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Makoto Iwai

Makoto Iwai, Chigasaki-Shi JP

Patent application numberDescriptionPublished
20100165733NAND NONVOLATILE SEMICONDUCTOR MEMORY - A NAND nonvolatile semiconductor memory includes a plurality of series-connected memory cells each includes a charge storage layer and control gate electrode, a plurality of word lines respectively connected to control gate electrodes of the memory cells, a first selection transistor connected between one end of the memory cells and a source line, a second selection transistor connected between the other end of the memory cells and a bit line, and a driver configured to control voltages applied to the word lines. The driver applies a first voltage to a first word line connected to a selected memory cell, and applies a cutoff voltage that cuts off a channel of a memory cell to second word lines of a number not less than three arranged side by side on the source line side with respect to the first word line during a write operation.07-01-2010
20110075485NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE - A non-volatile semiconductor storage device according to one aspect of the present invention includes a plurality of sense amplifier circuit that are configured to carry out a plurality of read cycles on a plurality of bit lines connected to those memory cells that are selected by a selected one of the word lines. During the second and subsequent read cycles, supply of a read current is ceased to those bit lines when it is determined in the preceding read cycle that a current not less than a certain determination current level flows therethrough, and the read current is supplied only to the remaining bit lines. A setup time of the bit lines in the first read cycle is set shorter than a setup time of the bit lines in the second and subsequent read cycles.03-31-2011
20110176366SEMICONDUCTOR STORAGE DEVICE AND READING METHOD THEREOF - An embodiment of the invention provides a semiconductor storage device including a NAND string, a SEN node, and a capacitor. The NAND string includes plural series-connected memory cells, and one end of the NAND string is connected to a bit line while the other end is connected to a common source line. The SEN node is configured to be able to be electrically connected to a voltage source and the bit line. In the capacitor, one end is connected to the SEN node while the other end is connected to a CLK node to which a voltage within a predetermined range is applied. A discharge rate of the SEN node is enhanced by decreasing a capacitance during discharge of the SEN node only when a selected memory cell selected from the plural memory cells is an on-cell.07-21-2011

