Many
Christopher Many, Highgate, VT US
Patent application number | Description | Published |
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20100277725 | UNIVERSAL MULTIDETECTION SYSTEM FOR MICROPLATES - An apparatus and a method for optically analyzing a sample are provided. The apparatus includes a first optical device that transmits a narrow waveband of light and has a first filter and a first monochromator that provide different paths for the narrow waveband of the light. The apparatus may also include a light source that generates the light as broadband excitation light, in which case the first optical device transmits a narrow waveband of the broadband excitation light through the first filter or the first monochromator. Further, the apparatus may include a second optical device that directs the narrow waveband of the broadband excitation light onto the sample and receives emission light from the sample, a third optical device that transmits a narrow waveband of the emission light, and a detector that converts the narrow waveband of the emission light into an electrical signal. | 11-04-2010 |
20120300194 | UNIVERSAL MULTIDETECTION SYSTEM FOR MICROPLATES - An apparatus for optically analyzing a sample may include an imaging subsystem that images the sample, one or more analyzing subsystems that analyze the sample, a temperature control subsystem that controls a temperature of the atmosphere within the apparatus, a gas control subsystem that controls a composition of the atmosphere within the apparatus, and a control module that controls the various subsystems of the apparatus. | 11-29-2012 |
John Many, Garnerville, NY US
Patent application number | Description | Published |
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20150128361 | SUBMERSIBLE ELECTRIC-POWERED LEAF VACUUM CLEANER - An electric-powered submersible vacuum cleaner for filtering water in a pool includes a base with an inlet port extending therethrough. A plurality of wheels extends from the lower surface of the base to facilitate movement of the cleaner over a surface of the pool. An impeller coaxially aligned with the inlet draws water and debris from the pool surface. An electric-powered drive train is coupled to the cleaner and configured to rotate the impeller. A discharge conduit in fluid communication with the inlet extends substantially normal with respect to the upper surface of the base and circumscribes the impeller to direct the flow of water/debris drawn through the inlet by the impeller. A filter mounted over the discharge conduit filters the debris from the drawn water and passes filtered water into the pool. A rotatable handle is attached to and facilitates manual movement of the cleaner over the pool surface. | 05-14-2015 |
Michael A. Many, Merdian, ID US
Patent application number | Description | Published |
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20140205952 | METHODS OF FORMING PATTERNS FOR SEMICONDUCTOR DEVICE STRUCTURES - Methods of forming a pattern in a semiconductor device structure include deprotecting an outer portion of a first photosensitive resist material, forming a second photosensitive resist material, exposing portions of the first and second photosensitive resist materials to radiation, and removing the deprotected outer portion of the first photosensitive resist material and the exposed portions of the first and second photosensitive resist materials. Additional methods include forming a first resist material over a substrate to include a first portion and a relatively thicker second portion, deprotecting substantially the entire first portion and an outer portion of the second portion while leaving an inner portion of the second portion protected, and forming a second resist material over the substrate. A portion of the second resist material is exposed to radiation, and deprotected and exposed portions of the first and second resist materials are removed. | 07-24-2014 |
Michael A. Many, Meridian, ID US
Patent application number | Description | Published |
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20160048074 | METHODS OF FORMING PATTERNS FOR SEMICONDUCTOR DEVICE STRUCTURES - Methods of forming a pattern in a semiconductor device structure include deprotecting an outer portion of a first photosensitive resist material, forming a second photosensitive resist material, exposing portions of the first and second photosensitive resist materials to radiation, and removing the deprotected outer portion of the first photosensitive resist material and the exposed portions of the first and second photosensitive resist materials. Additional methods include forming a first resist material over a substrate to include a first portion and a relatively thicker second portion, deprotecting substantially the entire first portion and an outer portion of the second portion while leaving an inner portion of the second portion protected, and forming a second resist material over the substrate. A portion of the second resist material is exposed to radiation, and deprotected and exposed portions of the first and second resist materials are removed. | 02-18-2016 |