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Megens, NL
Eduardus Johannes Wilhelmus Marinus Megens, 'S-Hertogenbosch NL
| Patent application number | Description | Published |
|---|---|---|
| 20110031259 | Lower Frame for a Product Holder, Holder and Operating Procedure - The invention comprises a basic frame for a holder for products, comprising of a first beam, fitted with at least a first support, to support the first beam on a basis, a second beam fitted with at least a second support, to support the second beam on the basis, and with the first beam linked at variable distances by at least a spacer, for the parallel positioning of the beams mainly distanced from each other at least in an unfolded position of the basic frame, as well as an arm stretched out in the direction of the second beam for a third support, linked to the first beam, for the support of the basic frame on the basis at a distance of at least a collapsed state of the basic frame from the first beam. | 02-10-2011 |
Henricus Johannes Lamberttus Megens, Waalre NL
| Patent application number | Description | Published |
|---|---|---|
| 20110196646 | Alignment System, Lithographic System and Method - A lithographic system includes a lithographic apparatus comprising a projection system which projects a patterned radiation beam onto a target portion of a substrate and an alignment system which measures the position of a feature of the pattern on the substrate at a number of locations over the substrate. A controller compares the measured positions with points on a grid of values and extrapolates values for intermediate positions on the substrate based on values of corresponding intermediate points on the grid, so as to provide an indication of the intermediate positions on the substrate and their displacements relative to the grid. The grid is based on at least one orthogonal basis function, the measurement on the substrate being performed at positions corresponding to the root values of the at least one orthogonal basis function. | 08-11-2011 |
Henricus Johannes Lambertus Megens, Waalre NL
| Patent application number | Description | Published |
|---|---|---|
| 20100165312 | Method of Determining a Characteristic - A plurality of targets including a second population superimposed on a first population are formed. In the first target the second population has an asymmetry with respect to the first population. In the second target the second population has a different asymmetry with respect to the first population. Reflected radiation is detected from both the targets and used to determine different characteristics of the underlying populations. | 07-01-2010 |
| 20110027704 | Methods and Scatterometers, Lithographic Systems, and Lithographic Processing Cells - In a method of determining the focus of a lithographic apparatus used in a lithographic process on a substrate, the lithographic process is used to form a structure on the substrate, the structure having at least one feature which has an asymmetry in the printed profile which varies as a function of the focus of the lithographic apparatus on the substrate. A first image of the periodic structure is formed and detected while illuminating the structure with a first beam of radiation. The first image is formed using a first part of non-zero order diffracted radiation. A second image of the periodic structure is foamed and detected while illuminating the structure with a second beam of radiation. The second image is formed using a second part of the non-zero order diffracted radiation which is symmetrically opposite to the first part in a diffraction spectrum. The ratio of the intensities of the measured first and second portions of the spectra is determined and used to determine the asymmetry in the profile of the periodic structure and/or to provide an indication of the focus on the substrate. In the same instrument, an intensity variation across the detected portion is determined as a measure of process-induced variation across the structure. A region of the structure with unwanted process variation can be identified and excluded from a measurement of the structure. | 02-03-2011 |
| 20110085176 | Method, Inspection Apparatus and Substrate for Determining an Approximate Structure of an Object on a Substrate - A system and method determine an approximate structure of an object on a substrate. This may be applied in model based metrology of microscopic structures to assess critical dimension or overlay performance of a lithographic apparatus. A scatterometer is used to determine approximate structure of an object, such as a grating on a stack, on a substrate. The wafer substrate has an upper layer and an underlying layer. The substrate has a first scatterometry target region, including the grating on a stack object. The grating on a stack is made up of the upper and underlying layers. The upper layer is patterned with a periodic grating. The substrate further has a neighboring second scatterometry target region, where the upper layer is absent. The second region has just the unpatterned underlying layers. | 04-14-2011 |