Makoto Iwai, Yokohama-Shi JP

Patent application numberDescriptionPublished
20090154241NONVOLATILE SEMICONDUCTOR MEMORY, METHOD FOR READING OUT THEREOF, AND MEMORY CARD - A nonvolatile semiconductor memory includes: a memory cell unit including a plurality of memory cells having an electric charge accumulation layer and a control electrode, said memory cells being electrically connected in series; a plurality of word lines, each of which is electrically connected to said control electrode of said plurality of memory cells; a source line electrically connected to said memory cells at one end of said memory cell unit; a bit line electrically connected to said memory cells at the other end of said memory cell unit; and a control signal generation circuit, which during a data readout operation staggers a timing for selecting the word line connected to said memory cells of said memory cell unit from a timing for selecting a non-selected word line connected to a non-selected memory.06-18-2009
20090185423SEMICONDUCTOR MEMORY DEVICE - A semiconductor memory device includes a memory cell array including a plurality of blocks each including a memory cell unit, and a selection transistor which selects the memory cell unit, and a row decoder including a first block selector and a second block selector each of which includes a plurality of transfer transistors which are formed to correspond to the plurality of blocks and arranged adjacent to each other in a word-line direction wherein the diffusion layers are formed to oppose each other in the first block selector and the second block selector, and a width between the diffusion layers of the first block selector and the second block selector adjacent to each other in the word-line direction is made larger than a width between the diffusion layers in each of the first block selector and the second block selector adjacent to each other in the word-line direction.07-23-2009
20100128526MULTI-LEVEL NONVOLATILE SEMICONDUCTOR MEMORY - A memory includes first and second select gate transistors, memory cells which are connected in series between the first and second select gate transistors, a selected word line which is connected to a selected memory cell as a target of a reading, a non-selected word line which is connected to a non-selected memory cell except the selected memory cell, a potential generating circuit for generating a selected read potential which is supplied to the selected word line, and generating a non-selected read potential larger than the selected read potential, which is supplied to the non-selected word line, and a control circuit which changes a set up term of the selected word line and the non-selected word line based on a value of the selected read potential, wherein the value of the selected read potential is selected from two or more potentials.05-27-2010
20100135078NONVOLATILE SEMICONDUCTOR MEMORY - A memory includes first and second select gate transistors, memory cells, a source line, a bit line, a selected word line which is connected to a selected memory cell as a target of a verify reading, a non-selected word line which is connected to a non-selected memory cell except the selected memory cell, a potential generating circuit for generating a selected read potential which is supplied to the selected word line, and generating a non-selected read potential larger than the selected read potential, which is supplied to the non-selected word line, and a control circuit which classifies a threshold voltage of the selected memory cell to one of three groups by verifying which area among three area which are isolated by two values does a cell current of the selected memory cell belong, when the selected read potential is a first value.06-03-2010
20100177563NONVOLATILE SEMICONDUCTOR MEMORY, METHOD FOR READING OUT THEREOF, AND MEMORY CARD - A nonvolatile semiconductor memory includes: a memory cell unit including a plurality of memory cells having an electric charge accumulation layer and a control electrode, said memory cells being electrically connected in series; a plurality of word lines, each of which is electrically connected to said control electrode of said plurality of memory cells; a source line electrically connected to said memory cells at one end of said memory cell unit; a bit line electrically connected to said memory cells at the other end of said memory cell unit; and a control signal generation circuit, which during a data readout operation staggers a timing for selecting the word line connected to said memory cells of said memory cell unit from a timing for selecting a non-selected word line connected to a non-selected memory.07-15-2010
20100232233NONVOLATILE SEMICONDUCTOR MEMORY DEVICE - A nonvolatile semiconductor memory device in which a negative-threshold cell read operation is performed by biasing a source line and well line to a positive voltage includes a first drive circuit that sets at least unselected word line in a floating state at a negative-threshold cell read time.09-16-2010
20110063911SEMICONDUCTOR MEMORY DEVICE - A semiconductor memory device includes a memory cell array including a plurality of blocks each including a memory cell unit, and a selection transistor which selects the memory cell unit, and a row decoder including a first block selector and a second block selector each of which includes a plurality of transfer transistors which are formed to correspond to the plurality of blocks and arranged adjacent to each other in a word-line direction wherein the diffusion layers are formed to oppose each other in the first block selector and the second block selector, and a width between the diffusion layers of the first block selector and the second block selector adjacent to each other in the word-line direction is made larger than a width between the diffusion layers in each of the first block selector and the second block selector adjacent to each other in the word-line direction.03-17-2011
20110286268NONVOLATILE SEMICONDUCTOR MEMORY - A memory includes first and second select gate transistors, memory cells, a source line, a bit line, a selected word line which is connected to a selected memory cell as a target of a verify reading, a non-selected word line which is connected to a non-selected memory cell except the selected memory cell, a potential generating circuit for generating a selected read potential which is supplied to the selected word line, and generating a non-selected read potential larger than the selected read potential, which is supplied to the non-selected word line, and a control circuit which classifies a threshold voltage of the selected memory cell to one of three groups by verifying which area among three area which are isolated by two values does a cell current of the selected memory cell belong, when the selected read potential is a first value.11-24-2011
20110299339NONVOLATILE SEMICONDUCTOR MEMORY, METHOD FOR READING OUT THEREOF, AND MEMORY CARD - A nonvolatile semiconductor memory includes: a memory cell unit including a plurality of memory cells having an electric charge accumulation layer and a control electrode, said memory cells being electrically connected in series; a plurality of word lines, each of which is electrically connected to said control electrode of said plurality of memory cells; a source line electrically connected to said memory cells at one end of said memory cell unit; a bit line electrically connected to said memory cells at the other end of said memory cell unit; and a control signal generation circuit, which during a data readout operation staggers a timing for selecting the word line connected to said memory cells of said memory cell unit from a timing for selecting a non-selected word line connected to a non-selected memory.12-08-2011
20110310667SEMICONDUCTOR MEMORY DEVICE - A semiconductor memory device includes a memory cell array including a plurality of blocks each including a memory cell unit, and a selection transistor which selects the memory cell unit, and a row decoder including a first block selector and a second block selector each of which includes a plurality of transfer transistors which are formed to correspond to the plurality of blocks and arranged adjacent to each other in a word-line direction wherein the diffusion layers are formed to oppose each other in the first block selector and the second block selector, and a width between the diffusion layers of the first block selector and the second block selector adjacent to each other in the word-line direction is made larger than a width between the diffusion layers in each of the first block selector and the second block selector adjacent to each other in the word-line direction.12-22-2011

Patent applications by Makoto Iwai, Yokohama-Shi JP

Makoto Iwai, Ichihari-Shi JP

Patent application numberDescriptionPublished
20110040000Bis [Tri (Hydroxypolyalkyleneoxy) Silylalkyl] Polysulfide, Method of Manufacturing Bis [Tri (Hydroxypolyalkyleneoxy) Silylalkyl] Polysulfide, Tire Rubber Additive, And Tire Rubber Composition - A bis[tri(hydroxypolyalkyleneoxy)silylalkyl] polysulfide, i.e., a polysulfide that contains bonded hydroxypolyalkyleneoxy groups instead of alkoxy groups in the bis(trialkoxysilylalkyl) polysulfide; a method of manufacturing of the aforementioned polysulfide by heating a bis(trialkoxysilylalkyl) polysulfide and a polyalkyleneglycol; a tire rubber additive to a tire rubber composition that comprises a bis[tri(hydroxypolyalkyleneoxy)silylalkyl] polysulfide alone or a mixture of bis[tri(hydroxypolyalkyleneoxy)silylalkyl] polysulfide and a polyalkyleneglycol; and a tire rubber composition that contains the aforementioned additive.02-17-2011

