| Patent application number | Description | Published |
| 20080237931 | Mold for Fine Pattern Transfer and Method for Forming Resin Pattern Using Same - A mold for forming a resin pattern using nanoimprint lithography according to the present invention comprises a main mold including a fine pattern of a protrusion and a depression intended to be transferred, and a spacer for forming a space between the protrusion of the fine pattern of the main mold and a transferred object during a transfer of the fine pattern, in which the spacer has a vent passage capable of flowing gas therethrough and has an elasticity against a pressing force during the transfer. | 10-02-2008 |
| 20080299247 | Fine Pattern Mold and Method for Producing the Same - There is provided a fine pattern mold capable of transferring a fine concave/convex pattern accurately without causing deformation of the fine concave/convex pattern itself. | 12-04-2008 |
| 20090004320 | IMPRINTING STAMPER AND METHOD OF MANUFACTURING THE SAME - An imprinting stamper which can transfer a microscopic pattern to a medium bearing a convex area or local projection, with high accuracy. A convexo-concave pattern is formed on a surface of the imprinting stamper. It includes a pattern layer having the convexo-concave pattern; and a stamper backside layer arranged on a backside of the pattern layer. Young's modulus of the pattern layer is 500 MPa to 10 GPa; and Young's modulus of the stamper backside layer is smaller than Young's modulus of the pattern layer. | 01-01-2009 |
| 20090087506 | BELT-SHAPED MOLD AND NANOIMPRINT SYSTEM USING THE BELT-SHAPED MOLD - There is provided a fine pattern transfer, belt-shaped mold, with which a fine structure having a high aspect ratio can be formed rapidly and stably using nanoimprinting, and a fine pattern transfer system (a nanoimprint system) that employs this mold. According to the present invention, a nanoimprint mold includes: a belt-shaped support member; a plurality of stampers, for each of which a fine convex-and-concave pattern, to be transferred, is formed on one surface; and an adhesive member, to which the belt-shaped support member and the stampers are to be securely adhered, wherein the adhesive member includes a porous member and adhesive layers, which are deposited on either face of the porous member, for impregnating one part of the porous member, and wherein, for the porous member, a porous area that is not impregnated with the adhesive layers, is provided and positioned so as to sandwich the porous member between portions impregnated with the adhesive layers. | 04-02-2009 |
| 20090166914 | IMPRINT APPARATUS AND METHOD FOR FINE STRUCTURE LITHOGRAPHY - An imprint apparatus for forming fine structure lithography comprises: a belt-like mold having a fine structure for imprint lithography formed on a surface of the belt-like mold; a cylindrical pressurizing mechanism including a pair of opposed rolls for pressurizing the belt-like mold against the surface of the imprinting object; and a supporting member for supporting the imprinting object at a position between the rolls of the cylindrical pressurizing mechanism. The belt-like mold, the imprinting object and the supporting member are configured to move to the cylindrical pressurizing mechanism in a mutually non-contact state, and then at the position between the rolls, be pressurized by the cylindrical pressurizing mechanism in a state where the imprinting object is positioned between the belt-like mold and the supporting member. | 07-02-2009 |
| 20090243126 | METHOD AND APPARATUS FOR IMPRINTING MICROSTRUCTURE AND STAMPER THEREFOR - A method of imprinting a microstructure comprising: contacting a stamper comprising a pattern layer with the microstructure of the order of from micrometers to nanometers in one face of the pattern layer and a substrate supporting the pattern layer with an imprinting member having a deformable layer to which the microstructure is imprinted, wherein the pattern layer is supported on a round surface having a prescribed radius of curvature of the substrate, the center of the round surface protruding towards the rear face of the pattern layer; causing the deformable layer on the imprinting member; and separating the stamper from the cured deformable layer. | 10-01-2009 |
| 20090246309 | FINE STRUCTURE IMPRINTING MACHINE - A fine structure imprinting machine is provided which can surely and easily eliminate static electricity in removing a stamper from an imprinting object. The fine structure imprinting machine is adapted to bring the stamper with a fine concavo-convex pattern formed thereon into contact with the imprinting object, thereby to imprint the fine concavo-convex pattern of the stamper onto a surface of the imprinting object. The stamper has a conductive film on at least a pattern formation surface thereof. The stamper is fixed by a conductive holding member, the conductive film is connected to the holding member via the conductor, and the holding member is connected to a ground within the machine. | 10-01-2009 |
