| Patent application number | Description | Published |
|---|
| 20090081174 | Synergistic fungicidal compositions - Fungicidal compositions are described, consisting of mixtures comprising a copper (II) salt of phosphorous acid and at least another metallic salt of phosphorous acid or consisting of mixtures comprising a copper (II) salt of phosphorous acid, alone or mixed with at least another metallic salt of phosphorous acid, and one or more fungicidal compounds, and their use for the control of phyto-pathogen fungi. | 03-26-2009 |
| 20090105238 | Compounds and Relative use for the Control of Phytopathogens - Amphoteric compounds are described, having a zwitterionic structure of the betainic type having general formula (I) | 04-23-2009 |
| 20100317519 | Mixtures and methods for the induction of resistance in plants - Mixtures are described comprising two or more compounds selected from at least two of the following groups: i) salicylic acid and/or its functional analogous products (ESA), ii) promoting compounds (PRO) and iii) modulating compounds (MOD), and their use for stimulating the natural defence systems of plants and for inducing resistance in plants. The use is also described, of two or more compounds selected from at least two of the following groups: one or more compounds belonging to the ESA group and/or one or more compounds belonging to the PRO group and/or one or more compounds belonging to the MOD group, individually adopted by means of application programs which envisage alternating application, to stimulate the natural defence systems of plants and inducing resistance in plants. | 12-16-2010 |
| Patent application number | Description | Published |
|---|
| 20090165953 | Plasma Reactor - A plasma reactor ( | 07-02-2009 |
| 20090183684 | Plasma Treatment Device - A plasma abatement device comprises a gas chamber having a gas inlet for receiving a gas to be treated by the device and a gas outlet, at least part of the inner surface of the gas chamber being formed from, or coated with, an electrically conductive material that is resistant to corrosion during treatment of a gas containing a halocompound and water vapour. | 07-23-2009 |
| 20100038230 | Microwave Plasma Abatement Apparatus - In a method of operating a microwave plasma abatement apparatus comprising a microwave generator, and a gas chamber for receiving microwave energy from the microwave generator and within which a plasma is generated using the microwave energy, the amount of microwave energy that is not absorbed within the gas chamber is monitored, and the power of the microwave energy generated by the microwave generator is adjusted in dependence on the monitored microwave energy. | 02-18-2010 |
| 20110197759 | METHOD OF TREATING A GAS STREAM - A method is described for treating gas exhaust from a polysilicon etch process, which uses a plasma abatement device to treat the gas. The device comprises a stainless steel gas chamber having a gas inlet for receiving the gas and a gas outlet. As the gas may contain a halocompound and water vapour, the chamber is heated to a temperature that inhibits adsorption of water on the surface within the chamber, thereby inhibiting corrosion of the gas chamber. The gas is then conveyed to the gas chamber for treatment, and the temperature of the chamber is maintained above said temperature during treatment of the gas. | 08-18-2011 |
