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| 20100039629 | METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument. | 02-18-2010 |
| 20100103400 | ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system of a microlithographic projection exposure apparatus comprises a pupil surface and an arrangement of individually drivable beam deviating elements. Each beam deviating element is configured to direct light impinging thereon onto different positions on the pupil surface in response to a control signal applied to the beam deviating element. According to the disclosure an attenuation unit is provided which is configured to reduce the intensity of light, which is directed by any arbitrary beam deviating element (onto the pupil surface, by more than 50%. This makes it possible to reduce the intensity of light in the pupil surface that has been reflected by defective beam deviating elements. | 04-29-2010 |
| 20100157268 | ILLUMINATION SYSTEM OF A MICROLOTHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system of a microlithographic projection exposure apparatus includes a beam deflection array including a number beam deflection elements, for example mirrors. Each beam deflection element is adapted to deflect an impinging light beam by a deflection angle that is variable in response to control signals. The light beams reflected from the beam deflection elements produce spots in a system pupil surface. The number of spots illuminated in the system pupil surface during an exposure process, during which a mask is imaged on a light sensitive surface, is greater than the number of beam deflection elements. This may be accomplished with the help of a beam multiplier unit that multiplies the light beams reflected from the beam deflection elements. In another embodiment the beam deflecting elements are controlled such that the irradiance distribution produced in the system pupil surface changes between two consecutive light pulses of an exposure process. | 06-24-2010 |
| 20100277708 | ILLUMINATION SYSTEM OF A MICROLOTHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system of a microlithographic projection exposure apparatus includes a beam deflection array including a number beam deflection elements, for example mirrors. Each beam deflection element is adapted to deflect an impinging light beam by a deflection angle that is variable in response to control signals. The light beams reflected from the beam deflection elements produce spots in a system pupil surface. The number of spots illuminated in the system pupil surface during an exposure process, during which a mask is imaged on a light sensitive surface, is greater than the number of beam deflection elements. This may be accomplished with the help of a beam multiplier unit that multiplies the light beams reflected from the beam deflection elements. In another embodiment the beam deflecting elements are controlled such that the irradiance distribution produced in the system pupil surface changes between two consecutive light pulses of an exposure process. | 11-04-2010 |
| 20110012010 | ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system for illuminating a mask in a microlithographic projection exposure apparatus includes an array of mirrors or other beam deflecting elements. Each beam deflecting element produces on the surface a projection light spot at a position that is variable by changing a deflection angle produced by the beam deflecting element. A spot shape measuring unit measures the shapes of spots which are produced on the spot measuring unit by the beam deflecting elements. The spot shape measuring unit is arranged outside of every possible path projection light is allowed to take between the array and the mask. A control unit controls the beam deflecting elements such that, at a given instant during an exposure operation of the apparatus, at least one beam deflecting element directs projection light exclusively on the spot shape measuring unit, and at least some beam deflecting elements direct projection light exclusively on the surface. | 01-20-2011 |
| 20120002185 | MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A microlithographic projection exposure apparatus includes an optical surface, which may be formed by a plurality of micro-mirrors, and a measurement device which is configured to measure a parameter related to the optical surface at a plurality of locations. The measurement device includes an illumination unit with a plurality of illumination members, each having a light exit facet. An optical imaging system establishes an imaging relationship between an object plane in which at least two light exit facets are arranged, and an image plane which at least substantially coincides with the optical surface. A detector unit measures the property of measuring light after it has interacted with the optical surface, and an evaluation unit determines the surface related parameter for each of the locations on the basis of the properties determined by the detector unit. | 01-05-2012 |
