| Patent application number | Description | Published |
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| 20100214356 | RECORDING HEAD CLEANING APPARATUS, IMAGE RECORDING APPARATUS AND RECORDING HEAD CLEANING METHOD - The recording head cleaning apparatus cleans a nozzle surface of a recording head that is disposed at an inclination with respect to horizontal. The recording head cleaning apparatus includes: an application roller having a substantially conical shape of which a circumferential surface holds cleaning liquid and has an inclination corresponding to the inclination of the nozzle surface, an axis of the substantially conical shape being a rotational axis of the application roller; and a rotating device which rotates the application roller on the rotational axis to apply the cleaning liquid to the nozzle surface while not making the application roller in contact with the nozzle surface. | 08-26-2010 |
| 20100214357 | INKJET HEAD CLEANING APPARATUS, IMAGE RECORDING APPARATUS AND INKJET HEAD CLEANING METHOD - The inkjet head cleaning apparatus includes: a cleaning liquid application device including a cleaning liquid nozzle which applies cleaning liquid to a liquid ejection surface of an inkjet head; a cleaning liquid supply device which supplies the cleaning liquid to the cleaning liquid nozzle; and a flow speed adjustment device which adjusts a flow speed of the cleaning liquid supplied from the cleaning liquid supply device to the cleaning liquid nozzle in such a manner that a pillar of the cleaning liquid emitted from the cleaning liquid nozzle makes contact with the nozzle surface of the inkjet head. | 08-26-2010 |
| 20100245463 | INKJET HEAD CLEANING APPARATUS, IMAGE RECORDING APPARATUS AND INKJET HEAD CLEANING METHOD - The inkjet head cleaning apparatus includes: cleaning liquid nozzles through which cleaning liquid is applied to a liquid ejection surface of an inkjet head in which the liquid ejection surface is oblique to horizontal, the cleaning liquid nozzles being arranged in a cleaning liquid emission surface arranged with an inclination so as to face the liquid ejection surface, the cleaning liquid nozzles being arranged in a line substantially parallel with a direction of the inclination of the cleaning liquid emission surface; and a pressure application device which applies pressure to the cleaning liquid to be emitted through the cleaning liquid nozzles, wherein the pressure applied by the pressure application device to the cleaning liquid supplied to the cleaning liquid nozzles on an upper side is greater than the pressure applied by the pressure application device to the cleaning liquid supplied to the cleaning liquid nozzles on a lower side. | 09-30-2010 |
| 20100245464 | INKJET HEAD CLEANING APPARATUS, IMAGE RECORDING APPARATUS AND INKJET HEAD CLEANING METHOD - The inkjet head cleaning apparatus includes: a cleaning liquid holding device having a cleaning liquid holding surface with which cleaning liquid is held and applied to a liquid ejection surface of an inkjet head in which the liquid ejection surface is oblique to a horizontal plane, the cleaning liquid holding surface being arranged with an inclination such that the cleaning liquid holding surface is substantially parallel with the liquid ejection surface of the inkjet head and faces the liquid ejection surface at a prescribed distance from the liquid ejection surface; and a cleaning liquid supply device which has a cleaning liquid supply port through which the cleaning liquid is supplied from an upper portion of the inclined cleaning liquid holding surface in such a manner that the cleaning liquid slides down the inclined cleaning liquid holding surface while forming a meniscus between the cleaning liquid holding surface and the liquid ejection surface. | 09-30-2010 |
| 20110074870 | LIQUID EJECTION HEAD CLEANING APPARATUS AND IMAGE RECORDING APARATUS - The liquid ejection head cleaning apparatus includes: a cleaning liquid deposition device which spouts cleaning liquid from a plurality of cleaning liquid nozzles and deposits the cleaning liquid onto an ejection surface of a liquid ejection head; a cleaning liquid supply device which supplies the cleaning liquid to the cleaning liquid nozzles by using a liquid head differential with respect to the cleaning liquid deposition device; a temperature measurement device which measures an ambient temperature around the cleaning liquid supply device; and a pressure control device which controls a pressure of the cleaning liquid supplied to the cleaning liquid deposition device from the cleaning liquid supply device in accordance with the ambient temperature measured by the temperature measurement device. | 03-31-2011 |
