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| 20080198153 | Method and Apparatus of Generating or Reconstructing Display Streams in Video Interface Systems - A method and system for reading data from a link buffer for output to a display device. A link buffer read period is determined which balances a write throughput over a source video frame time and a read throughput over a display frame time. A threshold is determined indicating a required number of pixels stored in a link buffer prior to starting to read data out of the link buffer for a next line display. A read signal is issued when the link buffer read period ends and the threshold is reached. | 08-21-2008 |
| 20090279473 | LINK TRAINING SCHEME FOR DISPLAYPORT SOURCE REPEATERS - A system and a method for configuring communication between a source device and a sink device using captured configuration data are described. The source device communicates with a repeater, which modifies received data to facilitate transmission to the sink device, using a communication channel. The communication channel transmits video and/or audio data from the source device to the sink device. An auxiliary communication channel is used to communicate configuration data between the source device and sink device to optimize transmission and receipt of data through the communication channel. The repeater is coupled to the auxiliary communication channel and passively captures configuration data from the auxiliary communication channel. The repeater uses a subset of the captured configuration data (e.g., data rate, voltage swing, pre-emphasis, etc.) to modify how the repeater transmits data to the sink device using the communication channel. | 11-12-2009 |
| 20110134330 | FAST SWITCHING FOR MULTIMEDIA INTERFACE SYSTEM HAVING CONTENT PROTECTION - A system and a method are disclosed for enabling fast switching in a multimedia interface system having content protection. By using a partial port receiver to decode a portion of the input at input ports that are not being output to a multimedia sink, the design of the switching system is simplified and silicon costs are reduced. Additionally, the switching system and method reduces the switching delay by maintaining content protection signaling with all of the input ports. This eliminates the need for re-authentication when a new multimedia source is selected. | 06-09-2011 |
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| 20080212766 | Stateless gateways having remote dialog store - Gateway apparatus for facilitating communications using a stateful protocol (e.g., SIP or SIP/SIMPLE protocol). The gateway apparatus includes a plurality of gateway devices and a remote dialog store, wherein each of the plurality of gateway devices comprises export logic for causing dialog information associated with a first received message (e.g., a request or response) to be communicated to the dialog store, and retrieval logic for causing a lookup of the dialog information in response to a second received message, the second received message associated with the first received message. In one example the gateway devices are stateless, thereby relying on the dialog store for validating and routing messages. In another example, the gateway devices are stateful and rely on the dialog store for backup (e.g., if a gateway device crashes). The gateway devices may be configured for receiving and processing messages according to SIP protocol or SIP/SIMPLE protocol. | 09-04-2008 |
| 20080256298 | Intelligent caching of user data for real time communications - Apparatus and methods for storing user data for use in real-time communications (e.g., IM or VoIP) are provided. The apparatus comprises at least a first cache device (e.g., a cache server) and a second cache device for storing user data, wherein the user data stored with the first cache device is mirrored with the second cache device. The apparatus further comprising a server having logic for causing access to the user data (e.g., to respond to or process messages) from the first cache device, if accessible, and from the second cache device if the user data is not accessible form the first cache device. The apparatus may further include logic for causing user data to be restored to the first cache device from the second cache device if the first cache device loses user data (e.g., if the first cache device goes down). | 10-16-2008 |
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| 20090047660 | Antibodies for oncogenic strains of HPV and methods of their use - The subject invention provides antibodies, including polyclonal and monoclonal antibodies, that bind to E6 proteins from at least three oncogenic strains of HPV. In general, the antibodies bind to amino acids motifs that are conserved between the E6 proteins of different HPV strains, particularly HPV strains 16 and 18. The subject antibodies may be used to detect HPV E6 protein in a sample, and, accordingly, the antibodies find use in a variety of diagnostic applications, including methods of diagnosing cancer. Kits for performing the subject methods and containing the subject antibodies are also provided. | 02-19-2009 |
| 20100209904 | Antibodies for oncogenic strains of HPV and methods of their use - The subject invention provides antibodies, including polyclonal and monoclonal antibodies, that bind to E6 proteins from at least three oncogenic strains of HPV. In general, the antibodies bind to amino acids motifs that are conserved between the E6 proteins of different HPV strains, particularly HPV strains 16 and 18. The subject antibodies may be used to detect HPV E6 protein in a sample, and, accordingly, the antibodies find use in a variety of diagnostic applications, including methods of diagnosing cancer. Kits for performing the subject methods and containing the subject antibodies are also provided. | 08-19-2010 |
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| 20080268645 | METHOD FOR FRONT END OF LINE FABRICATION - In one embodiment, a method for removing native oxides from a substrate surface is provided which includes supporting a substrate containing silicon oxide within a processing chamber, generating a plasma of reactive species from a gas mixture within the processing chamber, cooling the substrate to a first temperature of less than about 65° C. within the processing chamber, and directing the reactive species to the cooled substrate to react with the silicon oxide thereon while forming a film on the substrate. The film usually contains ammonium hexafluorosilicate. The method further provides positioning the substrate in close proximity to a gas distribution plate, and heating the substrate to a second temperature of about 100° C. or greater within the processing chamber to sublimate or remove the film. The gas mixture may contain ammonia, nitrogen trifluoride, and a carrier gas. | 10-30-2008 |
| 20080317954 | PULSED DEPOSITION PROCESS FOR TUNGSTEN NUCLEATION - In one embodiment, a method for depositing a tungsten material on a substrate within a process chamber is provided which includes exposing the substrate to a gaseous mixture containing a tungsten precursor and a reducing gas to deposit a tungsten nucleation layer on the substrate during a tungsten deposition process. The process further includes removing reaction by-products generated during the tungsten deposition process from the process chamber, exposing the substrate to the reducing gas to react with residual tungsten precursor within the process chamber during a soak process, removing reaction by-products generated during the soak process from the process chamber, and repeating the tungsten deposition process and the soak process during a cyclic deposition process. In the examples, the reducing gas may contain diborane or silane. | 12-25-2008 |
| 20090111280 | METHOD FOR REMOVING OXIDES - A method for removing native oxides from a substrate surface is provided. In one embodiment, the method comprises positioning a substrate having an oxide layer into a processing chamber, generating a plasma of a reactive species from a gas mixture within the processing chamber, exposing the substrate to the reactive species while forming a volatile film on the substrate and maintaining the substrate at a temperature below 65° C., heating the substrate to a temperature of at least about 75° C. to vaporize the volatile film and remove the oxide layer, and depositing a first layer on the substrate after heating the substrate. | 04-30-2009 |
| 20090156003 | METHOD FOR DEPOSITING TUNGSTEN-CONTAINING LAYERS BY VAPOR DEPOSITION TECHNIQUES - In one embodiment, a method for forming a tungsten-containing material on a substrate is provided which includes forming a tungsten-containing layer by sequentially exposing a substrate to a processing gas and a tungsten-containing gas during an atomic layer deposition process, wherein the processing gas comprises a boron-containing gas and a nitrogen-containing gas, and forming a tungsten bulk layer over the tungsten-containing layer by exposing the substrate to a deposition gas comprising the tungsten-containing gas and a reactive precursor gas during a chemical vapor deposition process. In one example, the tungsten-containing layer and the tungsten bulk layer are deposited within the same processing chamber. | 06-18-2009 |
