| Patent application number | Description | Published |
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| 20090090951 | Capacitors Integrated with Metal Gate Formation - A semiconductor structure including a capacitor having increased capacitance and improved electrical performance is provided. The semiconductor structure includes a substrate; and a capacitor over the substrate. The capacitor includes a first layer including a first capacitor electrode and a second capacitor electrode, wherein the first capacitor electrode is formed of a metal-containing material and is free from polysilicon. The semiconductor structure further includes a MOS device including a gate dielectric over the substrate; and a metal-containing gate electrode on the gate dielectric, wherein the metal-containing gate electrode is formed of a same material, and has a same thickness, as the first capacitor electrode. | 04-09-2009 |
| 20090136876 | SYSTEM AND METHOD FOR PHOTOLITHOGRAPHY IN SEMICONDUCTOR MANUFACTURING - A method for producing a pattern on a substrate includes providing at least one exposure of the pattern onto a layer of the substrate by a higher-precision lithography mechanism and providing at least one exposure of the pattern onto a layer of the substrate by a lower-precision lithography mechanism. The exposures can be done in either order, and additional exposures can be included. The higher-precision lithography mechanism can be immersion lithography and the lower-precision lithography mechanism can be dry lithography. | 05-28-2009 |
| 20100026601 | Antennas Integrated in Semiconductor Chips - An integrated circuit structure includes a semiconductor chip including a top surface, a bottom surface, and a side surface; a metal seal ring adjacent the side surface; and an antenna including a seal-ring antenna. The seal-ring antenna includes at least a portion of the metal seal ring. | 02-04-2010 |
| 20110309420 | Capacitors Integrated with Metal Gate Formation - A semiconductor structure including a capacitor having increased capacitance and improved electrical performance is provided. The semiconductor structure includes a substrate and a MIM capacitor over the substrate. The MIM capacitor includes a bottom plate, an insulating layer over the bottom plate, and a top plate over the insulating layer. The semiconductor structure further includes a MOS device including a gate dielectric over the substrate and a metal-containing gate electrode free from polysilicon on the gate dielectric, wherein the metal-containing gate electrode is formed of a same material and has a same thickness as the bottom plate. | 12-22-2011 |
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| 20090273725 | LIQUID CRYSTAL DISPLAY PANEL AND PIXEL STRUCTURE THEREOF - A pixel structure includes a bright region and a pale region, and the pale region includes a first capacitance coupling region and a second capacitance coupling region. The first capacitance coupling region includes a first coupling capacitor, the second capacitance coupling region includes a second coupling capacitor, and the first coupling capacitor and the second coupling capacitor are connected in parallel. | 11-05-2009 |
| 20100007826 | Multidomain-Vertical-Alignment Transreflective LCD - A transreflective LCD has a TFT array plate, a color filter plate and a liquid crystal therebetween. A trench is in the overcoat layer of the TFT array plate and/or the color filter plate. The trench can be located in a transmission area or in a reflective area of a pixel. A conformal transparent electrode is located therein, and an overcoat material is filled up in the trench. | 01-14-2010 |
| 20100182558 | LIQUID CRYSTAL DISPLAY PANEL - According to the present invention, an LCD panel includes a first substrate, a second substrate placed opposite to the first substrate, and a liquid crystal layer placed between the first substrate and the second substrate. The first substrate includes a pixel electrode and a first common electrode. The pixel electrode includes a plurality of first protruding nodes, and the first common electrode includes a plurality of second protruding nodes interleaved with the plurality of first protruding nodes. The second substrate includes a second common electrode corresponding to the first common electrode. The second common electrode includes a plurality of third protruding nodes corresponding to the second protruding nodes. | 07-22-2010 |
| 20110148780 | TOUCH PANEL AND FABRICATING METHOD THEREOF - A method of fabricating touch panel includes the following steps. A base is provided. A first transparent conductive layer is formed on the base. A first screen printing process is performed to form a first patterned sacrificial layer on the first transparent conductive layer, and the first patterned sacrificial layer is used to pattern the first transparent conductive layer to form a patterned sensing pad layer. A second screen printing process is carried out to form a patterned insulating layer. A second transparent conductive layer is formed on the base. A third screen printing process is performed to form a second patterned sacrificial layer, and the second patterned sacrificial layer is used to pattern the second transparent conductive layer to form a patterned bridge line layer. | 06-23-2011 |
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| 20110128636 | PROJECTION LENS - A projection lens includes a first lens group, a second lens group, and a third lens group. The first lens group is composed of a first lens. The first lens has a concave surface and a convex surface, and the concave surface of the first lens faces a reducing side of the projection lens. The second lens group has positive refractive power, and includes a second lens having positive refractive power and a third lens having negative refractive power. The second lens is a biconvex lens, and the third lens has a concave lens facing the reducing side. The third lens group is composed of a fourth lens, and the fourth lens has a convex surface facing a magnifying side of the projection lens. The first lens group, the second lens group, and the third lens group include at least two aspheric lenses. | 06-02-2011 |
| 20110176226 | LENS MODULE - A lens module has a magnified side and a reduced side having an imaging surface. The lens module includes a first, a second, and a third lens groups having positive refractive powers respectively. The first lens group includes a first and a second lenses. A value calculated by dividing a distance between a center of a surface of the first lens facing the magnified side and the imaging surface by the effective focal length of the lens module is greater than or equal to 1 and smaller than or equal to 3. The second lens group located between the first lens group and the reduced side includes a third and a fourth lenses. The third lens group located between the second lens group and the reduced side includes a fifth lens. Refractive powers of the first to the fifth lenses are negative, positive, positive, negative and positive, respectively. | 07-21-2011 |