| 20120038707 | NOZZLE SURFACE CLEANING APPARATUS AND DROPLET EJECTION APPARATUS - A nozzle surface cleaning apparatus is configured to clean a nozzle surface of a droplet ejection head while moving relatively with respect to the droplet ejection head. The apparatus includes: a cleaning liquid deposition device which deposits cleaning liquid to the nozzle surface; a blade which is pressed against the nozzle surface to wipe the nozzle surface; a drip guiding member which guides waste liquid wiped by the blade to drip to a predetermined drip position set inside of the blade than an end of the blade; and a receptor which receives the waste liquid dripping from the drip guiding member. | 02-16-2012 |
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| 20090068353 | METHOD FOR MANUFACTURING ORGANIC RESIN-COATED METAL SHEET AND APPARATUS OF MANUFACTURING ORGANIC RESIN-COATED METAL SHEET - The present invention provides particularly, in a method of manufacturing an organic resin-coated metal sheet by an extrusion lamination method, a method of removing an oligomer adhered to a roll with which a heat molten resin comes into contact while removing an oligomer and an apparatus of manufacturing an organic resin-coated metal sheet. In a manufacturing method of an organic-resin coated metal sheet which includes the steps of: continuously extruding an organic resin in a molten state by heating from a T-die in a film shape onto an elongated strip-shaped metal sheet; dropping a molten resin on pre-rolls arranged between the T-die and lamination rolls and bringing the molten resin into contact with the pre-rolls; and pressing the molten resin and the metal sheet by lamination rolls thus manufacturing the organic-resin coated metal sheet, an oligomer removing method is characterized in that electric conductive bodies are arranged parallel to the widthwise direction of the pre-rolls, and the molten resin is dropped onto the pre-rolls in a state that an electric current is supplied to the electric conductive bodies at predetermined intervals thus bringing the molten resin into contact with surfaces of the pre-rolls by electrostatic pinning whereby an oligomer adhered to the pre-rolls is transferred to a surface of the molten resin and is removed. | 03-12-2009 |
| 20090283200 | MANUFACTURING METHOD AND APPARATUS OF ORGANIC RESIN COATED METAL SHEET - [Problem] The present invention provides a manufacturing method and apparatus of an organic resin coated metal sheet which can surely remove resin portions projecting from both edges of a metal sheet. | 11-19-2009 |
| 20100224314 | LAMINATING ROLL, APPARATUS FOR PRODUCING METAL SHEET COATED WITH ORGANIC RESIN, AND PROCESS FOR PRODUCING METAL SHEET COATED WITH ORGANIC RESIN - The present invention aims at the continuous and stable production of an organic-resin-coated metal sheet in producing the organic-resin-coated metal sheet by an extrusion method using a laminating roll which can prevent resin portions (ear portions) protruding from the metal sheet being wound around shaft portions of the laminating roll. Using a laminating roll in which a width (A) of a region thereof coated with a lining material satisfies a relationship of 0≦A−B≦20 mm with respect to a width (B) of the metal sheet, a thermally melted organic resin is extruded and is applied to the metal sheet such that end portions of the organic resin in the widthwise direction protrude from outer portions of the laminating roll applied with the lining material, and the resin portions in a semi-molten state which protrude from respective edges of the metal sheet are removed by press-cutting. | 09-09-2010 |
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| 20080305940 | TITANIA-DOPED QUARTZ GLASS FOR NANOIMPRINT MOLDS - In the nanoimprint lithography, titania-doped quartz glass having an internal transmittance distribution of up to 10% at wavelength 365 nm is suited for use as nanoimprint molds. | 12-11-2008 |