| 20100098799 | IMPRINT APPARATUS - An imprint apparatus has a head unit with a fine structure. The head unit includes a fine imprint pattern layer including fine concavities and convexities, a resin layer on a face of the fine imprint pattern layer opposite to a face where the concavities and convexities are formed, a first pressurizing base member on a face of the resin layer opposite to a face contacting the fine imprint pattern layer, and a second pressurizing base member on a face of the first pressurizing base member opposite to a face contacting the resin layer. The resin layer has a modulus of elasticity smaller than that of the fine imprint pattern layer, and the first pressurizing base member has a modulus of elasticity smaller than that of the resin layer. A light source or a heat source may be further provided. The head unit may be light permeable. A replacement layer may be further provided for replacement. | 04-22-2010 |
| 20100155989 | STAMPER FOR TRANSFERRING FINE PATTERN AND METHOD FOR MANUFACTURING THEREOF - An object of the present invention is to provide a stamper for transferring fine pattern and a method for manufacturing the stamper, the stamper has a fine structure layer to improve a continuous transferring property of the resinous stamper, and to allow accurate and continuous transferring. In order to achieve the above object, the present invention provides a stamper for transferring fine pattern, including: a fine structure layer on a supporting substrate, in which the fine structure layer is a polymer of a resinous compound whose principal component is silsesquioxane derivative having a plurality of polymerizable functional groups. | 06-24-2010 |
| 20100189836 | MICROPATTERN TRANSFER DEVICE - In a micropattern transfer device, a stamper on which a fine indented pattern is formed is brought into contact with a material to be transferred, and the fine indented pattern on the stamper is transferred onto a surface of the material to be transferred. The micropattern transfer device includes a holding mechanism which holds an entire outer circumferential portion of the material to be transferred. The holding mechanism holds the material to be transferred such that a distance between the material to be transferred and the stamper is substantially equal to or shorter than a distance between the holding mechanism and the stamper. | 07-29-2010 |
| 20100255139 | MICROPATTERN TRANSFER STAMPER AND MICROPATTERN TRANSFER DEVICE - A micropattern transfer stamper has a space that hermetically contains fluid, on an opposite side of a surface with an indented pattern formed thereon of a pattern forming sheet member. The pattern forming sheet member is convexly bent by pressure of the fluid contained in the space. When the indented pattern is transferred onto the material to be transferred, the pattern forming sheet member deforms following the surface of the material to be transferred. | 10-07-2010 |
| 20100270712 | MICROPATTERN TRANSFER METHOD AND MICROPATTERN TRANSFER DEVICE - An object of the present invention is to provide a micropattern transfer method and a micropattern transfer device in which the small amount of resin is applied to a substrate, and the nonuniformity in thickness is prevented to arise on the obtained pattern forming layer. In order to achieve the above object, the present invention provides a micropattern transfer method in which a micropattern is transferred to a resin by pressing a stamper having the micropattern onto the resin applied to a substrate, including the steps of: applying the resin to a surface of the substrate discretely in order to obtain a plurality of resin islands so that a center portion of each of the resin islands forms a planar thin-film, and a peripheral portion of the resin island rises higher than the center portion. | 10-28-2010 |
| 20100310773 | Fine Metal Structure, Process for Producing the Same, Fine Metal Mold and Device - A fine metal structure having its surface furnished with microprojections of high strength, high precision and large aspect ratio; and a process for producing the fine metal structure free of defects. There is provided a fine metal structure having its surface furnished with microprojections, characterized in that the microprojections have a minimum thickness or minimum diameter ranging from 10 nanometers to 10 micrometers and that the ratio between minimum thickness or minimum diameter (D) of microprojections and height of microprojections (H), H/D, is greater than 1. There is further provided a process for producing a fine metal structure, characterized by comprising providing a substrate having a fine rugged pattern on its surface, applying a molecular electroless plating catalyst to the surface, thereafter carrying out electroless plating to thereby form a metal layer having the rugged pattern filled, and detaching the metal layer from the substrate to thereby obtain a fine metal structure furnished with a surface having undergone reversal transfer of the above rugged pattern. | 12-09-2010 |
| 20110135814 | FUNCTIONING SUBSTRATE WITH A GROUP OF COLUMNAR MICRO PILLARS AND ITS MANUFACTURING METHOD - A functioning substrate with a group of columnar micro pillars characterized in that a first matrix of organic polymer and a group of columnar micro pillars of organic polymer extending from this matrix are provided. This group of columnar micro pillars has an equivalent diameter of 10 nm through 500 μm and a height of 50 nm through 5000 μm; and the ratio (H/D) of the equivalent diameter (D) to the height (H) of the group of columnar micro pillars is 4 or more. | 06-09-2011 |