| Patent application number | Description | Published |
|---|
| 20080275349 | MONITORING, PREDICTING AND TREATING CLINICAL EPISODES - Apparatus ( | 11-06-2008 |
| 20080306396 | High-Sensitivity Sensors for Sensing Various Physiological Phenomena, Particularly Useful in Anti-Snoring Apparatus and Methods - A mechanical vibration sensor adapted to be brought into contact with an object for sensing mechanical vibrations in the object, includes a body of a soft elastomeric material having high transmissivity and low attenuation properties with respect to a preselected type of energy waves; and a pair of transducers mounted, by mounting members having high attenuation properties with respect to the energy waves, in spaced relationship to each other to define a transmission channel between the transducers. Such sensor is particularly useful in a method and apparatus for controlling snoring by a person, by utilizing a stimulus device effective, when sensing snoring, to immediately produce a response in the person tending to interrupt the person's snoring. | 12-11-2008 |
| 20110112442 | Monitoring, Predicting and Treating Clinical Episodes - Apparatus ( | 05-12-2011 |
| 20110282216 | MONITORING A CONDITION OF A SUBJECT - Apparatus and methods are described including a mechanical sensor configured to detect a physiological signal of a subject. A control unit receives the signal over a time duration of at least two hours at a given period of a first baseline day, and determines a baseline physiological parameter of the subject in response thereto. The control unit receives the signal over a time duration of at least two hours at a given period of a second day, the period on the second day overlapping with the period over which the signal is detected on the first baseline day. The control unit determines a physiological parameter of the subject based upon the detected signal on the second day, and compares the parameter to the subject's baseline physiological parameter. The control unit generates an alert in response to the comparison. Other applications are also described. | 11-17-2011 |
| Patent application number | Description | Published |
|---|
| 20090032143 | ELECTRON BEAM ENHANCED NITRIDING SYSTEM - An electron beam enhanced nitriding system that passes a high-energy electron beam through nitrogen gas to form a low electron temperature plasma capable of delivering nitrogen ions and radicals to a substrate to be nitrided. The substrate can be mounted on an electrode, and the substrate can be biased and heated. | 02-05-2009 |
| 20090314633 | ELECTRON BEAM ENHANCED LARGE AREA DEPOSITION SYSTEM - This invention provides a means to deposit thin films and coatings on a substrate using an electron beam generated plasma. The plasma can be used as an ion source in sputter applications, where the ions are used to liberate material from a target surface which can then condense on a substrate to form the film or coating. Alternatively, the plasma may be combined with existing deposition sources including those based on sputter or evaporation techniques. In either configuration, the plasma serves as a source of ion and radical species at the growing film surface in reactive deposition processes. The electron beam large area deposition system (EBELADS) is a new approach to the production of thin films or coatings up to and including several square meters. | 12-24-2009 |
| 20110080093 | Apparatus and Method for Regulating the Output of a Plasma Electron Beam Source - An apparatus and method for controlling electron flow within a plasma to produce a controlled electron beam is provided. A plasma is formed between a cathode and an acceleration anode. A control anode is connected to the plasma and to the acceleration anode via a switch. If the switch is open, the ions from the plasma flow to the cathode and plasma electrons flow to the acceleration anode. With the acceleration anode suitably transparent and negatively biased with a DC high voltage source, the electrons flowing from the plasma are accelerated to form an electron beam. If the switch is closed, the ions still flow to the cathode but the electrons flow to the control anode rather than the acceleration anode. Consequently, the electron beam is turned off, but the plasma is unaffected. By controlling the opening and closing of the switch, a controlled pulsed electron beam can be generated. | 04-07-2011 |
| 20110308461 | Electron Beam Enhanced Nitriding System (EBENS) - An electron beam enhanced nitriding system that passes a high-energy electron beam through nitrogen gas to form a low electron temperature plasma capable of delivering nitrogen ions and radicals to a substrate to be nitrided. The substrate can be mounted on an electrode, and the substrate can be biased and heated. | 12-22-2011 |