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| 20110179465 | APPARATUS, AND AN ASSOCIATED METHOD, FOR FACILITATING SECURE OPERATIONS OF A WIRELESS DEVICE - An apparatus, and an associated method, facilitates security at a wireless device, such as a wireless device comprising a mobile computing platform. A security decision engine is provided that monitors for an event necessitating a security decision. When a security decision is required, request is made of a knowledge fetcher, provided by a trusted third-party, installed at the wireless device for the security decision. The knowledge fetcher obtains the security decision, such as by obtaining the security decision from a remote, trusted third-party server, and provides the security decision to the decision engine. Use is made of the security decision pursuant to a setting for which the security decision is needed. | 07-21-2011 |
| 20110179468 | APPARATUS, AND AN ASSOCIATED METHOD, FOR FACILITATING SECURE OPERATIONS OF A WIRELESS DEVICE - An apparatus, and an associated method, facilitates security relating to installation of, such as downloading of, and application at a wireless device. When selection is made to install the application, a security decision is required of a trusted, third-party to install the application. A request is made of a trusted, third-party entity for the security decision. Responsive to the security decision, the application is either allowed to be downloaded to the wireless device or prohibited from being downloaded to the wireless device. | 07-21-2011 |
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| 20090318668 | Water-Soluble CC-1065 Analogs and Their Conjugates - This invention relates to novel analogs of the DNA-binding alkylating agent CC-1065 and to their conjugates. Furthermore this invention concerns intermediates for the preparation of said agents and their conjugates. The conjugates are designed to release their (multiple) payload after one or more activation steps and/or at a rate and time span controlled by the conjugate in order to selectively deliver and/or controllably release one or more of said DNA alkylating agents. The agents, conjugates, and intermediates can be used to treat an illness that is characterized by undesired (cell) proliferation. As an example, the agents and the conjugates of this invention may be used to treat a tumor. | 12-24-2009 |
| 20110163258 | MIXTURES OF ALKALI METAL POLYSULFIDES - The present invention relates to mixtures of alkali metal polysulfides and to mixtures of alkali metal polysulfides and alkali metal thiocyanates, to processes for preparation thereof, to the use thereof as heat transfer or heat storage fluids, and to heat transfer or heat storage fluids which comprise the mixtures of alkali metal polysulfides or the mixtures of alkali metal polysulfides and alkali metal thiocyanates. | 07-07-2011 |
| 20110247606 | FLUID SULFUR WITH IMPROVED VISCOSITY AS A HEAT CARRIER - Mixture comprising elemental sulfur and an additive comprising anions. | 10-13-2011 |
| 20110271953 | DEVICE AND METHOD FOR STORING HEAT - The invention relates to a device for storing heat, comprising a heat storage medium which absorbs heat in order to store heat and releases heat in order to use the stored heat, and a container for holding the heat storage medium, the container being closed by a gastight cover, and the device comprising volume compensation means in order to compensate for a volume increase of the heat storage medium ( | 11-10-2011 |
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| 20100288983 | PROCESS FOR POLING A FERROELECTRIC MATERIAL DOPED WITH A METAL - A process for poling a ferroelectric material doped with a metal, which process comprises: (i) defining an electrode pattern on a −z face of a crystal of the ferroelectric material doped with the metal; (ii) providing an electrode material; (iii) poling at a temperature of not more than 45° C.; and (iv) poling by a two-stage voltage-controlled application of electric field based on a first poling stage of domain nucleation and a second poling stage of domain spreading. | 11-18-2010 |
| 20110032597 | ELECTRIC FIELD POLING OF FERROELECTRIC MATERIALS - A method of inducing a periodic variation of nonlinearity value in a sample of ferroelectric material comprises arranging a pair of electrodes on opposite faces of the sample, one electrode defining a desired pattern of nonlinearity variation, applying a pre-bias voltage across the sample for a predetermined time using the electrodes, the pre-bias voltage being less than the coercive field of the ferroelectric material; and after the predetermined time, applying a current-controlled poling voltage across the sample using the electrodes, to produce domain inversion in the sample according to the desired pattern of nonlinearity variation. The pre-bias voltage may be 75% of the coercive field or more, and applied for a pre-determined time between 1 and 100 seconds. | 02-10-2011 |
| 20110063719 | COMPENSATION FOR THE GOUY PHASE SHIFT IN QUASI-PHASE MATCHING - A sample of nonlinear optical material for use in a nonlinear optical device contains a grating comprising alternating regions of inverted and non-inverted nonlinear coefficient of the material, with the regions separated by boundaries positioned such that the grating can provide quasi-phase matching of a selected nonlinear optical interaction, and compensate for phase mismatch arising from the Gouy phase shift of one or more focused optical beams involved in the interaction. The boundary positions can be calculated for second harmonic generation or optical parametric generation and oscillation. | 03-17-2011 |
