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Makoto Miyamoto

Makoto Miyamoto, Tokyo JP

Patent application numberDescriptionPublished
20080269427Polyphenylene ether oligomer compound, derivatives thereof and use thereof - The present invention provides a bifunctional phenylene ether oligomer compound having a thermosetting functional group at each terminal, an epoxy resin containing the above oligomer compound and a use thereof. That is, it provides a sealing epoxy resin composition for sealing an electric part, an epoxy resin composition for laminates, a laminate, a printed wiring board, a curable resin composition and a photosensitive resin composition. The resins and resin compositions of the present invention are used in electronics fields in which a low dielectric constant, a low dielectric loss tangent and high toughness are required and also used for various uses such as coating, bonding and molding.10-30-2008
20090011972Surfactant for Fine-Bubble Formation - The present invention has its object to provide a surfactant which makes it possible to obtain microbubbles with ease, and is effective to render the microbubbles obtained stable for a long period of time. The present invention relates to a surfactant for microbubble formation 01-08-2009
20090012331Process for the production of vinyl compound - A process, advantageous in producibility, for the production of a vinyl compound containing very small amounts of ionic impurities and hydrolysable halogens, which is capable of curing by means of heat and/or light and giving a cured product having excellent dielectric characteristics and heat resistance, which process can efficiently remove a generated salt and comprises reacting a non-protonic polar solvent solution of a specific bifunctional phenylene ether oligomer with a vinylbenzyl halide in the presence of an alkoxide of an alkali metal, 01-08-2009
20090205856Carboxylic Acid-Modified Bisphenol Epoxy Di(meth)acrylate - The present invention provides a bifunctional phenylene ether oligomer compound having a thermosetting functional group at each terminal, an epoxy resin containing the above oligomer compound and a use thereof. That is, it provides a sealing epoxy resin composition for sealing an electric part, an epoxy resin composition for laminates, a laminate, a printed wiring board, a curable resin composition and a photosensitive resin composition. The resins and resin compositions of the present invention are used in electronics fields in which a low dielectric constant, a low dielectric loss tangent and high toughness are required and also used for various uses such as coating, bonding and molding.08-20-2009
20100048826Polyphenylene ether oligomer compound, derivatives thereof and use thereof - The present invention provides a bifunctional phenylene ether oligomer compound having a thermosetting functional group at each terminal, an epoxy resin containing the above oligomer compound and a use thereof. That is, it provides a sealing epoxy resin composition for sealing an electric part, an epoxy resin composition for laminates, a laminate, a printed wiring board, a curable resin composition and a photosensitive resin composition. The resins and resin compositions of the present invention are used in electronics fields in which a low dielectric constant, a low dielectric loss tangent and high toughness are required and also used for various uses such as coating, bonding and molding.02-25-2010

Patent applications by Makoto Miyamoto, Tokyo JP

Makoto Miyamoto, Ome-Shi JP

Patent application numberDescriptionPublished
20080212454Information recording method and apparatus with suppressed mark edge jitters - Recording information is disclosed in which an information recording medium is irradiated with a recording energy beam that is power-modulated into at least a record power level and a record-ready power level lower than the record power level. The information is recorded on the recording medium in the form of length and interval of a mark portion. When forming a mark portion of a predetermined length, the radiation energy of the energy beam is increased as compared with when forming a mark portion of a different length before or after the first pulse of an energy beam pulse train including at least a pulse for forming the mark portion.09-04-2008
20080310264Information recording method and apparatus with suppressed mark edge jitters - Recording information is disclosed in which an information recording medium is irradiated with a recording energy beam that is power-modulated into at least a record power level and a record-ready power level lower than the record power level. The information is recorded on the recording medium in the form of length and interval of a mark portion. When forming a mark portion of a predetermined length, the radiation energy of the energy beam is increased as compared with when forming a mark portion of a different length before or after the first pulse of an energy beam pulse train including at least a pulse for forming the mark portion.12-18-2008
20080310270Information recording method and apparatus with suppressed mark edge jitters - Recording information is disclosed in which an information recording medium is irradiated with a recording energy beam that is power-modulated into at least a record power level and a record-ready power level lower than the record power level. The information is recorded on the recording medium in the form of length and interval of a mark portion. When forming a mark portion of a predetermined length, the radiation energy of the energy beam is increased as compared with when forming a mark portion of a different length before or after the first pulse of an energy beam pulse train including at least a pulse for forming the mark portion.12-18-2008
20090034393Information recording method and apparatus with suppressed mark edge jitters - Recording information is disclosed in which an information recording medium is irradiated with a recording energy beam that is power-modulated into at least a record power level and a record-ready power level lower than the record power level. The information is recorded on the recording medium in the form of length and interval of a mark portion. When forming a mark portion of a predetermined length, the radiation energy of the energy beam is increased as compared with when forming a mark portion of a different length before or after the first pulse of an energy beam pulse train including at least a pulse for forming the mark portion.02-05-2009
20090040901Information recording method and apparatus with suppressed mark edge jitters - Recording information is disclosed in which an information recording medium is irradiated with a recording energy beam that is power-modulated into at least a record power level and a record-ready power level lower than the record power level. The information is recorded on the recording medium in the form of length and interval of a mark portion. When forming a mark portion of a predetermined length, the radiation energy of the energy beam is increased as compared with when forming a mark portion of a different length before or after the first pulse of an energy beam pulse train including at least a pulse for forming the mark portion.02-12-2009
20100027399Information Recording Method, Information Recording Medium and Information Recording Apparatus - An information recording medium and information recording method using an optical recording medium in which at least one recording pulse is formed for recording information on the optical recording medium, and the information is recorded to the optical recording medium by irradiating the at least one recording pulse on the optical recording medium. A duration of the at least one recording pulse is determined by a combination of (1) a length of M (n) of a mark being currently written, (2) a length S(n−1) of a space precedent to the mark, and (3) a length S(n+1) of a space subsequent to the mark.02-04-2010

