Patent application number | Description | Published |
20090087573 | Process for Producing Base Material for Forming Heat Shielding Film - There is provided a production process of a heat-ray shielding film-formed base member comprising the steps of mixing a sol solution, formed by using a starting raw material of trialkoxysilane or trialkoxysilane and tetraalkoxysilane, with a solution in which tin-doped indium oxide ultra-fine particles are dispersed, to make a treatment agent; and applying the treatment agent to a base member. In this production process, the treatment agent has an organic solvent having a boiling point of 100-200° C. as a dispersion medium, and the application is conducted by a means by bringing a member retaining the treatment agent into contact with the base member or by a means by spraying the treatment agent, thereby adjusting haze value of the film to be formed to 0.5% or less. | 04-02-2009 |
20100143600 | Coating Fluid Applicable by Hand for Sol-Gel Film Formation - A coating solution for obtaining sol-gel films, the coating solution being composed of a solid matter and a solvent, the solid matter including a silicon oxide oligomer obtained by subjecting an alkoxysilane to hydrolysis and polycondensation in an acid aqueous solution; the solvent including an organic solvent having a boiling point of 100° C. or higher and a viscosity of 3.5 mPa·s or lower and the aqueous acid solution, the number average molecular weight of the silicon oxide oligomer in terms of polystyrene being 500-4000, the content of the solid matter in the coating solution being 8-30 weight %, and the content of the silicon oxide oligomer in the solid matter being 10 weight % or greater. | 06-10-2010 |
20100227159 | Heat Ray Shielding Glass for Vehicle and Process for Producing the Same - [Problems] To develop a heat ray shielding glass usable as a vehicle glass having up-and-down function, the heat ray shielding glass having a film hardness and generating no abnormal noise by friction due to up-and-down movement. | 09-09-2010 |
20140339321 | PRESSURE FEED CONTAINER, STORAGE METHOD USING THE PRESSURE FEED CONTAINER, AND METHOD FOR TRANSFERRING LIQUID USING THE PRESSURE FEED CONTAINER - The present invention provides a pressure feed container capable of ensuring the cleanliness of a liquid such as a protective film-forming liquid chemical or a protective film-forming liquid chemical kit for preparing the liquid chemical even after long-term storage, and also capable of suppressing electrostatic charge in the liquid. The present invention provides a pressure feed container configured to store a protective film-forming liquid chemical or a protective film-forming liquid chemical kit that is mixed into the protective film-forming liquid chemical, and to transfer a liquid upon application of pressure to the inside of the container, the protective film-forming liquid chemical being for forming a water-repellent protective film on at least surfaces of recessed portions of an uneven pattern formed on a surface of a wafer containing a silicon element at least at a part of the uneven pattern. The protective film-forming liquid chemical contains a nonaqueous organic solvent, a silylation agent, and an acid or a base; the protective film-forming liquid chemical kit includes a treatment liquid A containing a nonaqueous organic solvent and a silylation agent, and a treatment liquid B containing a nonaqueous organic solvent and an acid or a base; the pressure feed container includes a container body configured to contain a liquid selected from the protective film-forming liquid chemical, the treatment liquid A, and the treatment liquid B, and a liquid flowing nozzle configured such that the liquid flows therethrough to be introduced into the container body and/or to be extracted from the container body; the container body includes a metal can body in which a portion configured to contact the liquid is formed from a resin material; the liquid flowing nozzle is provided with a neutralization mechanism configured to reduce electrostatic potential in the liquid; and a liquid contact portion of the liquid flowing nozzle excluding the neutralization mechanism is formed from a resin material. | 11-20-2014 |
Patent application number | Description | Published |