Makoto Iwai, Aichi JP

Patent application numberDescriptionPublished
20090155580Production Methods of Semiconductor Crystal and Semiconductor Substrate - To provide a semiconductor substrate of high quality suitable for fabricating an electronic device or an optical device. The present invention provides a method for producing a semiconductor substrate for an electronic device or an optical device, the method including reacting nitrogen (N) with gallium (Ga), aluminum (Al), or indium (In), which are group III elements, in a flux mixture containing a plurality of metal elements selected from among alkali metals and alkaline earth metals, to thereby grow a group III nitride based compound semiconductor crystal. The group III nitride based compound semiconductor crystal is grown while the flux mixture and the group III element are mixed under stirring. At least a portion of a base substrate on which the group III nitride based compound semiconductor crystal is grown is formed of a flux-soluble material, and the flux-soluble material is dissolved in the flux mixture, at a temperature near the growth temperature of the group III nitride based compound semiconductor crystal, during the course of growth of the semiconductor crystal or after completion of growth of the semiconductor crystal.06-18-2009
20090169444Apparatus for Producing Group III Nitride Based Compound Semiconductor - An object of the invention is to prevent, in the flux method, diffusion of substances that constitute the atmosphere of the outer vessel into the reactor.07-02-2009
20090173273Method and Apparatus for Producing Group III Nitride Based Compound Semiconductor - In the flux method, a source nitrogen gas is sufficiently heated before feeding to an Na—Ga mixture.07-09-2009
20100093157METHOD FOR PRODUCING GROUP III NITRIDE-BASED COMPOUND SEMICONDUCTOR CRYSTAL - A GaN single crystal 04-15-2010
20100301358Semiconductor Substrate, Electronic Device, Optical Device, and Production Methods Therefor - The present invention provides a method for producing a semiconductor substrate, the method including reacting nitrogen (N) with gallium (Ga), aluminum (Al), or indium (In), which are group III elements, in a flux mixture containing a plurality of metal elements selected from among alkali metals and alkaline earth metals, to thereby grow a group III nitride based compound semiconductor crystal. The group III nitride based compound semiconductor crystal is grown while the flux mixture and the group III element are mixed under stirring. At least a portion of a base substrate on which the group III nitride based compound semiconductor crystal is grown is formed of a flux-soluble material, and the flux-soluble material is dissolved in the flux mixture, at a temperature near the growth temperature of the group III nitride based compound semiconductor crystal, during the course of growth of the semiconductor crystal.12-02-2010

Makoto Iwai, Chiba JP

Patent application numberDescriptionPublished
20100120950Method for Manufacturing A Bis(Silatranylalkyl) Polysulfide, Method for Manufacturing a Mixture of Bis(Silatranylalkyl) Polysulfide etc., A Mixture of Bis(Silatranylalkyl) Polysulfide etc., and Rubber Composition - A method for manufacturing a bis(silatranylalkyl) polysulfide by heating a bis(trialkoxysilylalkyl) polysulfide and triethanolamine in the presence of a catalytic quantity of an alkali-metal alcoholate, thus substituting all Si-bonded alkoxy groups of the bis(trialkoxysilylalkyl) polysulfide with a (OCH05-13-2010
20100130764Method For Producing Ketimine Structure-Containing Alkoxysilane - A method for producing ketimine structure-containing alkoxysilane comprising reacting amino-functional alkoxysilane with a monocarbonyl compound by heating and azeotropically distilling off the produced water together with the monocarbonyl compound to yield ketimine structure-containing alkoxysilane, characterized by introducing additional monocarbonyl compound at the time of the azeotropic distillation of the produced water together with the monocarbonyl compound.05-27-2010
20110301375Organosilicon Compound And Method Of Producing Same - A hydrolyzable group-containing organosilicon compound is represented by the general formula12-08-2011

Patent applications by Makoto Iwai, Chiba JP

Makoto Iwai, Nagoya-Shi JP

Patent application numberDescriptionPublished
20090294909N-type group III nitride-based compound semiconductor and production method therefor - An object of the present invention is to realize, by the flux process, the production of a high-quality n-type semiconductor crystal having high concentration of electrons. The method of the invention for producing an n-type Group III nitride-based compound semiconductor by the flux process, the method including preparing a melt by melting at least a Group III element by use of a flux; supplying a nitrogen-containing gas to the melt; and growing an n-type Group III nitride-based compound semiconductor crystal on a seed crystal from the melt. In the method, carbon and germanium are dissolved in the melt, and germanium is incorporated as a donor into the semiconductor crystal, to thereby produce an n-type semiconductor crystal.12-03-2009

