Patent application number | Description | Published |
20090029863 | PESTICIDES AND USES THEREOF - The invention disclosed in this document is related to field of pesticides and their use in controlling pests. In particular compounds having the following formula are disclosed. | 01-29-2009 |
20090221424 | PESTICIDES - Compounds having the following generic formula are disclosed. | 09-03-2009 |
20110077160 | PESTICIDES - Compounds having the following generic formula are disclosed. | 03-31-2011 |
20110105507 | VINYL ETHER COMPOUNDS AND METHODS OF THEIR PREPARATION AND USE - Provided are new functionalized surfactants and methods of their preparation and use. The surfactants are compounds of formula I: | 05-05-2011 |
20120122030 | COMPOSITIONS COMPRISING BASE-REACTIVE COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY - New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that comprise one or more base reactive groups and (i) one or more polar groups distinct from the base reactive groups, and/or (ii) at least one of the base reactive groups is a non-perfluorinated base reactive group. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing. | 05-17-2012 |
20120225782 | PESTICIDES - Compounds having the following generic formula are disclosed. | 09-06-2012 |
20130011783 | MONOMERS, POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS - Provided are (meth)acrylate monomers containing acetal moieties, polymers containing a unit formed from such a monomer and photoresist compositions containing such a polymer. The monomers, polymers and photoresist compositions are useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions, methods of forming photolithographic patterns and electronic devices. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices. | 01-10-2013 |
20130012385 | PESTICIDES AND USES THEREOF - The invention disclosed in this document is related to field of pesticides and their use in controlling pests. In particular compounds having the following formula are disclosed. | 01-10-2013 |
20140183413 | QUINOLINE-BENZOXAZOLE DERIVED COMPOUNDS FOR ELECTRONIC FILMS AND DEVICES - The invention provides a composition comprising at least one compound selected from the following Formulas A, B1, B2, B3, B4 or C: | 07-03-2014 |
20150021289 | PHOTORESIST COMPOSITION, COATED SUBSTRATE, AND METHOD OF FORMING ELECTRONIC DEVICE - A photoresist composition includes a polymer with repeat units having the structure | 01-22-2015 |
20150025262 | BIS(ARYL)ACETAL COMPOUNDS - A bis(aryl)acetal has the formula | 01-22-2015 |
20150025278 | AROMATIC POLYACETALS AND ARTICLES COMPRISING THEM - A polymer includes repeat units having the structure | 01-22-2015 |
20150031847 | METHOD OF FORMING POLYARYL POLYMERS - In a method of forming a polyacetal or polyketal, a specific acetal- or ketal-containing bis(aryl)acetal is coupled with itself or a comonomer in the presence of a catalyst and a base. The polymerization reaction tolerates hydroxyl and other functional groups on the bis(aryl)acetal. Among other applications, the polyacetals and polyketals are useful components of photoresist compositions. | 01-29-2015 |