Patent application number | Description | Published |
20100152475 | PROCESS FOR CONTINUOUSLY PRODUCING GEOMETRIC SHAPED CATALYST BODIES K - A process for producing geometric shaped catalyst bodies K whose active material is a multielement oxide which comprises the element Mo, the elements Bi and/or V and one or more of the elements Co, Ni, Fe, Cu and alkali metals, in which sources of the different elements are used to obtain a finely divided mixture which is coarsened to a powder by press agglomeration, the coarsened powder is used to form, by press agglomeration, shaped bodies V which are separated into undamaged shaped bodies V | 06-17-2010 |
20130006009 | PROCESS FOR CONTINUOUSLY PRODUCING GEOMETRIC SHAPED CATALYST BODIES K - A process for producing geometric shaped catalyst bodies K whose active material is a multielement oxide which comprises the element Mo, the elements Bi and/or V and one or more of the elements Co, Ni, Fe, Cu and alkali metals, in which sources of the different elements are used to obtain a finely divided mixture which is coarsened to a powder by press agglomeration, the coarsened powder is used to form, by press agglomeration, shaped bodies V which are separated into undamaged shaped bodies V | 01-03-2013 |
Patent application number | Description | Published |
20110130596 | PROCESS FOR PREPARING (METH)ACROLEIN BY HETEROGENEOUSLY CATALYZED GAS PHASE PARTIAL OXIDATION - A process for preparing (meth)acrolein by heterogeneously catalyzed gas phase partial oxidation of a precursor compound, in which the reaction gas mixture which comprises at least 3% by volume of precursor compound is passed through a fresh fixed catalyst bed whose active material is a multielement oxide which comprises the elements Mo, Fe and Bi and at least one of the elements Ni and Co, and the fixed catalyst bed is loaded with at least 40 l (STP)/l·h of precursor compound, and the precursor compound is converted to an extent of at least 90 mol %, wherein, over the first 8000 operating hours, during X=10 to 500 operating hours, the highest temperature of the reaction gas mixture in the fixed catalyst bed is 400 to 450° C. and, during the remaining 8000−X operating hours, is 300 to <400° C., and the loading of the fixed catalyst bed with organic precursor compound, averaged over the time, for the X=10 to 500 operating hours is greater than for the 8000−X operating hours. | 06-02-2011 |
20110275856 | EGGSHELL CATALYST CONSISTING OF A HOLLOW CYLINDRICAL SUPPORT BODY AND A CATALYTICALLY ACTIVE OXIDE MATERIAL APPLIED TO THE OUTER SURFACE OF THE SUPPORT BODY - An eggshell catalyst consisting of a hollow cylindrical support body of length 2 to 10 mm, external diameter 4 to 10 mm and wall thickness 1 to 4 mm, and an eggshell, applied to the outer surface of the support body, of catalytically active oxide material of the general formula I, | 11-10-2011 |
20120095267 | PROCESS FOR LONG-TERM OPERATION OF A HETEROGENEOUSLY CATALYZED PARTIAL GAS PHASE OXIDATION OF PROPENE TO ACROLEIN - A process for long-term operation of a heterogeneously catalyzed partial gas phase oxidation of propene to acrolein, in which the propene present in the reaction gas input mixture is partially oxidized as this gas mixture passes through the fixed catalyst bed which is accommodated in two spatially successive temperature zones A, B, and, in long-term operation, as a measure to counteract the reduction in the quality of the fixed catalyst bed, the temperature of at least one of the two temperature zones is increased such that the difference T | 04-19-2012 |
20130023699 | MO-, BI- AND FE-COMPRISING MULTIMETAL OXIDE COMPOSITIONS - Mo-, Bi- and Fe-comprising multimetal oxide compositions of the general stoichiometry I, | 01-24-2013 |
20140221683 | PROCESS FOR PRODUCING A CATALYTICALLY ACTIVE COMPOSITION BEING A MIXTURE OF A MULTIELEMENT OXIDE COMPRISING THE ELEMENTS MO AND V AND AT LEAST ONE OXIDE OF MOLYBDENUM - A process for producing a catalytically active composition being a mixture of a multielement oxide comprising the elements Mo and V and at least one oxide of molybdenum, in which spray drying of an aqueous solution or of an aqueous suspension of starting compounds comprising the elements of the multielement oxide produces a spray powder P, a pulverulent oxide of molybdenum and optionally shaping assistants are added thereto, shaped bodies are shaped from the resulting mixture and these are converted to the catalytically active composition by thermal treatment. | 08-07-2014 |
Patent application number | Description | Published |
20100233600 | LEVEL SENSOR ARRANGEMENT FOR LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A level sensor arrangement is useable for measuring a height of a surface of a substrate in a lithographic apparatus. The level sensor arrangement is provided with a light source emitting detection radiation towards the substrate, and a detector unit for measuring radiation reflected from the substrate in operation. The light source is arranged to emit detection radiation in a wavelength range in which a resist to be used for processing the substrate in the lithographic apparatus is sensitive. | 09-16-2010 |
20120013879 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - The invention provides a level sensor configured to determine a height level of a surface of a substrate supported on a movable substrate support, the level sensor including multiple projection units, multiple detection units, and a processing unit to calculate a height level for each of a plurality of measurement locations on the basis of the measurement beams from the projection units, wherein the level sensor is configured to measure height levels simultaneously at multiple measurement locations on the substrate, wherein the substrate support is configured to move the substrate in a first direction substantially parallel to the surface of the substrate to measure a height level at different locations on the substrate, and wherein at least part of the multiple measurement locations are at least spaced in a second direction that is substantially parallel to the surface of the substrate and perpendicular to the first direction. | 01-19-2012 |
20120242969 | LITHOGRAPHIC APPARATUS - A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame. | 09-27-2012 |
20130077079 | LEVEL SENSOR, LITHOGRAPHIC APPARATUS, AND SUBSTRATE SURFACE POSITIONING METHOD - A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit. | 03-28-2013 |
20130128247 | Level Sensor, a Method for Determining a Height Map of a Substrate, and a Lithographic Apparatus - The invention provides a level sensor configured to determine a height level of a surface of a substrate, comprising a detection unit arranged to receive a measurement beam after reflection on the substrate, wherein the detection unit comprises an array of detection elements, wherein each detection element is arranged to receive a part of the measurement beam reflected on a measurement subarea of the measurement area, and is configured to provide a measurement signal based on the part of the measurement beam received by the respective detection element, and wherein the processing unit is configured to calculate, in dependence of a selected resolution at the measurement subarea, a height level of the measurement subarea, or to calculate a height level of a combination of multiple measurement subareas. | 05-23-2013 |
20140022527 | LITHOGRAPHIC APPARATUS - A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame. | 01-23-2014 |