Masayuki Tanabe
Masayuki Tanabe, Matsudo-Shi JP
Patent application number | Description | Published |
---|---|---|
20090053384 | Method for Preparation of Plant Extract - It is intended to develop a technique for producing a water-soluble polyphenol at high purity and with high efficiency in a short time from hop bract or the like which is a by-product in the beer brewing. A method for preparation of a purified plant extract comprising steps of treating a plant extract with a clay mineral such as bentonite and removing any divalent cations from the resulting product; a method for producing a polyphenol comprising steps of passing the purified plant extract through a column to adsorb polyphenols onto the column and passing a solvent though the column to elute a water-soluble polyphenol from the column; and a method for producing a water-soluble hop bract polyphenol comprising steps of adding bentonite to a hop bract extract and allowing the resulting mixture to stand under acidic conditions, performing solid-liquid separation to produce a supernatant, purifying the supernatant through a column to give a pholyphenol-containing fraction, cooling the fraction and allowing the cooled fraction to stand to cause the precipitation of water-insoluble ingredients and performing solid-liquid separation to give the desired water-soluble hop bract polyphenol. | 02-26-2009 |
Masayuki Tanabe, Odawara JP
Patent application number | Description | Published |
---|---|---|
20080263394 | Disk array apparatus - A disk array apparatus where, when a failure occurs at a part of a cache memory, a memory area of an I/O processing controller other than the memory area where the failure has occurred is utilized without taking over the whole I/O processing to an I/O processing controller of other system is provided, so that influence of performance degradation can be minimized. In a disk array apparatus including dual cache memories, when a failure occurs at a part of the cache memory, only a memory area where the failure has occurred is closed, and reallocation thereof to another memory area of the same cache memory is conducted to continue an I/O processing. | 10-23-2008 |
Masayuki Tanabe, Utsunomiya-Shi JP
Patent application number | Description | Published |
---|---|---|
20120199997 | IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD - An imprint apparatus of the present invention that molds and cures an imprint material on a substrate using a mold to form a pattern on the substrate. The imprint apparatus includes a supply unit configured to supply a gas into a gap between the imprint material on the substrate and the mold. The supply unit is configured to supply a mixed gas in which a permeable gas, which permeates at least one of the mold, the imprint material and the substrate, and a condensable gas, which is liquefied under a pressure generated by the molding, is mixed with each other. | 08-09-2012 |
20120257180 | METHOD OF CLEANING PIPE OF IMMERSION EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE - A method of cleaning a supply pipe of an immersion exposure apparatus includes a cycle including a step of increasing a flow rate of a cleaning liquid via a supply pipe, which supplies a liquid to a gap between a substrate and a final surface of a projection optical system, and a step of decreasing the flow rate, wherein the cycle is executed a plurality of times after one of completion of one of setting and maintenance of the immersion exposure apparatus and completion of exposure of at least one substrate, and before exposure of a first shot region on a new substrate using the immersion exposure apparatus. | 10-11-2012 |
20140145370 | IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD - An imprint apparatus of the present invention that molds and cures an imprint material on a substrate using a mold to form a pattern on the substrate. The imprint apparatus includes a supply unit configured to supply a gas into a gap between the imprint material on the substrate and the mold. The supply unit is configured to supply a mixed gas in which a permeable gas, which permeates at least one of the mold, the imprint material and the substrate, and a condensable gas, which is liquefied under a pressure generated by the molding, is mixed with each other. | 05-29-2014 |
Masayuki Tanabe, Fujisawa JP
Patent application number | Description | Published |
---|---|---|
20130051065 | ILLUMINATION UNIT AND DISPLAY APPARATUS USING THE SAME - An illumination unit includes an LED and a tabular light guide plate having a light emitting surface for emitting light from the LED as planar light, wherein a recessed portion is formed in the opposite surface of the tight emitting surface of the light guide plate, and wherein the LED is provided in the recessed portion so that the optical axis of the LED becomes parallel to the light emitting surface of the light guide plate. Further, a plurality of LEDs are arranged along the longer direction of the recessed portion, a dimming pattern is provided at a location corresponding to each of a plurality of LED of the light emitting surface of the light guide plate, and the shape or the size of the dimming pattern is varied with a location on the light emitting surface of the light guide plate. | 02-28-2013 |
Masayuki Tanabe, Oyama JP
Patent application number | Description | Published |
---|---|---|
20130278866 | ILLUMINATION DEVICE AND LIQUID CRYSTAL DISPLAY APPARATUS USING THE SAME - A plurality of backlight blocks are configured by being juxtaposed in the plane direction of an illumination device and include a bidirectional backlight block. Light sources are formed on both lateral sides of the bidirectional backlight block in the direction of the axes of emission of the light sources, the light sources formed on one lateral side are arranged so that light is emitted in the direction toward the light sources formed on the other lateral side, the light sources formed on the other lateral side are arranged so that light is emitted in the direction toward the light sources formed on the one lateral side, and the bidirectional backlight block is arranged in the center part of the illumination device in the direction of the axes of emission of the light sources. | 10-24-2013 |