Patent application number | Description | Published |
20080196626 | SILICONE COATING COMPOSITION - The present invention relates to a composition comprising:
| 08-21-2008 |
20090035704 | Underlayer Coating Composition Based on a Crosslinkable Polymer - The present invention relates to an underlayer coating composition capable of being crosslinked comprising a polymer, a compound capable of generating a strong acid, and optionally a crosslinker, where the polymer comprises at least one absorbing chromophore and at least one moiety selected from an epoxy group, an aliphatic hydroxy group and mixtures thereof. | 02-05-2009 |
20100009297 | Antireflective Coating Compositions - Antireflective coatings and related polymers are disclosed. | 01-14-2010 |
20100015550 | DUAL DAMASCENE VIA FILLING COMPOSITION - Compositions for use in dual damascene process are disclosed. | 01-21-2010 |
20100040838 | Hardmask Process for Forming a Reverse Tone Image - The present invention relates to a process for forming an reverse tone image on a device comprising; a) forming an absorbing underlayer on a substrate; b) forming a coating of a positive photoresist over the underlayer; c) forming a photoresist pattern; d) treating the first photoresist pattern with a hardening compound, thereby forming a hardened photoresist pattern; e) forming a silicon coating over the hardened photoresist pattern from a silicon coating composition; f) dry etching the silicon coating to remove the silicon coating till the silicon coating has about the same thickness as the photoresist pattern; and, g) dry etching to remove the photoresist and the underlayer, thereby forming a trench beneath the original position of the photoresist pattern. The invention further relates to a product of the above process and to a microelectronic device made from using the above process. | 02-18-2010 |
20100092894 | Bottom Antireflective Coating Compositions - Antireflective coating compositions are discussed. | 04-15-2010 |
20100093969 | Process for making siloxane polymers - The present invention relates to process for making a siloxane polymer which comprises at least one Si—OH group and at least one Si—OR group, where R is a moiety other than hydrogen, comprising reacting one or more silane reactants together in the presence of a hydrolysis catalyst in either a water/alcohol mixture or in one or more alcohols to form the siloxane polymer; and separating the siloxane polymer from the water/alcohol mixture or the alcohol(s). | 04-15-2010 |
20100248137 | Antireflective Coating Compositons - The present invention discloses novel bottom anti-reflective coating compositions where a coating from the composition has an etch rate that can be regulated by the etch plate temperature. | 09-30-2010 |
20100316949 | Spin On Organic Antireflective Coating Composition Comprising Polymer with Fused Aromatic Rings - The present invention relates to an organic spin on hard mask antireflective coating composition comprising a polymer comprising at least one unit of fused aromatic rings in the backbone of the polymer and at least one unit with a cycloaliphatic moiety in the backbone of the polymer. The invention further relates to a process for making the polymer and a process for imaging the present composition. | 12-16-2010 |
20110250544 | BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS - Antireflective coating compositions are discussed. | 10-13-2011 |
20110300488 | Antireflective Coating Composition and Process Thereof - The invention related to an antireflective coating comprising a mixture of a first polymer and a second polymer, and a thermal acid generator, where the first polymer comprises at least one fluoroalcohol moiety, at least one aliphatic hydroxyl moiety, and at least one acid moiety other than fluoroalcohol with a pKa in the range of about 8 to about 11; where the second polymer is a reaction product of an aminoplast compound with a compound comprising at least one hydroxyl and/or at least one acid group. The invention further relates to a process for using the novel composition to form an image. | 12-08-2011 |
20120202155 | UNDERLAYER COATING COMPOSITION AND PROCESSES THEREOF - The invention relates to an underlayer coating composition comprising a polymer, where the polymer comprises at least one hydroxyaromatic unit in the backbone of the polymer phenol which has a pendant group comprising a fluoro or iodo moiety, and at least one unit comprising an aminoplast. The invention further relates to a process for forming an image using the composition, especially for EUV. | 08-09-2012 |
20120328990 | UNDERLAYER COMPOSITION AND PROCESS THEREOF - The present invention relates to an underlayer composition comprising a polymer, an organic titanate compound and optionally a thermal acid generator, where the polymer comprises at least one fluoroalcohol group and at least one epoxy group. The invention also relates to a process for using this underlayer material as an antireflective coating composition and/or a hard mask for pattern transfer. | 12-27-2012 |
20130233827 | METHODS AND MATERIALS FOR REMOVING METALS IN BLOCK COPOLYMERS - The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer. | 09-12-2013 |
20130330668 | NEUTRAL LAYER POLYMER COMPOSITION FOR DIRECTED SELF ASSEMBLY AND PROCESSES THEREOF - The present invention relates to a novel polymeric composition comprising a novel polymer having two or more repeat units and a terminus having the structure (1): | 12-12-2013 |
20140151330 | METHODS AND MATERIALS FOR REMOVING METALS IN BLOCK COPOLYMERS - The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer. | 06-05-2014 |