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| 20090096704 | Non-Cutoff Frequency Selective Surface Ground Plane Antenna Assembly - Described is an apparatus and method for reducing noise in an information bearing signal is provided. A feeding element receives dual-polarized wideband electromagnetic signals. The feeding element is coupled to a Non-Cutoff Frequency Selective Surface ground plane. The Non-Cutoff Frequency Selective Surface ground plane allows for a line-of-sight signal and a surface wave to cancel. The Non-Cutoff Frequency Selective Surface ground plane can be a metal plate with a plurality of corrugations. The corrugations can be concentric rings, each corrugation having a predetermined height and a predetermined spacing from adjacent corrugations. | 04-16-2009 |
| 20100258919 | SEMICONDUCTOR PATCH ANTENNA - A semiconductor patch antenna for microwave radiation having a wide pin-junction or pn-junction with the depletion region or embodiments having a separating buried oxide (SiO | 10-14-2010 |
| 20110006957 | METHOD AND APPARATUS FOR A HIGH-PERFORMANCE COMPACT VOLUMETRIC ANTENNA - A wide-bandwidth antenna (e.g., a rib-dipole antenna) includes a first pole formed by a first conductive member and/or a second pole formed by a second conductive member. The antenna also includes an antenna feed between the first conductive member and the second conductive member. The antenna also includes at least one electrically conductive element including a surface. A portion of the surface is electrically connected to, and extends from, the first conductive member or the second conductive member. The at least one electrically conductive element is capable of conducting a current that generates a magnetic field. The magnetic field lowers a total reactance of the antenna, thereby resulting in enhanced performance of the antenna and more efficient use of volume. | 01-13-2011 |
| 20110267252 | Non-Cutoff Frequency Selective Surface Ground Plane Antenna Assembly - Described is an apparatus and method for reducing noise in an information bearing signal is provided. A feeding element receives dual-polarized wideband electromagnetic signals. The feeding element is coupled to a Non-Cutoff Frequency Selective Surface ground plane. The Non-Cutoff Frequency Selective Surface ground plane allows for a line-of-sight signal and a surface wave to cancel. The Non-Cutoff Frequency Selective Surface ground plane can be a metal plate with a plurality of corrugations. The corrugations can be concentric rings, each corrugation having a predetermined height and a predetermined spacing from adjacent corrugations. | 11-03-2011 |
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| 20080263817 | Vacuum Cleaner with Ultraviolet Light Source and Ozone - The present disclosure provides a vacuum cleaner (A) including a nozzle base (C) having a main suction opening ( | 10-30-2008 |
| 20080282894 | CYCLONIC UTILITY VACUUM - A vacuum cleaner including multiple cleaning stages comprises a first cyclonic stage and a second cyclonic stage, which is spaced from the first cyclonic stage. A housing defines a first particle collector that communicates with the first cyclonic stage. The first particle collector includes an opening. A removable lid covers the first particle collector opening. A second particle collector in communication with the second cyclonic stage is removable with the lid. A suction motor is supported by the vacuum cleaner. The suction motor establishes and maintains a flow of air through the vacuum cleaner. | 11-20-2008 |
| 20080289139 | DUAL STAGE CYCLONIC VACUUM CLEANER - A home cleaning appliance comprises a housing, an airstream suction source, a cyclone main body, and a dirt cup. The housing includes a main suction opening. The airstream suction source is mounted to the housing and includes a suction airstream inlet and a suction airstream outlet. The suction source selectively establishes and maintains a flow of air from the main suction opening, via the airstream inlet, to the airstream outlet. The cyclone main body is supported by the housing and is in communication with the main suction opening. The cyclone main body has a uniform outer circumference and includes a first stage separator, and a plurality of downstream second stage separators. The first stage separator has a longitudinal axis offset from a longitudinal axis of the cyclone main body in order to accommodate the second stage separators. The dirt cup is connected to the cyclone main body. The dirt cup includes a first particle collector and a second particle collector. The first particle collector communicates with the first stage separator for collecting dust particles from the first stage separator. The separate second particle collector communicates with the plurality of second stage separators for collecting dust particles from the second stage separators. | 11-27-2008 |