Patent applications by Makoto Miyamoto, Ome-Shi JP

Makoto Miyamoto, Chiyoda-Ku JP

Patent application numberDescriptionPublished
20090149017METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUS FOR USE IN THE SAME - A semiconductor substrate processing apparatus is provided with a cleaning process chamber containing a semiconductor substrate for performing a cleaning process on the semiconductor substrate. Connected to the cleaning process chamber is a cleaning liquid feeding pipe for supplying a cleaning liquid to the semiconductor substrate. A gas dissolving unit is provided in the midpoint of the cleaning liquid feeding pipe for dissolving a prescribed gas in ultrapure water. An inert gas or a reducing gas is dissolved as a prescribed gas in ultrapure water. A control unit is provided having a function of supplying the cleaning liquid with the prescribed gas dissolved therein to the semiconductor substrate subjected to the cleaning process before performing a dry process. Therefore, the surface of the semiconductor substrate is free from stains. Moreover, a metal interconnection does not elude.06-11-2009

Makoto Miyamoto, Hyogo JP

Patent application numberDescriptionPublished
20090207526Head Support Device, Disk Device Having The Head Support Device, And Portable Electronic Device Having The Disk Device - A head support device allowing a further increase in shock resistance against an external impact, a disk device having the head support device, and a portable electronic device having the disk device are disclosed. In the head support device, head support arm on which head slider with a head is disposed through a flexible and elastic gimbal mechanism is formed rotatably about rotary shaft as a horizontal rotating axis in parallel with a disk surface. Head support arm is formed such that it pivots about a straight line drawn between apexes of a pair of pivots as vertical pivot axis vertically with respect to the disk surface. A gravity center position of a total mass of members, except the head slider, pivoting about vertical pivot axis is positioned near vertical pivot axis. The disk device includes the foregoing head support device.08-20-2009

Patent applications by Makoto Miyamoto, Hyogo JP

Makoto Miyamoto, Okaya-Shi JP

Patent application numberDescriptionPublished
20110285803Thermal Recording Head and Thermal Recording Apparatus Comprising the Same - [Problem] There are provided a thermal recording head capable of making proper operation of a converter, and a thermal recording apparatus including the same. [Solution] A thermal recording head (11-24-2011

Makoto Miyamoto, Kirishima-Shi JP

Patent application numberDescriptionPublished
20120125568Recording Head And Recording Device Comprising Same - There are provided a recording head capable of reduction of variations in heat-generating temperature among heat-generating elements constituting a heat-generating-element array, and a recording device including the recording head. A recording head includes a heat radiator; a head base body having a substrate placed on or above the heat radiator and a heat-generating-element array composed of a plurality of heat-generating elements arranged on or above the substrate; a bonding layer that is interposed between the heat radiator and the substrate and bonds the heat radiator with the substrate; and a plurality of spacer particles arranged within the bonding layer so as to abut on both of the heat radiator and the substrate. The bonding layer includes a first region situated immediately below the heat-generating-element array and a second region extending in parallel with the first region. The spacer particles are arranged in the second region.05-24-2012

Makoto Miyamoto, Yokohama JP

Patent application numberDescriptionPublished
20120229029PLASMA GENERATING APPARATUS AND PLASMA GENERATING METHOD - Generated amount of active species is increased, and dew formation or moisture attachment hardly occurs on a dielectric layer. A plasma generating apparatus including a pair of electrodes, wherein a dielectric layer is arranged on at least one of surfaces of the electrodes facing each other, plasma discharge occurs as a predetermined voltage is applied to the electrodes, and a coating film is arranged on a surface of the dielectric layer.09-13-2012