Maemori
Akinori Maemori, Kakogawa JP
Patent application number | Description | Published |
---|---|---|
20100033268 | PIEZOELECTRIC RESONATOR DEVICE - A piezoelectric resonator device includes a metal base through which at least two metal lead terminals are erected via an insulating material, a piezoelectric resonator plate that is placed on the metal lead terminals and is electrically connected to the metal lead terminals via an electroconductive resin adhesive, and a metal lid that hermetically covers the piezoelectric resonator plate placed on the metal lead terminals. | 02-11-2010 |
Jun Maemori, Gunma JP
Patent application number | Description | Published |
---|---|---|
20100288815 | STAPLER | 11-18-2010 |
Jun Maemori, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20090159637 | STAPLER HAVING POWER MUTLIPLYING MECHANISM - A stapler includes a base, a first support portion disposed on the base, a support plate formed in the vicinity of the first support portion on each side of the base, a second support portion formed on the support portion so as to project therefrom, a staple storing magazine and an inner handle, both provided swingably on the first support portion, a driver plate disposed on the inner handle so as to strike out a staple, and an outer handle provided swingably on the second support portion. The outer handle includes a first handle member having a first half hole portion engageable with an upper portion of the two second support portion, and a second handle member having a second half hole portion engageable with a lower portion of the second support portion. The first handle member and the second handle member are connected integrally. | 06-25-2009 |
20090272781 | STAPLER - A stapler has a handle formed in a U-shape and a driver unit that is attached to a front end of the handle and a magazine that stores staples therein. The driver unit includes a driver plate fixed to a front portion of a driver holder. A rear portion of the handle and a rear portion of the magazine are concentrically and pivotally connected. Arms, each protruding from respective sides of the driver holder, are movably inserted into respective engaging holes formed on each of the side plates of the handle. When the handle is initially pushed down, rear upper parts of the driver holder come in contact with an upper inner surface of the handle so that a leading end of the driver plate is inclined toward a front side of the magazine. | 11-05-2009 |
20100059569 | STAPLER - A stapler includes a base, a magazine part rotatably supported by a rear end portion of the base, a handle part configured to strike the staple, and a clincher part provided on a front portion of the base to fold legs of the staple which has been struck. A width of a clincher groove in a front and rear direction is larger than a width of a side face of the staple. A bottom face of the clincher groove includes a flat face section provided on a rear side in the front and rear direction and an slope face section provided on a front side. The flat face section is substantially perpendicular to a direction in which staple is struck, and the slope face section is inclined such that a front side of the slope face section is higher than the rear side of the slope face section. | 03-11-2010 |
Satoshi Maemori, Kawasaki-Shi JP
Patent application number | Description | Published |
---|---|---|
20100151395 | Protective film-removing solvent and method of photoresist patterning with it - Disclosed are a protective film-removing solvent for re-moving a protective film laminated on a photoresist film, which contains at least a hydrofluoroether; and a method of photoresist patterning in liquid immersion lithography, using the protective film-removing solvent. | 06-17-2010 |
20120196226 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition including a base component (A), which exhibits changed solubility in a developing solution under the action of acid and can be used in a lithography process that employs light having a wavelength of 193 nm or less as the exposure light source, an acid generator component (B) which generates acid upon exposure, and a polymeric compound (C) having a structural unit (c0) represented by general formula (c0) shown below, wherein the amount of the polymeric compound (C) is less than 25 parts by mass relative to 100 parts by mass of the base component (A). | 08-02-2012 |
Satoshi Maemori, Kanagawa JP
Patent application number | Description | Published |
---|---|---|
20100129758 | Resist surface modifying liquid, and method for formation of resist pattern using the same - Provided are: a resist surface modifying liquid which is used as a surface treatment liquid of a resist film prior to a post exposure baking (PEB) step, and which can inhibit occurrence of defects of the resist film by reducing water repellency; and a method for forming a resist pattern using the same. A resist surface modifying liquid which is used as a surface treatment liquid prior to a post exposure baking (PEB) step of a resist film, the resist surface modifying liquid containing an acidic compound, and at least one of an alcohol-based solvent represented by a certain general formula and an ether-based solvent represented by a certain general formula. | 05-27-2010 |