20110132397 | Silicon Wafer Cleaning Agent - A silicon wafer cleaning agent includes at least a water-based cleaning liquid, and a water-repellent cleaning liquid for providing water-repellent to an uneven pattern at least at recessed portions during a cleaning process. The water-repellent cleaning liquid is a liquid composed of a water-repellent compound containing a reactive moiety which is chemically bondable to Si in the silicon wafer, and a hydrophobic group, or is a liquid wherein 0.1 mass % or more of the water-repellent compound relative to the total quantity of 100 mass % of the water-repellent cleaning liquid and an organic solvent are mixed and contained therein. A cleaning process wherein a pattern collapse is easily induced can be improved by using the cleaning agent. | 06-09-2011 |
20110162680 | Liquid Chemical for Forming Protecting Film - Disclosed is a liquid chemical for forming a water-repellent protecting film on a wafer. The liquid chemical is a liquid chemical containing a water-repellent-protecting-film-forming agent for forming the water-repellent protecting film, at the time of cleaning the wafer which has a finely uneven pattern at its surface and contains at least at a part of a surface of a recessed portion of the uneven pattern at least one kind of matter selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium and silicon, at least on the surface of the recessed portion. The liquid chemical is characterized in that the water-repellent-protecting-film-forming agent is a water-insoluble surfactant. The water-repellent protecting film formed with the liquid chemical is capable of preventing a pattern collapse of the wafer, in a cleaning step. | 07-07-2011 |
20120017934 | Liquid Chemical for Forming Protecting Film - Disclosed is a liquid chemical for forming a water-repellent protecting film at least on a surface of a recessed portion of an uneven pattern at the time of cleaning a wafer having a finely uneven pattern at its surface and containing silicon at least a part of the uneven pattern. This liquid chemical contains a silicon compound A represented by the general formula: R | 01-26-2012 |
20120164818 | Process for Cleaning Wafers - Disclosed is a process for cleaning a wafer having an uneven pattern at its surface. The process includes at least: a step of cleaning the wafer; a step of substituting a cleaning liquid retained in recessed portions of the wafer with a water-repellent liquid chemical after cleaning; and a step of drying the wafer. The process is characterized in that the cleaning liquid has a boiling point of 55 to 200° C., and characterized in that the water-repellent liquid chemical used for the substitution has a temperature of not lower than 40° C. and lower than a boiling point of the water-repellent liquid chemical thereby imparting water repellency at least to surfaces of the recessed portions. With this process, it is possible to provide a cleaning process for improving the cleaning step that tends to induce a pattern collapse. | 06-28-2012 |
20120174945 | Liquid Chemical for Forming Protecting Film - Disclosed is a liquid chemical for forming a water-repellent protecting film. The liquid chemical contains an agent for forming a water-repellent protecting film, and a solvent. The agent is for provided to form a water-repellent protecting film on a wafer after a cleaning step for the wafer and before a drying step for the wafer, the wafer having at its surface an uneven pattern and containing at least one kind element of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water-repellent protecting film being formed at least on the surfaces of the recessed portions. The liquid chemical is characterized in that the agent for forming a water-repellent protecting film is a compound represented by the following general formula [1]. | 07-12-2012 |
20120211025 | PROCESS FOR CLEANING WAFERS - A process for cleaning a wafer having an uneven pattern at its surface. The process includes at least the steps of: cleaning the wafer with a cleaning liquid; substituting the cleaning liquid retained in recessed portions of the wafer with a water-repellent liquid chemical after cleaning; and drying the wafer, wherein the cleaning liquid contains 80 mass % or greater of a solvent having a boiling point of 55 to 200° C., and wherein the water-repellent liquid chemical supplied in the substitution step has a temperature of not lower than 40° C. and lower than a boiling point of the water-repellent liquid chemical thereby imparting water repellency at least to surfaces of the recessed portions. | 08-23-2012 |