Makoto Iwai, Aichi-Pref JP

Patent application numberDescriptionPublished
20080271665Method for producing group III Nitride-based compound semiconductor - In the production of GaN through the flux method, deposition of miscellaneous crystals on the nitrogen-face of a GaN self-standing substrate and waste of raw materials are prevented. Four arrangements of crucibles and a GaN self-standing substrate are exemplified. In FIG. 11-06-2008

Makoto Iwai, Kanagawa-Ken JP

Patent application numberDescriptionPublished
20080266967NONVOLATILE SEMICONDUCTOR MEMORY - A semiconductor memory device comprising: a memory cell array having memory cell units each formed by connecting a plurality of memory cells; a first and a second select gate transistors, the first select gate transistor being connected between one end of the memory cell array and a common source line, the second select gate transistor being connected between the other end of the memory cell array and bit lines; word lines acting also as control gates of the memory cells; a first select gate voltage-generating circuit for generating a first select gate voltage; a second select gate-setting circuit for setting an instructed value of a second select gate voltage; a second select gate voltage-generating circuit for generating the second select gate voltage based on the set, instructed value; a first transfer circuit for transferring the first select gate voltage generated by the first select gate voltage-generating circuit to a second select gate; a discharging circuit for discharging the first select gate voltage transferred to the second select gate; and a discharging characteristics selection circuit for selecting discharging characteristics of the discharging circuit.10-30-2008
20110242902NONVOLATILE SEMICONDUCTOR MEMORY DEVICE - A nonvolatile semiconductor memory device includes: a memory cell array including a plurality of memory cells; a plurality of word lines each connected in common to memory cells arranged in a corresponding one of rows among the plurality of memory cells; a voltage generator including a clock signal cycle controller configured to lengthen a cycle of a clock signal every time writing is performed at a stepped-up program voltage to the memory cells connected to a word line selected from the word lines, the voltage generator being configured to generate a desired output voltage by using the clock signal, wherein the clock signal cycle controller performs control in such a way that a ramp up rate for writing at the stepped-up program voltage is kept substantially equal to a ramp up rate for writing at an initial program voltage.10-06-2011

Makoto Iwai, Aichi-Ken JP

Patent application numberDescriptionPublished
20080223286Method for producing a semiconductor crystal - Objects of the invention are to further enhance crystallinity and crystallinity uniformity of a semiconductor crystal produced through the flux method, and to effectively enhance the production yield of the semiconductor crystal. The c-axis of a seed crystal including a GaN single-crystal layer is aligned in a horizontal direction (y-axis direction), one a-axis of the seed crystal is aligned in the vertical direction, and one m-axis is aligned in the x-axis direction. Thus, three contact points at which a supporting tool contacts the seed crystal are present on m-plane. The supporting tool has two supporting members, which extend in the vertical direction. One supporting member has an end part, which is inclined at 30° with respect to the horizontal plane α. The reasons for supporting a seed crystal at m-plane thereof are that m-plane exhibits a crystal growth rate, which is lower than that of a-plane, and that desired crystal growth on c-plane is not inhibited. Actually, a plurality of seed crystals and supporting tools are periodically placed along the y-axis direction.09-18-2008

Makoto Iwai, Nagoya-City JP

Patent application numberDescriptionPublished
20080223288Crystal growing apparatus - An object of the invention is to carry out the flux method with improved work efficiency while maintaining the purity of flux at high level and saving flux material cost. The sodium-purifying apparatus includes a sodium-holding-and-management apparatus for maintaining purified sodium (Na) in a liquid state. Liquid sodium is supplied into a sodium-holding-and-management apparatus through a liquid-sodium supply piping maintained at 100° C. to 200° C. The sodium-holding-and-management apparatus further has an argon-gas-purifying apparatus for controlling the condition of argon (Ar) gas that fills the internal space thereof. Thus, by opening and closing a faucet at desired timing, purified liquid sodium (Na) supplied from the sodium-purifying apparatus can be introduced into a crucible as appropriate via the liquid-sodium supply piping, the sodium-holding-and-management apparatus, and the piping.09-18-2008

Makoto Iwai, Ichihara-Shi JP

Patent application numberDescriptionPublished
20120009412Curable Organopolysiloxane Composition And Porous Cured Organopolysiloxane Material - A curable organopolysiloxane composition comprising (A) an organopolysiloxane that contains at least two crosslinking reactive groups in each molecule, (B) a crosslinking agent, (C) a crosslinking catalyst, (D) a hollow filler having a true density of 0.001 to 3,000 g/cm01-12-2012