. The polarization beam splitter reflects the image beam to the second lens group.12-25-2008
20080316569ILLUMINATION SYSTEM - An illumination system for providing an illumination beam to a light valve is provided. The illumination system includes a light source, a light integration rod, a color wheel, a first focusing unit and a second focusing unit. The light source is capable of generating the illumination beam, and the light integration rod is disposed on the transmission path of the illumination beam. The first focusing unit is disposed between the integration rod and the color wheel and is capable of focusing the illumination beam onto the color wheel. The second focusing unit is disposed between the color wheel and the light valve and is capable of focusing the illumination beam onto the light valve.12-25-2008
20090009720OPTICAL ENGINE - An optical engine including a beam splitting and combining system, which includes a first polarizing beam splitting (PBS) unit, a dichroic unit and a second PBS unit, is provided. A first color beam is reflected by the first PBS unit, is reflected by a first light valve, and passes through the first PBS unit sequentially. A second color beam passes through the first PBS unit, is reflected by a second light valve, and is reflected by the first PBS unit sequentially. The dichroic unit is disposed on an optical path of the first and second color beams. The second PBS unit is capable of allowing a third color beam to travel to a third light valve and allowing the third color beam reflected from the third light valve to travel to the dichroic unit. The dichroic unit is capable of combining the first, second and third color beams.01-08-2009
20090059396ILLUMINATION SYSTEM - An illumination system including at least one first light source, a prism and a light uniforming device is provided. The first light source is capable of providing a first beam. The prism is disposed on a transmission path of the first beam, and has four first facets. Two of the first facets are opposite to each other, and the other two first facets are opposite to each other. The first beam passes through one of the first facets and is totally internally reflected by another first facet opposite to the one of the first facets. The light uniforming device is disposed on the transmission path of the first beam from the another first facet. The cost of the illumination system is lower, and the illumination system has high flexibility of the light source design and can provide illumination with high brightness.03-05-2009
20100155756LIGHT EMITTING DIODE PACKAGE AND PROJECTION APPARATUS - A light emitting diode (LED) package including a carrier, at least one LED chip, and a light guide element is provided. The LED chip is disposed on the carrier. The light guide element including a light transmissive body, a light integration part, a reflective film, and a support part is disposed on the carrier and above the LED chip. The light integration part connected to the light transmissive body and disposed between the light transmissive body and the LED chip has a light incident surface facing the LED chip and at least one side. The side connects the light transmissive body and the light incident surface. The reflective film is disposed on the side. The support part leaning on the carrier is connected to the light transmissive body and surrounds the light integration part. The light transmissive body, the light integration part, and the support part are integrally formed.06-24-2010

Patent applications by Mei-Ling Chen, Hsinchu TW

Mei-Ling Chen, Yonghe City TW

Patent application numberDescriptionPublished
20100153006ROUTE PLANNING METHODS AND SYSTEMS - Route planning methods and systems are provided. First, an input corresponding to a specific region is received via an input unit of a personal navigation device. Then, a first predefined location located in the specific region is determined. A first route from a first current position of the device to the first predefined location is planned.06-17-2010

Mei-Ling Chen, Kao-Hsiung City TW

Patent application numberDescriptionPublished
20080251931MULTI CAP LAYER AND MANUFACTURING METHOD THEREOF - A method for manufacturing a multi cap layer includes providing a substrate, forming a multi cap layer comprising a first cap layer and a second cap layer formed thereon on the substrate, forming a patterned metal hard mask layer on the multi cap layer, and performing an etching process to etch the multi cap layer through the patterned hard mask layer and to form an opening in the second cap layer.10-16-2008
20090275211FABRICATION METHOD OF POROUS LOW-K DIELECTRIC FILM - A method for fabricating a porous low-k dielectric film includes providing a substrate, performing a first CVD process by providing a back-bone precursor to form an interface dielectric layer, performing a second CVD process by providing a porogen precursor to form a back-bone layer, and removing the porogen material in the back-bone layer so that the back-bone layer becomes an ultra low-k dielectric layer. The interface dielectric layer and the ultra low-k dielectric layer compose a porous low-k dielectric film.11-05-2009

Patent applications by Mei-Ling Chen, Kao-Hsiung City TW

Mei-Ling Chen, Kaohsiung City TW

Patent application numberDescriptionPublished
20090061201ULTRA LOW DIELECTRIC CONSTANT (K) DIELECTRIC LAYER AND METHOD OF FABRICATING THE SAME - A fabrication method of an ultra low-k dielectric layer is provided. A deposition process is performed, under the control of a temperature varying program or a pressure varying program, by reacting a dielectric matrix to form porous low-k dielectric layers with a gradient density on a barrier layer over a substrate.03-05-2009
20110147948FORMING METHOD AND STRUCTURE OF POROUS LOW-K LAYER, INTERCONNECT PROCESS AND INTERCONNECT STRUCTURE - A structure of a porous low-k layer is described, comprising a bottom portion and a body portion of the same atomic composition, wherein the body portion is located on the bottom portion, and the bottom portion has a density higher than the density of the body portion. An interconnect structure is also described, including the above porous low-k layer, and a conductive layer filling up a damascene opening in the porous low-k layer.06-23-2011

Patent applications by Mei-Ling Chen, Kaohsiung City TW

Mei-Ling Chen, Hsinchu County TW

Patent application numberDescriptionPublished
20120077339METHOD OF AND APPARATUS FOR ACTIVE ENERGY ASSIST BAKING - A method of and apparatus for forming interconnects on a substrate includes etching patterns in ultra-low k dielectric and removing moisture from the ultra-low k dielectric using active energy assist baking. During active energy assist baking, the ultra-low k dielectric is heated and exposed to light having only wavelengths greater than 400 nm for about 1 to about 20 minutes at a temperature of about 300 to about 400 degrees Celsius. The active energy assist baking is performed after wet-cleaning or after chemical mechanical polishing, or both.03-29-2012