20120272999 | Liquid Chemical for Forming Water Repellent Protecting Film, and Process for Cleaning Wafers Using the Same - A liquid chemical for forming a water repellent protecting film on a wafer having at its surface an uneven pattern and containing at least one kind of element selected from the group consisting of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water repellent protecting film being formed at least on the surfaces of the recessed portions. The liquid chemical is characterized by including: a water repellent protecting film forming agent; and water, and characterized in that the water repellent protecting film forming agent is at least one selected from compounds represented by the following general formula [1] and salt compounds thereof and that the concentration of the water relative to the total quantity of a solvent contained in the liquid chemical is not smaller than 50 mass %. | 11-01-2012 |
20130056023 | Chemical for Forming Protective Film - Disclosed is a liquid chemical for forming a water repellent protective film on a wafer that has at its surface a finely uneven pattern and contains silicon element at least at a part of the uneven pattern, the water repellent protective film being formed at least on surfaces of recessed portions of the uneven pattern at the time of cleaning the wafer. The liquid chemical contains: a silicon compound (A) represented by the general formula R | 03-07-2013 |
20130092191 | Liquid Chemical for Forming Water Repellent Protective Film - The present invention relates to a method for cleaning wafers while preventing pattern collapse of the wafers in semiconductor device fabrication, the wafer having at its surface an uneven pattern and containing silicon element at least on surfaces of recessed portions. Provided is: a liquid chemical for forming a protective film which allows efficient cleaning; and a method for cleaning wafers, using the liquid chemical. A liquid chemical for forming a water repellent protective film is provided for forming a protective film on a wafer (having at its surface an uneven pattern and containing silicon element at least at a part of the uneven pattern), the protective film being formed at least on surfaces of recessed portions of the uneven pattern at the time of cleaning the wafer. The liquid chemical contains a dialkylsilyl compound represented by the formula [1] and does not contain an acid and a base. | 04-18-2013 |
20130104931 | Liquid Chemical for Forming Protective Film, and Cleaning Method for Wafer Surface | 05-02-2013 |
20130146100 | Water Repellent Protective Film Forming Agent, Liquid Chemical for Forming Water Repellent Protective Film, and Wafer Cleaning Method Using Liquid Chemical - A water repellent protective film forming agent is provided for forming a protective film on a wafer that has an uneven pattern at its surface. The protective film is formed at least on surfaces of recessed portions of the wafer at the time of cleaning the wafer. The wafer is a wafer that contains a material including silicon element at least at the surfaces of the recessed portions of the uneven pattern or a wafer that contains at least one kind of material selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride and ruthenium at least at a part of the surfaces of the recessed portions of the uneven pattern. The water repellent protective film forming agent is provided to contain a silicon compound represented by the following general formula [1]: | 06-13-2013 |
20130255534 | Method of Preparing Liquid Chemical for Forming Protective Film - Disclosed herein is a method for preparing a liquid chemical for forming a water-repellent protective film, the liquid chemical being for forming the water-repellent protective film at the time of cleaning a wafer having at its surface an uneven pattern and containing silicon element at least at a part of the uneven pattern at least on surfaces of recessed portions of the uneven pattern, the liquid chemical containing a nonaqueous organic solvent, a silylation agent, and an acid or a base. The method includes (i) adjusting a water content of the nonaqueous organic solvent to 200 mass ppm or less by dehydration; and (ii) mixing the nonaqueous organic solvent, the silylation agent, and the acid or the base after the adjusting step. | 10-03-2013 |
20140311379 | Method for Preparing Liquid Chemical for Forming Water Repellent Protective Film - A method for preparing a liquid chemical for forming a water-repellant protective film, the liquid chemical having a solvent and an agent for forming a water-repellant protective film, the liquid chemical being for forming a water-repellent protective film at least on surfaces of recessed portions of an uneven pattern of a wafer having the uneven pattern at its surface, the method including: a first refinement step for eliminating the elements (metal impurities) Na, Mg, K, Ca, Mn, Fe, Cu, Li, Al, Cr, Ni, Zn and Ag in a solvent by distilling the solvent or by a particle-eliminating membrane and an ion exchange resin membrane; a mixing step for mixing the solvent after the first refinement step and an agent for forming a water-repellant protective film; and a second refinement step for eliminating particles in a liquid chemical after the mixing step by a particle-eliminating membrane. | 10-23-2014 |