| 20080305941 | TITANIA-DOPED QUARTZ GLASS FOR NANOIMPRINT MOLDS - In the nanoimprint lithography, a titania-doped quartz glass having a CTE of −300 to 300 ppb/° C. between 0° C. and 250° C. and a CTE distribution of up to 100 ppb/° C. at 25° C. is suited for use as nanoimprint molds. | 12-11-2008 |
| 20090288448 | TITANIA-DOPED QUARTZ GLASS AND MAKING METHOD, EUV LITHOGRAPHIC MEMBER AND PHOTOMASK SUBSTRATE - A titania-doped quartz glass containing 3-12 wt % of titania at a titania concentration gradient less than or equal to 0.01 wt %/μm and having an apparent transmittance to 440 nm wavelength light of at least 30% at a thickness of 6.35 mm is of such homogeneity that it provides a high surface accuracy as required for EUV lithographic members, typically EUV lithographic photomask substrates. | 11-26-2009 |
| 20100003609 | TITANIA-DOPED QUARTZ GLASS MEMBER AND MAKING METHOD - In a titania-doped quartz glass member having a surface where EUV light of up to 70 nm wavelength is reflected, a refractive index distribution in the surface has only one extreme point within a central 80% region of the member. The titania-doped quartz glass member has a surface with a high level of precision and thus can be formed into an EUV lithography photomask substrate which is improved in flatness and thermal expansion properties. | 01-07-2010 |
| 20100180634 | METHOD OF PRODUCING SYNTHETIC QUARTZ GLASS FOR EXCIMER LASER - Disclosed is a method of producing a synthetic quartz glass for excimer laser by depositing on a target silica particulates obtained by subjecting a silica raw material to vapor-phase hydrolysis or oxidative decomposition in an oxyhydrogen flame in a vacuum sintering furnace to form a porous silica base material, vitrifying the porous silica base material, and subjecting the vitrified material to hot forming, an annealing treatment and a hydrogen doping treatment, wherein the vitrification of the porous silica base material includes: (a) a step of holding a vacuum pressure at or below 20.0 Pa in a temperature range from 400° C., inclusive, to 900° C., exclusive; (b) a step of holding a vacuum pressure at or below 10.0 Pa in a temperature range from 900° C., inclusive, to 1100° C., exclusive; and (c) a step of holding a vacuum pressure at or below 3.0 Pa in a temperature range from 1100° C. to a transparent-vitrification temperature. | 07-22-2010 |
| 20110117480 | TITANIA AND SULFUR CO-DOPED QUARTZ GLASS MEMBER AND MAKING METHOD - A titania and sulfur co-doped quartz glass member is provided. Due to co-doping of titania and sulfur, the quartz glass member undergoes zero expansion at a certain temperature and low thermal expansion over a wide temperature range, and is thus suited for use in a commercial EUV lithography tool. A manufacturing method and an optical member for EUV lithography are also provided. | 05-19-2011 |
| 20110159413 | TITANIA-DOPED QUARTZ GLASS AND MAKING METHOD - A titania-doped quartz glass which experiences a reduction in OH group concentration of less than or equal to 100 ppm upon heat treatment at 900° C. for 100 hours is suitable as the EUV lithography member. | 06-30-2011 |
| 20120058419 | TITANIA-DOPED QUARTZ GLASS AND MAKING METHOD - A titania-doped quartz glass suited as an EUV lithographic member is prepared by feeding a silicon-providing reactant gas and a titanium-providing reactant gas through a burner along with hydrogen and oxygen, subjecting the reactant gases to oxidation or flame hydrolysis to form synthetic silica-titania fine particles, depositing the particles on a rotating target, and concurrently melting and vitrifying the deposited particles to grow an ingot of titania-doped quartz glass. The target is retracted such that the growth front of the ingot may be spaced a distance of at least 250 mm from the burner tip. | 03-08-2012 |
| 20120104336 | TITANIA-DOPED QUARTZ GLASS MEMBER AND MAKING METHOD - In a titania-doped quartz glass member having a surface where EUV light of up to 70 nm wavelength is reflected, a refractive index distribution in the surface has only one extreme point within a central 80% region of the member. The titania-doped quartz glass member has a surface with a high level of precision and thus can be formed into an EUV lithography photomask substrate which is improved in flatness and thermal expansion properties. | 05-03-2012 |