| 20090031525 | Dual Stage Cyclone Vacuum Cleaner - The present disclosure provides a home cleaning appliance including a housing having a nozzle, which includes a main suction opening. An airstream suction source is mounted to the housing and includes a suction airstream inlet and a suction airstream outlet. A cyclone main body is mounted to the housing and communicates with the nozzle main suction opening. The cyclone main body includes a first stage separator and a plurality of second stage separators. A dirt cup is connected to the cyclone main body for collecting dust particles separated by the first stage separator and the plurality of second stage separators. An air manifold is mounted to the first stage separator for fluidly connecting the first stage separator to the plurality of second stage separators. | 02-05-2009 |
| 20100293740 | CLEANING MACHINE FOR CLEANING A SURFACE - A cleaning machine for cleaning a surface is provided. The cleaning machine includes a base assembly that moves along the surface and a liquid distribution system associated with the base assembly for distributing the cleaning solution to the cleaning surface. A suction nozzle assembly is mounted to the base assembly and includes a front nozzle portion and a rear nozzle portion. The front nozzle portion defines a fluid flow path having an inlet opening and an outlet opening and the rear nozzle portion defines a fluid flow path having an inlet opening and an outlet opening. A suction source is in fluid communication with the suction nozzle for applying suction to draw the cleaning solution and dirt from the surface and through the suction nozzle assembly. The fluid flow path of the front nozzle portion is closed in response to the base assembly moving in one of the forward direction and rear direction. The fluid flow path of the rear nozzle portion is closed in response to the base assembly moving in other one of the forward and rear direction. | 11-25-2010 |
| 20110185535 | TWIN CYCLONE VACUUM CLEANER - An upright vacuum cleaner includes a housing having a suction airstream inlet and a suction airstream outlet. A dirt container is selectively mounted to the housing for receiving and retaining dirt and dust separated from the suction airstream and includes a first cyclonic air-flow chamber and a second cyclonic airflow chamber. The chambers are spaced apart and are each approximately vertically oriented and arranged in a parallel relationship. An air manifold is disposed at a top portion of the dirt container. The air manifold includes an inlet section through which dirty air passes and an outlet section. The inlet section directs a flow of dirty air into two separate inlet conduits leading to a respective one of the first and second airflow chambers. The outlet section collects a flow of cleaned air from both of the chambers and merges the flow of cleaned air into a single outlet conduit. | 08-04-2011 |
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| 20100021973 | COMPOSITIONS AND METHODS FOR PROCESSING AND AMPLIFICATION OF DNA, INCLUDING USING MULTIPLE ENZYMES IN A SINGLE REACTION - The present invention concerns preparation of DNA molecules, such as a library, using a stem-loop oligonucleotide. In particular embodiments, the invention employs a single reaction mixture and conditions. In particular, at least part of the inverted palindrome is removed during the preparation of the molecules to facilitate amplification of the molecules. Thus, in specific embodiments, the DNA molecules are suitable for amplification and are not hindered by the presence of the palindrome. | 01-28-2010 |
| 20100145037 | DNA AMPLIFICATION AND SEQUENCING USING DNA MOLECULES GENERATED BY RANDOM FRAGMENTATION - The present invention is directed to methods to prepare a DNA molecule or a plurality of DNA molecules by random fragmentation. In some embodiments, the present invention regards preparing a template for DNA sequencing by random fragmentation. In specific embodiments, the random fragmentation comprises chemical fragmentation, mechanical fragmentation, or enzymatic fragmentation. In further specific embodiments, a universal sequence is attached to the 3′ end of the DNA fragments, such as by ligation of an adaptor sequence or by homopolymeric tailing with terminal deoxynucleotidyltransferase. In other embodiments, a library is prepared with methods of the present invention. | 06-10-2010 |