20140373870 | Liquid Chemical for Forming Protecting Film - Disclosed is a liquid chemical for forming a water-repellent protecting film. The liquid chemical contains an agent for forming a water-repellent protecting film, and a solvent. The agent is for provided to form a water-repellent protecting film on a wafer after a cleaning step for the wafer and before a drying step for the wafer, the wafer having at its surface an uneven pattern and containing at least one kind element of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water-repellent protecting film being formed at least on the surfaces of the recessed portions. The liquid chemical is characterized in that the agent for forming a water-repellent protecting film is a compound represented by the following general formula [1]. | 12-25-2014 |
20150101643 | Silicon Wafer Cleaning Agent - A silicon wafer cleaning agent includes at least a water-based cleaning liquid, and a water-repellent cleaning liquid for providing water-repellent to an uneven pattern at least at recessed portions during a cleaning process. The water-repellent cleaning liquid is a liquid composed of a water-repellent compound containing a reactive moiety which is chemically bondable to Si in the silicon wafer, and a hydrophobic group, or is a liquid wherein 0.1 mass % or more of the water-repellent compound relative to the total quantity of 100 mass % of the water-repellent cleaning liquid and an organic solvent are mixed and contained therein. A cleaning process wherein a pattern collapse is easily induced can be improved by using the cleaning agent. | 04-16-2015 |
20150179433 | Water-Repellent Protective Film, and Chemical Solution for Forming Protective Film - A surface treatment was conducted by using a liquid chemical containing a water-repellent protective film forming agent represented by the following general formula [1], subsequent to a step of cleaning a metal-based wafer and prior to a step of drying the wafer. | 06-25-2015 |
20150270123 | Liquid Chemical for Forming Protective Film - A liquid chemical for forming a water-repellent protective film, containing: a water-repellent protective film forming agent for forming a water-repellent protective film on a wafer having at its surface an uneven pattern and containing at least one kind of element selected from titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the protective film being formed at least on the surfaces of the recessed portions by retaining the liquid chemical at least on the recessed portions of the wafer before a rinsing treatment step of rinsing the wafer surface with a rinsing liquid consisting only of a protic polar solvent or a rinsing liquid containing a protic polar solvent as the principal component; and a solvent. The water-repellent protective film forming agent is at least one kind of compound represented by the following general formulas [1] to [3]. | 09-24-2015 |
Patent application number | Description | Published |
20150014574 | WORKING FLUID COMPOSITION FOR REFRIGERATOR, REFRIGERATION OIL, AND METHOD FOR PRODUCING SAME - The working fluid composition for a refrigerating machine of the present invention comprises: a refrigerating machine oil comprising a mineral oil and an alkylbenzene in a mass ratio, the mineral oil/the alkylbenzene, of 85/15 to 15/85, wherein the mineral oil has a % C | 01-15-2015 |
20150014575 | WORKING FLUID COMPOSITION FOR REFRIGERATOR, REFRIGERATION OIL, AND METHOD FOR PRODUCING SAME - A working fluid composition for a refrigerating machine of the present invention comprises: a refrigerating machine oil comprising a complex ester as a base oil; and a hydrocarbon refrigerant having 2 to 4 carbon atoms, the complex ester being obtainable by further esterifying, with at least one selected from a monohydric alcohol having 1 to 20 carbon atoms and a fatty acid having 2 to 20 carbon atoms, an ester intermediate obtained by reacting a neopentyl polyol with a dibasic acid, and having an acid value of 0.5 mgKOH/g or less, the refrigerating machine oil having a kinematic viscosity at 100° C. of 2 to 50 mm | 01-15-2015 |