| 20110141450 | Method and Apparatus for Overlay Measurement - A method of measurement of at-resolution overlay offset may be implemented in a scatterometer. At least three targets are provided on a wafer, each target comprising a first marker grating and a second interleaved marker grating and each target having a different overlay bias between its first and second marker. The first and second markers are provided by subsequent lithography steps in a double patterning lithographic process. The targets are measured with a scatterometer and for each target a measured CD of at least one of the markers is determined using reconstruction. The CD of the first marker may be fixed in the reconstruction. The measured CDs and at least one of the overlay biases is used to determine an overlay result corresponding to a minimum measured CD. The overlay result may be determined by fitting a function such as a parabola to the measured CDs and the overlay biases and determining the overlay at the minimum of the fitted function. | 06-16-2011 |
Henry Megens, Eindhoven NL
| Patent application number | Description | Published |
|---|---|---|
| 20110128520 | ALIGNMENT SYSTEMS AND METHODS FOR LITHOGRAPHIC SYSTEMS - An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively. | 06-02-2011 |
Mischa Megens, Eindhoven NL
| Patent application number | Description | Published |
|---|---|---|
| 20090314414 | METHOD AND SYSTEM FOR CONTACTING OF A FLEXIBLE SHEET AND A SUBSTRATE - The invention relates to a method for contacting a flexible sheet to a first element with improved lateral alignment. The method includes a step of measuring a first lateral misalignment after establishing a first contact between the flexible sheet and either of the first element and a sheet parking surface called anchor in the first stage. If the | 12-24-2009 |
| 20100083855 | METHOD AND APPARATUS FOR APPLYING A SHEET TO A SUBSTRATE - The invention provides a method and apparatus for laminating a sheet to a substrate in a stress free and distortion-less manner. The method comprises providing the sheet and substrate such that an attractive force between them exists that is capable of bringing the sheet and surface together at least when their distance is shorter than a critical distance. The method creates these conditions by locally making an initial contact between the sheet and substrate such that at a contact front, being the boundary between areas where the substrate and sheet are in contact and those where they are not in contact, these conditions exist. In a further step the sheet and substrate are allowed to gradually make contact such that the contact front advances along either of the substrate or sheet surface therewith increasing the contacting area between the substrate and the sheet. The method is advantages when used during imprint lithography or embossing processes or other processes where feature patterns need to be transferred from the substrate to the surface or vice versa. | 04-08-2010 |
| 20100185106 | LIGHT-EMITTING APPARATUS, PARTICULARLY FOR FLOW MEASUREMENTS - The invention relates to a light-emitting apparatus ( | 07-22-2010 |
| 20100259254 | SENSOR DEVICE FOR TARGET PARTICLES IN A SAMPLE - The invention relates to a sensor device ( | 10-14-2010 |
| 20110069388 | HIGHER ORDER DISPERSION COMPENSATION DEVICE - The present invention relates to a higher-order dispersion compensation device ( | 03-24-2011 |
| 20110095756 | MAGNETOCHEMICAL SENSOR - The application is directed to a sensor element for use in a magnetochemical sensor, which comprises a first gel-like material ( | 04-28-2011 |
Peter Megens, Den Dungen NL
| Patent application number | Description | Published |
|---|---|---|
| 20080277452 | METHOD OF EXPLOSION WELDING TO CREATE AN EXPLOSION WELDED ARTICLE HAVING A NON-PLANAR SURFACE - An explosion welded article having a non-planar shape is provided. A method of preparing an apparatus for explosion welding is also provided, as is a method for forming an explosion welded article having a non-planar shape. | 11-13-2008 |
Wilhelmus Johannes Theodorus Megens, Berkel-Enschot NL
| Patent application number | Description | Published |
|---|---|---|
| 20100111628 | Method for Designing and Manufacturing a Gear - A method for designing and manufacturing a gear by means of a computer-controlled machining device comprises the following steps of using a machining device adapted to perform an operation from the group including: milling and spark eroding; using a tool, in particular a milling device or a spark erosion head; using a machining device of the type with at least five simultaneous, independent degrees of freedom; and applying an elongate tool, the form of which corresponds at least to some extent with the intended form of surfaces for modeling by machining. | 05-06-2010 |