Patent application number | Description | Published |
20080211973 | Spectrum Sequential Display Having Reduced Cross Talk - A color display device, a drive circuit for a color display device, a method, a signal and a computer-readable medium for reducing electro-optical cross talk that occurs in a display that is operated in Spectrum Sequential mode is disclosed. The invention eliminates annoying visible artefacts, such as contouring, noise, or color deviation, which normally are introduced by this cross talk by compensating for the cross talk. According to embodiments of the invention, a drive signal (R′,G′,B′) to drive picture elements of the display is altered in video processing circuitry (MPC, XTC, SC) and/or software, in dependence on one or more properties of different spectra from a light source ( | 09-04-2008 |
20080252822 | Image Display Apparatus - An electro-optical switch, which can be switched between a substantially transparent state and a scattering state on basis of respective applied voltages, is disclosed. The electro-optical switch has a reflection-voltage curve that is steep enough to allow multiplexing. The electro-optical switch comprises: a scattering layer ( | 10-16-2008 |
20080265802 | System and Method for Controlling Lighting Systems - A light panel ( | 10-30-2008 |
20090272916 | RADIATION SOURCE AND LITHOGRAPHIC APPARATUS - A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel is contacted by a beam of radiation to form a plasma, a collector constructed and arranged to collect extreme ultraviolet radiation formed at the plasma formation site and form an extreme ultraviolet radiation beam, and a contamination barrier. The contamination barrier includes a plurality of foils at least partially located between the plasma formation site and the collector, and a rotatable base operatively connected to the plurality of foils. The rotatable base is configured to allow the beam of radiation to pass through the contamination barrier to the plasma formation site. | 11-05-2009 |
20100002027 | DISPLAY DEVICE AND METHOD - A display device ( | 01-07-2010 |
20100020304 | Spectral Purity Filters for Use in a Lithographic Apparatus - According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 μm. | 01-28-2010 |
20100053992 | ILLUMINATION SYSTEM AND DISPLAY DEVICE - The invention relates to an illumination system ( | 03-04-2010 |
20100060672 | LIQUID CRYSTAL DISPLAY SYSTEM AND METHOD - A display system ( | 03-11-2010 |
20100271610 | LITHOGRAPHIC RADIATION SOURCE, COLLECTOR, APPARATUS AND METHOD - A collector assembly for use in a laser-produced plasma extreme ultraviolet radiation source for use in lithography has a collector body having a collector mirror and a window in the collector body. The window is transmissive to excitation radiation, which may be an infrared laser beam, so that it can pass through the window to excite the plasma, and the window has an EUV minor on its surface which is also transmissive to the excitation beam but which can reflect EUV generated by the plasma to the collector location of the collector mirror. The window may improve the collection efficiency and reduce non-uniformity in the image at the collector location. Radiation sources, lithographic apparatus and device manufacturing methods may make use of the collector. | 10-28-2010 |
20100328639 | SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER - A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation. The spectral purity filter includes a filter part having a plurality of apertures to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. The apertures may be manufactured in carrier material such as silicon by an anisotropic etching process and topped with a reflective layer such as Mo metal, Ru metal, TiN or RuO. A diffusion barrier layer such as silicon nitride Si | 12-30-2010 |
20110007306 | PHOTO-DETECTOR AND METHOD OF MEASURING LIGHT - Proposed is a light sensor ( | 01-13-2011 |
20110043782 | SPECTRAL PURITY FILTERS FOR USE IN A LITHOGRAPHIC APPARATUS - A spectral purity filter includes a plurality of apertures extending through a member. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation, A first region of the spectral purity filter has a first configuration that results in a first radiation transmission profile for the radiation having the first wavelength and the radiation having the second wavelength, and a second region of the spectral purity filter has a second, different configuration that results in a second, different radiation transmission profile for the radiation having the first wavelength and the radiation having the second wavelength. | 02-24-2011 |
20110044425 | SPECTRAL PURITY FILTERS FOR USE IN A LITHOGRAPHIC APPARATUS - A spectral purity filter includes a plurality of apertures extending through a member. The apertures are arranged to suppress a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The apertures extend though the member in different directions in order to be substantially in alignment with radiation constituting a non-parallel beam of radiation. | 02-24-2011 |
20110075420 | LIGHT OUTPUT DEVICE AND METHOD - The present invention relates to a light output device ( | 03-31-2011 |
20110116520 | EYE-SAFE LASER-BASED LIGHTING - The invention relates to a laser-based light source comprising a laser device ( | 05-19-2011 |
20110117504 | METHOD FOR REMOVING A DEPOSITION ON AN UNCAPPED MULTILAYER MIRROR OF A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A method for removal of a deposition on an uncapped multilayer mirror of an apparatus. The method includes providing a gas that includes one or more of H | 05-19-2011 |
20110128519 | Radiation Source - A radiation source may include a radiation emitter for emitting radiation, a collector for collecting radiation emitted by the radiation emitter, and an outlet configured, in use, to introduce a cooled gas into the radiation source. | 06-02-2011 |