20150028252 | REFRIGERATOR OIL COMPOSITION, METHOD FOR PRODUCING SAME, AND WORKING FLUID COMPOSITION FOR REFRIGERATORS - A refrigerating machine oil composition comprising at least one ester additive selected from tetraesters of pentaerythritol and one selected from fatty acids having 5 to 18 carbon atoms and hexaesters of dipentaerythritol and one selected from fatty acids having 5 to 18 carbon atoms, and a base oil that is an ester other than the ester additive, in which the content of the ester additive is 2 to 20 mass % based on the total amount of the refrigerating machine oil composition, and the kinematic viscosity of the refrigerating machine oil composition at 40° C. is 3 to 500 mm | 01-29-2015 |
20150041704 | WORKING FLUID COMPOSITION FOR REFRIGERATOR - The working fluid composition for a refrigerating machine of the present invention comprises a refrigerant comprising a first refrigerant component and a second refrigerant component, and having a global warming potential (GWP) of 500 or less, wherein the first refrigerant component is at least one selected from difluoromethane and tetrafluoropropene, and the second refrigerant component is at least one selected from carbon dioxide and a hydrocarbon having 3 to 4 carbon atoms; and a refrigerating machine oil comprising at least one selected from a polyol ester, a polyvinyl ether and a polyalkylene glycol compound as a base oil, wherein a carbon/oxygen molar ratio of the base oil is 2.5 or more and 5.8 or less. | 02-12-2015 |
20150041705 | WORKING FLUID COMPOSITION FOR REFRIGERATOR - The working fluid composition for a refrigerating machine of the present invention comprises a refrigerant comprising monofluoroethane, and a refrigerating machine oil comprising at least one selected from a polyol ester, a polyvinyl ether and a polyalkylene glycol compound as a base oil, wherein a carbon/oxygen molar ratio of the base oil is 2.5 or more and 5.8 or less. | 02-12-2015 |
20150076393 | WORKING FLUID COMPOSITION FOR REFRIGERATOR - The working fluid composition for a refrigerating machine of the present invention comprises a mixed refrigerant comprising a hydrofluoroethane represented by the following formula (A), difluoromethane and tetrafluoropropene, and a refrigerating machine oil comprising at least one selected from a polyol ester, a polyvinyl ether and a polyalkylene glycol compound as a base oil, wherein a carbon/oxygen molar ratio of the base oil is 2.5 or more and 5.8 or less. | 03-19-2015 |
20150115194 | REFRIGERATOR WORKING FLUID COMPOSITION AND REFRIGERANT OIL - A working fluid composition for a refrigerating machine comprising: a refrigerating machine oil containing at least one lubricating base oil selected from a mineral oil and a synthetic oil, and at least one phosphorus compound selected from a mono(alkylphenyl) diphenyl phosphate having a C3-C5 alkyl group and a di(alkylphenyl) phenyl phosphate having two C3-C5 alkyl groups, wherein a content of the phosphorus compound is 0.01 to 5% by mass based on a total amount of the refrigerating machine oil; and a hydrocarbon refrigerant having 2 to 4 carbon atoms. | 04-30-2015 |
20150184103 | LUBRICANT BASE OIL, REFRIGERATOR OIL AND WORKING FLUID COMPOSITION FOR REFRIGERATORS - The lubricating base oil of the present invention comprises an ester synthesized from: a first component that is at least one selected from polyhydric alcohols having 2 to 4 hydroxyl groups; a second component that is at least one selected from polybasic acids having 6 to 12 carbon atoms; and a third component that is at least one selected from monohydric alcohols having 4 to 18 carbon atoms and monocarboxylic acids having 2 to 12 carbon atoms. In addition, the refrigerating machine oil and the working fluid composition for a refrigerating machine of the present invention each comprise the above lubricating base oil. | 07-02-2015 |
20150203732 | WORKING FLUID COMPOSITION FOR REFRIGERATING MACHINE - A working fluid composition for a refrigerating machine comprises a refrigerant comprising monofluoroethane and a refrigerating machine oil comprising, as a base oil, at least one selected from a mineral oil having % C | 07-23-2015 |
20150252281 | LUBRICANT COMPOSITION - The present invention provides a lubricating oil composition comprising a lubricating base oil, and at least one ester additive selected from a first ester that is a fatty acid 3,4-epoxycyclohexyl alkyl ester and a second ester that is a 3,4-epoxycyclohexyl carboxylic acid alkyl ester, wherein a content of the ester additive is 0.01 to 5.0% by mass based on the total mass of the lubricating oil composition. | 09-10-2015 |