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Lu, Los Altos
Amy T. Lu, Los Altos, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20080299048 | MIXED DRUG AEROSOL COMPOSITIONS - The present invention pertains to aerosols which comprise a first compound which is physiologically active and a second compound which is different from the first compound. Such aerosols may be produced “on demand” and can be used to control drug release, to improve vaporizability, or to reduce, modify or eliminate undesirable taste associated with a drug aerosol. The present invention also pertains to methods for producing such aerosols. | 12-04-2008 |
| 20080306285 | Heat-Labile Prodrugs - Disclosed herein are heat-labile prodrugs, their preparation and uses. | 12-11-2008 |
| 20080311176 | Drug Condensation Aerosols And Kits - The present invention provides novel condensation aerosols for the treatment of disease and/or intermittent or acute conditions. These condensation aerosols have little or no pyrolysis degradation products and are characterized by having an MMAD of between 1-3 microns. These aerosols are made by rapidly heating a substrate coated with a thin film of drug having a thickness of between 0.05 and 20 μm, while passing a gas over the film, to form particles of a desirable particle size for inhalation. Kits comprising a drug and a device for producing a condensation aerosol are also provided. The device contained in the kit typically, has an element for heating the drug which is coated as a film on the substrate and contains a therapeutically effective dose of a drug when the drug is administered in aerosol form, and an element allowing the vapor to cool to form an aerosol. Also disclosed, are methods for using these aerosols and kits. | 12-18-2008 |
| 20090062254 | Acute Treatment of Headache with Phenothiazine Antipsychotics - Methods of treating headache with antipsychotics are provided. A kit for treating headache is also provided, comprising an antipsychotic and a device for rapid delivery of the antipsychotic. | 03-05-2009 |
| 20090258075 | Respiratory Drug Condensation Aerosols and Methods of Making and Using Them - Described herein are respiratory drug condensation aerosols and methods of making and using them. Kits for delivering condensation aerosols are also described. The respiratory drug aerosols typically comprise respiratory drug condensation aerosol particles. In some variations the respiratory drug compound is selected from the group consisting of β-adrenergics, methylxanthines, anticholinergics, corticosteroids, mediator-release inhibitors, anti-leukotriene drugs, asthma inhibitors, asthma antagonists, anti-endothelin drugs, prostacyclin drugs, ion channel or pump inhibitors, enhancers, or modulators and pharmaceutically acceptable analogs, derivatives, and mixtures thereof. Methods of treating a respiratory ailment using the described aerosols are also described. In general, the methods typically comprise the step of administering a therapeutically effective amount of respiratory drug condensation aerosol to a person with a respiratory ailment. Methods of forming a respiratory drug condensation aerosol are also described. The methods comprise the steps of vaporizing and condensing a respiratory drug composition. | 10-15-2009 |
Chih-Shun Lu, Los Altos, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090095616 | APPARATUS AND METHOD FOR MEASURING VAPOR FLUX DENSITY - A two-chamber electron impact emission sensor effective for monitoring vapor flux of materials in the presence of interfering species is described. The sensor includes two independent electron excitation regions and one photodetector for monitoring emission from excited species from both chambers. Copper vapor flux from an evaporation source was accurately measured in the presence of interfering H | 04-16-2009 |
Paul Lu, Los Altos, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20090203410 | METHOD AND APPARATUS FOR REDUCING STANDBY POWER CONSUMPTION OF A HANDHELD COMMUNICATION SYSTEM - A method for managing operation of a device is disclosed and may include performing the following using one or more processors and/or circuits in a handheld multistandard communication system, the one or more processors and/or circuits comprising a control device and one or more other devices: receiving from the control device, one or more power setting signals indicative of a desired power level setting. The handheld multistandard communication system may operate utilizing a NORMAL power level setting or a standby setting. The standby setting may include a LOW power level setting and a sleep mode setting. One or more corresponding power adjustment signals may be generated based on the received one or more power setting signals. Power supplied to the control device and/or the one or more other devices may be adjusted based on the generated one or more corresponding power adjustment signals. | 08-13-2009 |
Paul Y. Lu, Los Altos, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20080212728 | METHOD AND APPARATUS FOR GENERATING CLOCKS FOR A HANDHELD MULTISTANDARD COMMUNICATION SYSTEM - Systems and methods for processing signals are disclosed. The method may include, in a communication system comprising a plurality of devices, controlling the supply of one or more clock signals from a first clock source to one or more of the plurality of devices based on a signal communicated from a particular one of the plurality of devices to a second clock source and a request for a clock signal from one of the plurality of devices. The communicated signal may control an accuracy of the second clock source. The particular one of the plurality of devices may have highest accuracy requirements among the plurality of devices. At least one main clock signal may be generated for at least one of the plurality of devices utilizing an input clock signal received from the second clock source. | 09-04-2008 |
Yenwen Lu, Los Altos, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20080309897 | MULTIVARIABLE SOLVER FOR OPTICAL PROXIMITY CORRECTION - The method of the invention tracks how the collective movement of edge segments in a mask layout alters the resist image values at control points in the layout and simultaneously determines a correction amount for each edge segment in the layout. A multisolver matrix that represents the collective effect of movements of each edge segment in the mask layout is used to simultaneously determine the correction amount for each edge segment in the mask layout. | 12-18-2008 |
| 20100161093 | MULTIVARIABLE SOLVER FOR OPTICAL PROXIMITY CORRECTION - The method of the invention tracks how the collective movement of edge segments in a mask layout alters the resist image values at control points in the layout and simultaneously determines a correction amount for each edge segment in the layout. A multisolver matrix that represents the collective effect of movements of each edge segment in the mask layout is used to simultaneously determine the correction amount for each edge segment in the mask layout. | 06-24-2010 |
Yen-Wen Lu, Los Altos, CA US
| Patent application number | Description | Published |
|---|---|---|
| 20100167184 | LITHOGRAPHIC PROCESSING METHOD, AND DEVICE MANUFACTURED THEREBY - A multivariable solver for proximity correction uses a Jacobian matrix to approximate effects of perturbations of segment locations in successive iterations of a design loop. The problem is formulated as a constrained minimization problem with box, linear equality, and linear inequality constraints. To improve computational efficiency, non-local interactions are ignored, which results in a sparse Jacobian matrix. | 07-01-2010 |
| 20110083113 | System and Method for Lithography Simulation - There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques. In this regard, in one embodiment, the present invention employs a lithography simulation system architecture, including application-specific hardware accelerators, and a processing technique to accelerate and facilitate verification, characterization and/or inspection of a mask design, for example, RET design, including detailed simulation and characterization of the entire lithography process to verify that the design achieves and/or provides the desired results on final wafer pattern. The system includes: (1) general purpose-type computing device(s) to perform the case-based logic having branches and inter-dependency in the data handling and (2) accelerator subsystems to perform a majority of the computation intensive tasks. | 04-07-2011 |