| 20110081685 | COMPOSITIONS AND METHODS FOR PROCESSING AND AMPLIFICATION OF DNA, INCLUDING USING MULTIPLE ENZYMES IN A SINGLE REACTION - The present invention concerns preparation of DNA molecules, such as a library, using a stem-loop oligonucleotide. In particular embodiments, the invention employs a single reaction mixture and conditions. In particular, at least part of the inverted palindrome is removed during the preparation of the molecules to facilitate amplification of the molecules. Thus, in specific embodiments, the DNA molecules are suitable for amplification and are not hindered by the presence of the palindrome. | 04-07-2011 |
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| 20100264111 | Enhanced Focused Ion Beam Etching of Dielectrics and Silicon - Silicon, silicon dielectrics and low-k dielectrics are etched in a focused ion beam process using gaseous fluorinating etchants selected from the group of triethylamine trihydrofluoride (TEATHF) and xenon fluoride. Xenon fluoride is combined with a secondary protecting agent to avoid undesired corrosion of bare silicon. The protecting agent may be an oxidizing agent such as oxygen, perfluorotripentylamine (PFTPA), or a heavy completely fluorinated hydrocarbon. | 10-21-2010 |
| 20110048929 | FIB Process for Selective and Clean Etching of Copper - Etch assisting agents for focused ion beam (FIB) etching of copper for circuit editing of integrated circuits both prevent loss of adjacent dielectric due to sputtering by the ion beam, and render sputtered re-deposited copper on adjacent surfaces non-conductive to avoid electrical short circuits. The agents comprise hydrazine and hydrazine derivatives compounds having an N—N (N being Nitrogen) bonding in their molecules, and boiling points between about 70° and 200° C. Preferred agents are either Hydrazine monohydrate or Nitrosodimethylamine, alone or in combination with Nitrogen Tetroxide, and are effective for etching copper in high aspect ratio (deep) holes. | 03-03-2011 |
| 20110048931 | FIB Process for Selective and Clean Etching of Copper - Etch assisting agents for focused ion beam (FIB) etching of copper for circuit editing of integrated circuits both prevent loss of adjacent dielectric due to sputtering by the ion beam, and render sputtered re-deposited copper on adjacent surfaces non-conductive to avoid electrical short circuits. The agents comprise hydrazine and hydrazine derivatives having an N—N(N being Nitrogen) bonding in their molecules and boiling points between about 70° and 220° C., and NitrosAmine derivatives saturated with two hydrocarbon groups selected from Methyl, Ethyl, Propyl and Butyl. Preferred agents are Hydrazine monohydrate (HMH), HydroxyEthylHydrazine (HEH), NDMA, NMEA, NDEA, NMPA, NEPA, NDPA, NMBA or NEBA, alone or in combination with Nitrogen Tetroxide. The agents are effective for etching copper in high aspect ratio (deep) holes. | 03-03-2011 |
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| 20090025641 | METHOD, SYSTEM, AND APPARATUS FOR THE GROWTH OF ON-AXIS SiC AND SIMILAR SEMICONDUCTOR MATERIALS - A novel approach for the growth of high-quality on-axis epitaxial silicon carbide (SiC) films and boules, using the Chemical Vapor Deposition (CVD) technique, is described here. The method includes a method of substrate preparation, which allows for the growth of “on-axis” SiC films, plus an approach giving the opportunity to grow silicon carbide on singular (a small-angle miscut) substrates, using halogenated carbon-containing precursors (carbon tetrachloride, CCl | 01-29-2009 |
| 20110283933 | METHOD, SYSTEM, AND APPARATUS FOR THE GROWTH OF SiC AND RELATED OR SIMILAR MATERIAL, BY CHEMICAL VAPOR DEPOSITION, USING PRECURSORS IN MODIFIED COLD-WALL REACTOR - An approach for the growth of high-quality epitaxial silicon carbide (SiC) films and boules, using the Chemical Vapor Deposition (CVD) technique is described here. The method comprises modifications in the design of the typical cold-wall CVD reactors, providing a better temperature uniformity in the reactor bulk and a low temperature gradient in the vicinity of the substrate, and an approach to increase the silicon carbide growth rate and to improve the quality of the growing layers, using halogenated carbon-containing precursors (carbon tetrachloride CCl | 11-24-2011 |