20110157573 | SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS INCLUDING SUCH A SPECTRAL PURITY FILTER AND DEVICE MANUFACTURING METHOD - A spectral purity filter includes an aperture. The spectral purity filter is configured to enhance the spectral purity of a radiation beam by being configured to absorb radiation of a first wavelength and allow at least a portion of radiation of a second wavelength to transmit through the aperture. The first wavelength is larger than the second wavelength. The spectral purity filter may be used to improve the spectral purity of an Extreme Ultra-Violet (EUV) radiation beam. | 06-30-2011 |
20110164237 | SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER - A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation. The spectral purity filter includes a filter part having a plurality of apertures configured to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. Each aperture has been manufactured by an anisotropic etching process. | 07-07-2011 |
20110211185 | Spectral Purity Filter, Radiation Source, Lithographic Apparatus, and Device Manufacturing Method - A spectral purity filter is configured to allow transmission therethrough of extreme ultraviolet (EUV) radiation and to refract or reflect non-EUV secondary radiation. The spectral purity filter may be part of a source module and/or a lithographic apparatus. | 09-01-2011 |
20110228555 | LIGHTING DEVICE - A lighting device ( | 09-22-2011 |
20120127368 | ANTI-BLUR APPARATUS FOR E.G. BACKLIGHT OF LIQUID CRYSTAL DISPLAY - A display control apparatus comprises a video source( | 05-24-2012 |
20120147351 | SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER - A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation (λ<20 nm). The filter comprises a grid-like structure comprising a plurality of microscopic apertures fabricated in a carrier material such as silicon. The grid-like structure in at least part of its area is formed so as to have, within an expected range of operating conditions, a negative Poisson's ratio. By forming the grid of a material that likes to expand or contract simultaneously in orthogonal directions, the management of differential thermal expansion is improved. Various geometries are possible to achieve a negative Poisson's ratio. The aperture geometry may that of a re-entrant polygon or re-entrant shape having curved sides. Examples include a so-called re-entrant or auxetic honeycomb, in which each aperture is hexagonal, as in the regular honeycomb, but the form is a re-entrant hexagon rather than a regular hexagon. | 06-14-2012 |
20120154778 | SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER - A method of forming a spectral purity filter having a plurality of apertures configured to transmit extreme ultraviolet radiation and suppress transmission of a second type of radiation, in which trenches are formed in a base material in a pattern corresponding to the walls to be formed between the apertures. The trenches are filled with a grid material to form walls of the grid material, and the base material is selectively removed until the grid material is exposed and forms the spaces between the walls of the grid material for the apertures. | 06-21-2012 |
20120154779 | SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER - A method for manufacturing a spectral purity filter is provided in which openings in a first surface of a base material, corresponding to a plurality of apertures of the spectral purity filter, are formed. At least the surfaces of the base material surrounding the openings in the first surface are chemically treated to form a layer of a second material, and the base material is etched from the second surface such that the openings extend from the first surface of the base material to the second surface of the base material. | 06-21-2012 |
20120182537 | SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD - A spectral purity filter, in particular for use in a lithographic apparatus using EUV radiation for the projection beam, includes a plurality of apertures in a substrate. The apertures are defined by walls having side surfaces that are inclined to the normal to a front surface of the substrate. | 07-19-2012 |
20130010363 | Spectral Purity Filters for Use in a Lithographic Apparatus - According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 μm. | 01-10-2013 |
20130038926 | SPECTRAL PURITY FILTER - A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000° C. | 02-14-2013 |
20130114059 | Components for EUV Lithographic Apparatus, EUV Lithographic Apparatus Including Such Components and Method for Manufacturing Such Components - A metal component ( | 05-09-2013 |
20130148121 | Device Manufacturing Method and Associated Lithographic Apparatus, Inspection Apparatus, and Lithographic Processing Cell - Disclosed is a device manufacturing method, and accompanying inspection and lithographic apparatuses. The method comprises measuring on the substrate a property such as asymmetry of a first overlay marker and measuring on the substrate a property such as asymmetry of an alignment marker. In both cases the asymmetry is determined. The position of the alignment marker on the substrate is then determined using an alignment system and the asymmetry information of the alignment marker and the substrate aligned using this measured position. A second overlay marker is then printed on the substrate; and a lateral overlay measured on the substrate of the second overlay marker with respect to the first overlay marker using the determined asymmetry information of the first overlay marker. | 06-13-2013 |
20130161542 | RADIATION SOURCE WITH CLEANING APPARATUS - A radiation source includes an uncapped Mo/Si multilayer mirror, and a cleaning apparatus configured to remove a deposition comprising Sn on the uncapped Mo/Si multilayer mirror. The cleaning apparatus is configured to provide a gas comprising one or more of H | 06-27-2013 |