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Majumdar, NY

Amlan Majumdar, Yorktown Heights, NY US

Patent application numberDescriptionPublished
20110049630Stressed Source/Drain CMOS and Method of Forming Same - A complementary metal-oxide semiconductor (CMOS) structure includes a substrate and a P-type field effect transistor (FET) and an N-type FET disposed adjacent to one another on the substrate. Each FET includes a silicon-on-insulator (SOI) region, a gate electrode disposed on the SOI region, a source stressor, and a drain stressor disposed across from the source stressor relative to the gate electrode, wherein proximities of the source stressor and the drain stressor to a channel of a respective FET are substantially equal.03-03-2011
20110073909REPLACEMENT SPACER FOR TUNNEL FETS - A semiconductor fabrication method includes depositing a dummy gate layer onto a substrate, patterning the dummy gate layer, depositing a hardmask layer over the dummy gate layer, patterning the hardmask layer, etching a recess into the substrate, adjacent the dummy gate layer, depositing a semiconductor material into the recess, removing the hardmask layer, depositing replacement spacers onto the dummy gate layer, performing an oxide deposition over the dummy gate layer and replacement spacers, removing the dummy gate and replacement spacers, thereby forming a gate recess in the oxide and depositing a gate stack into the recess.03-31-2011

Arnlan Majumdar, White Plains, NY US

Patent application numberDescriptionPublished
20090311836EXTREMELY-THIN SILICON-ON-INSULATOR TRANSISTOR WITH RAISED SOURCE/DRAIN - An extremely-thin silicon-on-insulator transistor is provided that includes a buried oxide layer above a substrate, a silicon layer above the buried oxide layer, a gate stack on the silicon layer, a nitride liner on the silicon layer and adjacent to the gate stack, an oxide liner on and adjacent to the nitride liner, and raised source/drain regions. The gate stack includes a high-k oxide layer on the silicon layer and a metal gate on the high-k oxide layer. Each of the raised source/drain regions has a first part comprising a portion of the silicon layer, a second part adjacent to parts of the oxide liner and the nitride liner, and a third part above the second part. Also provided is a method for fabricating an extremely-thin silicon-on-insulator transistor.12-17-2009

Gautam Majumdar, Wappingers Falls, NY US

Patent application numberDescriptionPublished
20080247887PRICING METHOD AND SYSTEM - A pricing method and system. The method includes receiving by a computing system data associated with a business. The data comprises a first list of negotiated pricing rates and associated skills, a second list of requesters, and a third list of suppliers. The computing system, receives business factors data. The computing system determines requester options with respect to the negotiated pricing rates. The requester options are dependent on the business factors data. The computing system determines supplier options with respect to the negotiated pricing rates. The supplier options are dependent on the business factors data. The computing system determines sourcing buyer authorization options with respect to suppliers and the negotiated pricing rates. The computing system generates a pricing report comprising the requester options, the supplier options, the sourcing buyer authorization options, and the business factors data.10-09-2008
20080300892MAPPING METHOD AND SYSTEM - A mapping method and system. The method includes receiving from a computing system, a selection of a first candidate skill from a list of candidate skills. The computing system receives a selection of a first work location of associated with a first skill. The computing system determines a first geographical location identifier identifying a first area comprising the first work location. The computing system determines a first work region comprising the first area and the first work location. The computing system selects a first group of suppliers associated the first work region. The computing system generates a candidate request document comprising the first candidate skill, the first work region, and the first work location. The computing system transmits to the first group of suppliers the candidate request document.12-04-2008
20080306748REQUEST MODIFICATION METHOD AND SYSTEM - A modification method and system. The method includes presenting by a computing system to a requester, templates associated with a candidate request. The computing system receives from the requester, first data associated with the candidate request. The computing system generates a request document comprising the first data. The computing system transmits the request document to at least one supplier. The computing system receives from the at least one supplier, a list of candidates. The computing system receives from the requester, a request for modifying the request document. The computing system generates in response to the request for modifying the request document, a modified request document comprising a modified version of the request document. The computing system receives from the requester, approval data approving a transmission of the modified request document.12-11-2008
20090006355GLOBAL RESOURCE METHOD AND SYSTEM - A global resource method and system. The method includes associating by a computing system, groups of suppliers with geographical areas. The computing system receives a selection of a first skill from a requester. The requester is located within a first geographical area. The computing system receives geographical area specification data associated with the first skill. The computing system receives a selection of a first work location associated with the first skill. The computing system receives a selection of a group of suppliers comprising a first supplier associated with the geographical area specification data. The computing system generates a service request document comprising the selection of said first skill. The computing system transmits the service request document to the group of suppliers.01-01-2009
20090083094RENEWAL METHOD AND SYSTEM - A renewal method and system. The method includes receiving, by a computing system from a requester, a selection of said first candidate from a list of candidates. The computing system retrieves a portion of candidate related data from an original request document for the candidate. The computing system receives from the requester, a selection of at least a one supplier from a list of suppliers. The computing system generates a first renewal request document associated with the first candidate. The first renewal request document includes the portion of the candidate related data from the original request document. The first renewal request document is for first renewing an association between a first company and the first candidate. The computing system transmits the first renewal request document to the at least one supplier.03-26-2009